A process for preparing a coating utilized for thermal and environmental barrier coating on a substrate is disclosed. The process comprises preparing a starter oxycarbide composition; and preloading a metal material in said starter oxycarbide composition.

A process for preparing a coating utilized for thermal and environmental barrier coating on a substrate is disclosed. The process comprises preparing a starter oxycarbide composition; and preloading a metal material in said starter oxycarbide composition.

An article has a substrate and a layer atop the substrate. The layer has: a matrix comprising at least one of hafnium silicate (HfSiO.sub.4) and ytterbium disilicate (Yb.sub.2Si.sub.2O.sub.7); and barium magnesium alumino silicate (BMAS).

An article has a substrate and a layer atop the substrate. The layer has: a matrix comprising at least one of hafnium silicate (HfSiO.sub.4) and ytterbium disilicate (Yb.sub.2Si.sub.2O.sub.7); and barium magnesium alumino silicate (BMAS).

The disclosure describes braze tape coatings and technique to form articles with differing physical properties in different layers or regions of the article. An example method includes forming a braze tape defining at least one layer that includes a first segment and a second segment. A portion of the second segment in the plane is adjacent to a portion of the first segment in a plane of the layer. The method also includes positioning the braze tape on a surface of a substrate, the plane of the layer of the braze tape being parallel to the surface of the substrate. The method also includes heating the braze tape to melt a constituent of at least one of the first coating material and the second coating material to form a densified coating on the surface of the substrate.

The disclosure describes braze tape coatings and technique to form articles with differing physical properties in different layers or regions of the article. An example method includes forming a braze tape defining at least one layer that includes a first segment and a second segment. A portion of the second segment in the plane is adjacent to a portion of the first segment in a plane of the layer. The method also includes positioning the braze tape on a surface of a substrate, the plane of the layer of the braze tape being parallel to the surface of the substrate. The method also includes heating the braze tape to melt a constituent of at least one of the first coating material and the second coating material to form a densified coating on the surface of the substrate.

A method of manufacturing a material including tantalum carbide (TaC) with a particularly low impurity content, and a TaC material formed by the method are provided. The method includes preparing a base material, and forming a TaC coating layer on a surface of the base material at a temperature of 1,600 C. to 2,500 C.

A method of manufacturing a material including tantalum carbide (TaC) with a particularly low impurity content, and a TaC material formed by the method are provided. The method includes preparing a base material, and forming a TaC coating layer on a surface of the base material at a temperature of 1,600 C. to 2,500 C.

A method for coating a substrate includes spraying a combination of powders. The combination of powders includes: Hf.sub.0.5Si.sub.0.5O.sub.2; Zr.sub.0.5Si.sub.0.5O.sub.2; and, optionally, at least one of HfO.sub.2 and ZrO.sub.2. A molar ratio of said Hf.sub.0.5Si.sub.0.5O.sub.2 and HfO.sub.2 combined to said Zr.sub.0.5Si.sub.0.5O.sub.2 and ZrO.sub.2 combined is from 2:1 to 4:1. A molar ratio of said Hf.sub.0.5Si.sub.0.5O.sub.2 to said HfO.sub.2 is at least 1:3.

A method for coating a substrate includes spraying a combination of powders. The combination of powders includes: Hf.sub.0.5Si.sub.0.5O.sub.2; Zr.sub.0.5Si.sub.0.5O.sub.2; and, optionally, at least one of HfO.sub.2 and ZrO.sub.2. A molar ratio of said Hf.sub.0.5Si.sub.0.5O.sub.2 and HfO.sub.2 combined to said Zr.sub.0.5Si.sub.0.5O.sub.2 and ZrO.sub.2 combined is from 2:1 to 4:1. A molar ratio of said Hf.sub.0.5Si.sub.0.5O.sub.2 to said HfO.sub.2 is at least 1:3.