A polishing brush (1) includes a plurality of linear abrasive members (32) each formed by hardening an aggregated yarn of inorganic filaments by a resin binder, and a holder (2) that holds the linear abrasive members (32). The linear abrasive members (32) are held by a base (31). The base (31) is secured to a spindle (25) in the holder (2). In the spindle (25), a flow path (28) for discharging a liquid cutting agent toward a side on which free ends (33) of the linear abrasive members (32) are located is provided.

A brush-like grinding stone (3) in a polishing brush (1) includes a brush holder (6) and a linear member aggregate (7) detachably held in the brush holder (6). The linear member aggregate (7) includes a large number of bundles (51) of the linear members (50) obtained by hardening aggregated yarn of inorganic filaments impregnated with a resin, and a brush holder (70) holding ends of the bundles (51). A linear member holder (70) in the linear member aggregate (7) is detachably attached to each of a plurality of holding holes (68) that is open in one side in an axial line direction L. In a case where any of the linear member aggregates has a failure, such as breakage, only the failed linear member aggregate needs to be replaced. Thus, it is not necessary to discard the entire brush-like grinding stone. Consequently, the polishing cost can be reduced.

A brush-like grinding stone (3) in a polishing brush (1) includes a brush holder (6) and a linear member aggregate (7) detachably held in the brush holder (6). The linear member aggregate (7) includes a large number of bundles (51) of the linear members (50) obtained by hardening aggregated yarn of inorganic filaments impregnated with a resin, and a brush holder (70) holding ends of the bundles (51). A linear member holder (70) in the linear member aggregate (7) is detachably attached to each of a plurality of holding holes (68) that is open in one side in an axial line direction L. In a case where any of the linear member aggregates has a failure, such as breakage, only the failed linear member aggregate needs to be replaced. Thus, it is not necessary to discard the entire brush-like grinding stone. Consequently, the polishing cost can be reduced.

The present invention relates to a device for cleaning and polishing connections of underwater equipment, comprising: a connection element (3) adapted to be connected to a torque-generating device; a cleaning-fluid-discharge device (2) comprising at least one cleaning-fluid reservoir (20); and a cleaning element connected to the discharge device via a support (4) for the cleaning element, wherein the support (4) for the cleaning element comprises at least one channel (41) that in a fluidic manner connects the at least one cleaning-fluid reservoir (20) to the cleaning element. In addition, the device comprises a control system (1) for dispersal of cleaning fluid, comprising a telescopic shaft (1) that comprises a fixed part (11) and a movable part (12), which are adapted to move longitudinally relative to one another, wherein: the movable part (12) extends at least partially inside the fixed part (11); the fixed part (11) is secured to the fluid-discharge device (2); and the movable part (12) is secured to the cleaning element (42); a compressible damping element (10) is provided between the fixed part and the movable part (12); an upper portion of the movable part (12) extends partially inside the fluid-discharge device (2), via an opening (21) in the fluid-discharge device (2); and the channel (41) that fluidly connects the at least one cleaning-fluid reservoir (20) to the cleaning element (42) extends longitudinally through the movable part (12) and extends partially through the upper portion of the movable part (12).

A brush-like grinding stone (3) in a polishing brush (1) includes a brush holder (6) and a linear member aggregate (7) detachably held in the brush holder (6). The linear member aggregate (7) includes a large number of bundles (51) of the linear members (50) obtained by hardening aggregated yarn of inorganic filaments impregnated with a resin, and a brush holder (70) holding ends of the bundles (51). A linear member holder (70) in the linear member aggregate (7) is detachably attached to each of a plurality of holding holes (68) that is open in one side in an axial line direction L. In a case where any of the linear member aggregates has a failure, such as breakage, only the failed linear member aggregate needs to be replaced. Thus, it is not necessary to discard the entire brush-like grinding stone. Consequently, the polishing cost can be reduced.

The present invention includes methods and materials for cleaning materials, particles, or chemicals from a substrate with a brush or pad. The method comprising: engaging a surface of a rotating wafer with an outer circumferential surface of a rotating cylindrical foam roller, the cylindrical foam roller having a plurality of circumferentially and outwardly extending spaced apart nodules extending from the outer surface, each nodule defining a height extending from the outer surface of the cylindrical foam roller to a substrate engagement surface of the nodule, the substrate engagement surface of one or more of the nodules having a rounded configuration; and positioning the cylindrical foam roller on the substrate such that the one or more nodules are positioned to have only the rounded substrate engagement surface contact the substrate such that no linear surface of the one or more nodules contacts the substrate.

A brush roller structure includes a foam body, a central channel, a microporous area, and through holes. The foam body comprises flow channels formed by interlaced pores, and the pores have an average pore diameter ranging from 300 m to 500 m. The central channel is arranged in the foam body and communicates with the flow channels. The microporous area is located on the surface of the foam body, and has micro pores, and the diameter of the micro pores is smaller than the average diameter of the pores in the foam body. The through holes are arranged on the outer surface of the foam body, wherein the depth of the through holes is between 50 m and 300 m, and the ratio of the total area of the through holes to the outer surface of the foam body is between 10% and 90%.

Tools and brushes for cleaning wafers after a Chemical Mechanical Polishing (CMP) process and methods for fabricating such brushes are provided. A brush for cleaning wafers after a Chemical Mechanical Polishing (CMP) process includes a sleeve member; and a plurality of spaced-apart nodules disposed to protrude from the sleeve member, and wherein an outer surface of the nodules is formed by a porous polymeric material having pores, and wherein the pores have a maximum pore dimension of 1000 nanometers (nm).

An exterior material may be configured to form an exterior of a home appliance, the exterior material includes a base material having a hierarchical circular structure pattern on the surface. The hierarchical circular structure pattern may include a plurality of circular structures having diameters different from each other, and a pattern density may be, in percentage of area of the surface, about 20 to 90%.

A modified honing brush is provided comprising one or more bristles and one or a plurality of reusable stackable plates having one or more holes or voids located in the plates, or one or more support guides, and wherein each of the bristles is independently fitted through one or more of the holes or voids of the plates or surrounded by one or more support guides.