Patent classifications
C07C49/293
FRAGRANCES WITH CYCLOPROPYL STRUCTURE
SUMMARY
Suggested are cyclopropyl derivative according to formula (I)
##STR00001## wherein R.sup.1 represents a cyclopropyl or C.sub.1-C.sup.6-alkylcyclopropyl residue; R.sup.2 stands for a COR.sup.3 or (CH.sub.2).sub.nR.sup.4 radical; R.sup.3 stands for linear or branched C.sub.1-C.sub.6 alkyl; R.sup.4 stands for CH.sub.2OH or CHO; and n stands for an integer of from 1 to 12. The derivatives are characterized by very intense, but also very different scents, depending on their structure.
FRAGRANCES WITH CYCLOPROPYL STRUCTURE
SUMMARY
Suggested are cyclopropyl derivative according to formula (I)
##STR00001## wherein R.sup.1 represents a cyclopropyl or C.sub.1-C.sup.6-alkylcyclopropyl residue; R.sup.2 stands for a COR.sup.3 or (CH.sub.2).sub.nR.sup.4 radical; R.sup.3 stands for linear or branched C.sub.1-C.sub.6 alkyl; R.sup.4 stands for CH.sub.2OH or CHO; and n stands for an integer of from 1 to 12. The derivatives are characterized by very intense, but also very different scents, depending on their structure.