C07C63/70

RETINOID COMPOUND, PREPARATION METHOD THEREFOR, INTERMEDIATES THEREOF AND APPLICATION THEREOF

Disclosed are a retinoid compound, a preparation method therefor, intermediates thereof and an application thereof. The retinoid compound I of the present invention has a good tumor growth inhibition rate.

Light assisted, catalyst-free oxidation of aldehydes to carboxylic acids using carbon dioxide

Method for visible-light driven oxidation of aldehydes to carboxylic acid using carbon dioxide (CO.sub.2) as the oxidant in the absence of any catalyst are provided. In the disclosed process, aldehydes, when reacted with CO.sub.2 in an organic solvent, either in a batch reactor or in a continuous flow reactor, under conditions of ambient temperature and pressure, using a readily available household LED lamp, yield corresponding carboxylic acids along with the formation of carbon monoxide (CO) in the effluent gas.

Light assisted, catalyst-free oxidation of aldehydes to carboxylic acids using carbon dioxide

Method for visible-light driven oxidation of aldehydes to carboxylic acid using carbon dioxide (CO.sub.2) as the oxidant in the absence of any catalyst are provided. In the disclosed process, aldehydes, when reacted with CO.sub.2 in an organic solvent, either in a batch reactor or in a continuous flow reactor, under conditions of ambient temperature and pressure, using a readily available household LED lamp, yield corresponding carboxylic acids along with the formation of carbon monoxide (CO) in the effluent gas.

Clean process for preparing chloroformyl-substituted benzene

Clean process for preparing a chloroformyl-substituted benzene by oxidation of a tail gas hydrogen chloride from a chlorination reaction and a chloroacylation reaction and recycling of the resulting oxidation product chlorine gas into the chlorination reaction. The present invention provides a clean process for preparing a polymer-grade chloroformyl-substituted benzene.

Clean process for preparing chloroformyl-substituted benzene

Clean process for preparing a chloroformyl-substituted benzene by oxidation of a tail gas hydrogen chloride from a chlorination reaction and a chloroacylation reaction and recycling of the resulting oxidation product chlorine gas into the chlorination reaction. The present invention provides a clean process for preparing a polymer-grade chloroformyl-substituted benzene.

Clean process for preparing chloroformyl-substituted benzene

Clean process for preparing a chloroformyl-substituted benzene by oxidation of a tail gas hydrogen chloride from a chlorination reaction and a chloroacylation reaction and recycling of the resulting oxidation product chlorine gas into the chlorination reaction. The present invention provides a clean process for preparing a polymer-grade chloroformyl-substituted benzene.

SYNTHESIS OF HYPERVALENT IODINE REAGENTS WITH DIOXYGEN

Methods of synthesis of hypervalent iodine reagents and methods for oxidation of organic compounds are disclosed.

SYNTHESIS OF HYPERVALENT IODINE REAGENTS WITH DIOXYGEN

Methods of synthesis of hypervalent iodine reagents and methods for oxidation of organic compounds are disclosed.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS
20240337931 · 2024-10-10 · ·

The actinic ray-sensitive or radiation-sensitive resin composition includes a resin, and an ionic compound having, in at least one of a cationic moiety or an anionic moiety, a group represented by SF.sub.4R provides a very good pattern profile in the formation of an ultrafine pattern such as a line-and-space pattern of 25 nm or less, and a hole pattern having a hole diameter of 25 nm or less.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS
20240337931 · 2024-10-10 · ·

The actinic ray-sensitive or radiation-sensitive resin composition includes a resin, and an ionic compound having, in at least one of a cationic moiety or an anionic moiety, a group represented by SF.sub.4R provides a very good pattern profile in the formation of an ultrafine pattern such as a line-and-space pattern of 25 nm or less, and a hole pattern having a hole diameter of 25 nm or less.