C07C233/91

NAPHTHOQUINONES, PRO-DRUGS, AND METHODS OF USE THEREOF

Provided herein are naphthoquinones compounds such as those with a hydrogen bond donating group of the formula (I): wherein: R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, and n are as defined herein. Also provided herein are pharmaceutical composition of the present compounds and methods of treatment using the compounds including their use in the treatment of cancer.

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Prodrugs of fumarates and their use in treating various diseases

The present invention provides compounds of formula (I), and pharmaceutical compositions thereof. ##STR00001##

Prodrugs of fumarates and their use in treating various diseases

The present invention provides compounds of formula (I), and pharmaceutical compositions thereof. ##STR00001##

Prodrugs of fumarates and their use in treating various diseases

The present invention provides compounds of formula (I), and pharmaceutical compositions thereof. ##STR00001##

Prodrugs of fumarates and their use in treating various diseases

The present invention provides compounds of formula (I), and pharmaceutical compositions thereof. ##STR00001##

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS
20240337931 · 2024-10-10 · ·

The actinic ray-sensitive or radiation-sensitive resin composition includes a resin, and an ionic compound having, in at least one of a cationic moiety or an anionic moiety, a group represented by SF.sub.4R provides a very good pattern profile in the formation of an ultrafine pattern such as a line-and-space pattern of 25 nm or less, and a hole pattern having a hole diameter of 25 nm or less.

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND COMPOUNDS
20240337931 · 2024-10-10 · ·

The actinic ray-sensitive or radiation-sensitive resin composition includes a resin, and an ionic compound having, in at least one of a cationic moiety or an anionic moiety, a group represented by SF.sub.4R provides a very good pattern profile in the formation of an ultrafine pattern such as a line-and-space pattern of 25 nm or less, and a hole pattern having a hole diameter of 25 nm or less.

Prodrugs of fumarates and their use in treating various diseases

The present invention provides compounds of formula (I), and pharmaceutical compositions thereof. ##STR00001##

Prodrugs of fumarates and their use in treating various diseases

The present invention provides compounds of formula (I), and pharmaceutical compositions thereof. ##STR00001##

ENAMIDE PROCESS
20180215702 · 2018-08-02 ·

A convenient method for converting oximes into enamides is disclosed. The process produces enamides without the concomitant production of a large volume of metallic waste.

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The enamides are useful precursors to amides and amines.