Patent classifications
C07C311/49
MANUFACTURING METHOD FOR HIGH-PURITY CYCLOHEXENONE LONG-CHAIN ALCOHOL
This invention relates to a method for producing a high-purity cyclohexenone long-chain alcohol represented by formula I, and produces the compound of formula I by a metal-mediated Barbier reaction. The method of the present invention has advantages in its short scheme, high yield, and high-purity product, and is suitable for industrial scale up.
##STR00001##
Rational drug design targeting resistant gram-negative bacterial infections to polymyxin-class antibiotics
The present invention relates to identification of inhibitors or antagonists of aminoarabinase glycosyltransferase (ArnT) and their use in compositions, methods of treatment or prevention of drug resistant gram negative infections, or inhibiting the growth of gram negative bacterial infections resistant to polymyxin-class antibiotics. In certain aspects, the inhibitors or antagonists can be administered in combination with one or more antibacterial agents.
Rational drug design targeting resistant gram-negative bacterial infections to polymyxin-class antibiotics
The present invention relates to identification of inhibitors or antagonists of aminoarabinase glycosyltransferase (ArnT) and their use in compositions, methods of treatment or prevention of drug resistant gram negative infections, or inhibiting the growth of gram negative bacterial infections resistant to polymyxin-class antibiotics. In certain aspects, the inhibitors or antagonists can be administered in combination with one or more antibacterial agents.
SULFONE SULFONYLIMIDE COMBINATIONS FOR ADVANCED BATTERY CHEMISTRIES
Disclosed is an electrochemical cell, which may be used for advanced rechargeable batteries. The electrochemical cell comprises two or more electrodes within an electrolyte solution, where the electrolyte solution containing (i) an aliphatic or cyclic sulfone and (ii) a metal perfluoroalkylsulfonylimide salt.
SULFONE SULFONYLIMIDE COMBINATIONS FOR ADVANCED BATTERY CHEMISTRIES
Disclosed is an electrochemical cell, which may be used for advanced rechargeable batteries. The electrochemical cell comprises two or more electrodes within an electrolyte solution, where the electrolyte solution containing (i) an aliphatic or cyclic sulfone and (ii) a metal perfluoroalkylsulfonylimide salt.
Aryl sulfonohydrazides
Compound of formula I: ##STR00001##
wherein: A is selected from: (i) ##STR00002##
where R.sup.F1 is H or F; (ii) ##STR00003## (iii) a N-containing C.sub.6 heteroaryl group; and B is ##STR00004##
where X.sup.1 is either CR.sup.F2 or N, where R.sup.F2 is H or F; X.sup.2 is either CR.sup.3 or N, where R.sup.3 is selected from H, Me, Cl, F OMe; X.sup.3 is either CH or N; X.sup.4 is either CR.sup.F3 or N, where R.sup.F3 is H or F; where only one or two of X.sup.1, X.sup.2, X.sup.3 and X.sup.4 may be N; and R.sup.4 is selected from I, optionally substituted phenyl, optionally substituted C.sub.5-6 heteroaryl; optionally substituted C.sub.1-6 alkyl and optionally substituted C.sub.1-6 alkoxy, which are useful in the treatment of a condition ameliorated by the inhibition of MOZ.
Aryl sulfonohydrazides
Compound of formula I: ##STR00001##
wherein: A is selected from: (i) ##STR00002##
where R.sup.F1 is H or F; (ii) ##STR00003## (iii) a N-containing C.sub.6 heteroaryl group; and B is ##STR00004##
where X.sup.1 is either CR.sup.F2 or N, where R.sup.F2 is H or F; X.sup.2 is either CR.sup.3 or N, where R.sup.3 is selected from H, Me, Cl, F OMe; X.sup.3 is either CH or N; X.sup.4 is either CR.sup.F3 or N, where R.sup.F3 is H or F; where only one or two of X.sup.1, X.sup.2, X.sup.3 and X.sup.4 may be N; and R.sup.4 is selected from I, optionally substituted phenyl, optionally substituted C.sub.5-6 heteroaryl; optionally substituted C.sub.1-6 alkyl and optionally substituted C.sub.1-6 alkoxy, which are useful in the treatment of a condition ameliorated by the inhibition of MOZ.
A DEVELOPING AGENT PRECURSOR FOR LASER MARKABLE COMPOSITIONS
Developing agent precursors and laser markable compositions including such developing agent precursors.
A DEVELOPING AGENT PRECURSOR FOR LASER MARKABLE COMPOSITIONS
Developing agent precursors and laser markable compositions including such developing agent precursors.
ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS
A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.
##STR00001##