The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.

Systems and methods for low-cost and morphologically stable 3D printing are disclosed. A solution-based method for 3D printing, comprising i) providing a substrate comprising a flat surface; ii) providing a first solution of a self-assembled monolayer (SAM) molecule comprising a functional group at each end of the SAM molecule; iii) applying the first solution to the flat surface of the substrate to form a first SAM comprising a first liquid surface; iv) providing a second solution of a metal precursor; v) applying the second solution on the first liquid surface to form a second liquid surface over the first SAM; vi) applying a first force to cross-link the first SAM; vii) repeating steps iii) and v)-vi) to form a multiple layer of the SAM; and viii) either applying a second force to anneal the multiple layer of the SAM to form a soft material or applying a third force to anneal the multiple layer of the SAM to form a hard material.

Systems and methods for low-cost and morphologically stable 3D printing are disclosed. A solution-based method for 3D printing, comprising i) providing a substrate comprising a flat surface; ii) providing a first solution of a self-assembled monolayer (SAM) molecule comprising a functional group at each end of the SAM molecule; iii) applying the first solution to the flat surface of the substrate to form a first SAM comprising a first liquid surface; iv) providing a second solution of a metal precursor; v) applying the second solution on the first liquid surface to form a second liquid surface over the first SAM; vi) applying a first force to cross-link the first SAM; vii) repeating steps iii) and v)-vi) to form a multiple layer of the SAM; and viii) either applying a second force to anneal the multiple layer of the SAM to form a soft material or applying a third force to anneal the multiple layer of the SAM to form a hard material.

Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I): ##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2):
R.sup.10a.sub.mSH  (i-1)
R.sup.11a.sub.nSR.sup.12a—S.sub.pR.sup.13a  (i-2) wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.

Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I): ##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2):
R.sup.10a.sub.mSH  (i-1)
R.sup.11a.sub.nSR.sup.12a—S.sub.pR.sup.13a  (i-2) wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.

The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.

The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.

Systems and methods for low-cost and morphologically stable 3D printing are disclosed. A solution-based method for 3D printing, comprising i) providing a substrate comprising a flat surface; ii) providing a first solution of a self-assembled monolayer (SAM) molecule comprising a functional group at each end of the SAM molecule; iii) applying the first solution to the flat surface of the substrate to form a first SAM comprising a first liquid surface; iv) providing a second solution of a metal precursor; v) applying the second solution on the first liquid surface to form a second liquid surface over the first SAM; vi) applying a first force to cross-link the first SAM; vii) repeating steps iii) and v)-vi) to form a multiple layer of the SAM; and viii) either applying a second force to anneal the multiple layer of the SAM to form a soft material or applying a third force to anneal the multiple layer of the SAM to form a hard material.

Systems and methods for low-cost and morphologically stable 3D printing are disclosed. A solution-based method for 3D printing, comprising i) providing a substrate comprising a flat surface; ii) providing a first solution of a self-assembled monolayer (SAM) molecule comprising a functional group at each end of the SAM molecule; iii) applying the first solution to the flat surface of the substrate to form a first SAM comprising a first liquid surface; iv) providing a second solution of a metal precursor; v) applying the second solution on the first liquid surface to form a second liquid surface over the first SAM; vi) applying a first force to cross-link the first SAM; vii) repeating steps iii) and v)-vi) to form a multiple layer of the SAM; and viii) either applying a second force to anneal the multiple layer of the SAM to form a soft material or applying a third force to anneal the multiple layer of the SAM to form a hard material.

A process synthesizes a compound with at least one alkylene group and at least one thiol or thiolate group. The process involves reacting a compound with at least one five-membered cyclic monothiocarbonate group with a starter selected from a compound with at least one thiol group, from a compound with at least one hydroxy group, or from a basic inorganic composed; to obtain a compound with at least one alkylene group and at least one thiol or thiolate group and carbon dioxide.