A process synthesizes a compound with at least one alkylene group and at least one thiol or thiolate group. The process involves reacting a compound with at least one five-membered cyclic monothiocarbonate group with a starter selected from a compound with at least one thiol group, from a compound with at least one hydroxy group, or from a basic inorganic composed; to obtain a compound with at least one alkylene group and at least one thiol or thiolate group and carbon dioxide.

A vapor-based method and system for printing a 3D structure are provided. The vapor-based method includes providing a substrate; providing a first vapor including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) as a building block for printing the 3D structure; providing a second vapor including metal ions; applying the first vapor and the second vapor to form molecular-metal SAMs thereby providing a multiple layered SAMs material on the substrate; and applying a force and forming the 3D structure from the multiple layered SAMs material, wherein the 3D structure is provided on the substrate.

A vapor-based method and system for printing a 3D structure are provided. The vapor-based method includes providing a substrate; providing a first vapor including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) as a building block for printing the 3D structure; providing a second vapor including metal ions; applying the first vapor and the second vapor to form molecular-metal SAMs thereby providing a multiple layered SAMs material on the substrate; and applying a force and forming the 3D structure from the multiple layered SAMs material, wherein the 3D structure is provided on the substrate.

A solution-based system for printing a 3D structure is provided and includes a substrate; a first solution including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) including a first self-assembled monolayer (SAM) as a building block for printing the 3D structure, wherein the first solution is applied to a surface of the substrate to form the first SAM including a first SAM surface as a basis for the 3D structure; a second solution including metal ions, wherein the substrate with the first SAM is immersed into the second solution, and wherein the first solution is applied to the substrate which is immersed in the second solution thereby obtaining molecular-metal SAMs to provide a multiple layered SAM material; and means for applying a force and forming the 3D structure from the multiple layered SAM material, wherein the 3D structure is provided on the substrate.

A solution-based system for printing a 3D structure is provided and includes a substrate; a first solution including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) including a first self-assembled monolayer (SAM) as a building block for printing the 3D structure, wherein the first solution is applied to a surface of the substrate to form the first SAM including a first SAM surface as a basis for the 3D structure; a second solution including metal ions, wherein the substrate with the first SAM is immersed into the second solution, and wherein the first solution is applied to the substrate which is immersed in the second solution thereby obtaining molecular-metal SAMs to provide a multiple layered SAM material; and means for applying a force and forming the 3D structure from the multiple layered SAM material, wherein the 3D structure is provided on the substrate.

Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I):

##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2):

##STR00002## wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.

Provided is an additive for imparting ultraviolet absorbency, or an additive for imparting a high refractive index, which has satisfactory compatibility with a resin serving as a matrix and can maintain high transparency even if added in high concentrations. Also provided is an additive with which the function of imparting both ultraviolet absorbency and a high refractive index can be realized by means of one kind of additive. This additive is represented by the following Formula (I):

##STR00001## wherein at least one of R.sup.1a to R.sup.9a is a monovalent sulfur-containing group represented by the following Formula (i-1) or Formula (i-2):

##STR00002## wherein R.sup.10a to R.sup.12a each represent a divalent hydrocarbon group or the like; and R.sup.13a represents a monovalent hydrocarbon group or the like.

An organic electroluminescence device comprising: a cathode, an anode, and an organic layer disposed between the cathode and the anode, wherein the organic layer comprises a compound represented by the following formula (1), and a compound A having a Stokes shift of 20 nm or smaller and an emission peak wavelength of 440 nm to 465 nm (at least one of Ar.sub.1 and Ar.sub.2 is a monovalent group having a structure represented by the following formula (2)).

##STR00001##

An organic electroluminescence device comprising: a cathode, an anode, and an organic layer disposed between the cathode and the anode, wherein the organic layer comprises a compound represented by the following formula (1), and a compound A having a Stokes shift of 20 nm or smaller and an emission peak wavelength of 440 nm to 465 nm (at least one of Ar.sub.1 and Ar.sub.2 is a monovalent group having a structure represented by the following formula (2)).

##STR00001##

A compound represented by the following formula (1), wherein in the formula, L.sub.1 and L.sub.2 are predetermined linking groups, and Ar.sub.1 is a monovalent group having a structure represented by the following formula (2).

##STR00001##