Patent classifications
C07C2601/20
Asymmetric catalytic decarboxylative alkyl alkylation using low catalyst concentrations and a robust precatalyst
This invention provides efficient and scalable enantioselective methods that yield 2-alkyl-2-allylcycloalkyanone compounds with quaternary stereogenic centers. Methods include the method for the preparation of a compound of formula (I): ##STR00001##
comprising treating a compound of formula (II) or (III): ##STR00002##
with a palladium (II) catalyst under alkylation conditions.
Organic Compound, Light-Emitting Device, Light-Emitting Apparatus, Electronic Equipment, Lighting Device, and Electronic Device
A novel organic compound is provided. A novel organic compound having a carrier-transport property is provided. A novel organic compound having a hole-transport property is provided. An organic compound having a low refractive index is provided. An organic compound having a low refractive index and a carrier-transport property is provided. An organic compound having a low refractive index and a hole-transport property is provided. An organic compound represented by the following general formula (G1) is provided.
##STR00001##
Resist composition, patterning process, and barium, cesium and cerium salts
A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of -fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
METHOD FOR PREPARING SUBSTITUTED ALKYL CYCLOALKANONES
The present invention relates to a method for producing a substituted alkyl cycloalkanone of formula (I), having the alkylation of a cycloalkanone of formula (II) with an alkene derivative of formula (III) in the presence of a metal oxide, where n is 2 to 20, m is 0 to 10, and R is a functional group.
COMPOUNDS, COMPOSITIONS, AND METHODS FOR MODULATING FERROPTOSIS AND TREATING EXCITOTOXIC DISORDERS
The present invention provides, inter alia, a compound having the structure:
##STR00001##
Also provided are compositions containing a pharmaceutically acceptable carrier and a compound according to the present invention. Further provided are methods for treating or ameliorating the effects of an excitotoxic disorder in a subject, methods of modulating ferroptosis in a subject, methods of reducing reactive oxygen species (ROS) in a cell, and methods for treating or ameliorating the effects of a neurodegenerative disease.
Preparation and use of cyclododecatriene trialdehyde and related compounds
Disclosed herein are compositions and methods related to the hydroformylation of cyclododecatriene to form cyclododecatriene trialdehyde, and the conversion of the trialdehyde to the polyphenols of Formula 1: ##STR00001## where R, m p and Q are as defined herein. Curable compositions comprising compounds of Formula 1, including powder coating compositions, and methods of curing the compositions are also disclosed.
PREPARATION AND USE OF CYCLODODECATRIENE TRIALDEHYDE AND RELATED COMPOUNDS
Disclosed herein are compositions and methods related to the hydroformylation of cyclododecatriene to form cyclododecatriene trialdehyde, and the conversion of the trialdehyde to the polyphenols of Formula 1:
##STR00001##
where R, m p and Q are as defined herein. Curable compositions comprising compounds of Formula 1, including powder coating compositions, and methods of curing the compositions are also disclosed.
Catalyst system for producing ketones from epoxides
A catalyst composition is useful for producing a ketone from a compound containing at least one epoxide group, and the catalyst composition contains at least one precious metal; and at least one mixed oxide; wherein the mixed oxide contains zirconium dioxide and silicon dioxide; wherein the precious metal is supported and the support is not entirely made of the mixed oxide; and wherein a mass ratio of zirconium dioxide to silicon dioxide in the mixed oxide is 86:14 to 99.9:0.1.
RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS
A resist composition comprising a base resin comprising acid labile group-containing recurring units and preferably acid generator-containing recurring units, and a sodium, magnesium, potassium, calcium, rubidium, strontium, yttrium, cesium, barium or cerium salt of -fluorinated sulfonic acid bonded to an alkyl, alkenyl, alkynyl or aryl group exhibits a high resolution and sensitivity and forms a pattern of satisfactory profile with minimal LWR after exposure and development.
Sulfonium salt, resist composition and resist pattern forming process
A sulfonium salt of formula (0-1) is provided wherein W is alkylene or arylene, R.sup.01 is a monovalent hydrocarbon group, m is 0, 1 or 2, k is an integer: 0k5+4m, R.sup.101, R.sup.102 and R.sup.103 are a monovalent hydrocarbon group, or at least two of R.sup.101, R.sup.102 and R.sup.103 may bond together to form a ring with the sulfur atom, and L is a single bond, ester, sulfonic acid ester, carbonate or carbamate bond. A resist composition comprising the sulfonium salt as PAG exhibits a very high resolution when processed by EB and EUV lithography. A pattern with minimal LER is obtainable. ##STR00001##