Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001## wherein R.sup.1, R.sup.2 and R.sup.3 each represent a hydroxy group, *—O—R.sup.10, *—O—CO—O—R.sup.10, etc.; L.sup.10 represents an alkanediyl group; R.sup.10 represents an acid-labile group; R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group which may have a substituent, and —CH.sub.2— included in the hydrocarbon group may be replaced by —O—, —CO—, —S— or —SO.sub.2—; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; and AI.sup.− represents an organic anion.

Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: ##STR00001## wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: ##STR00001## wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, the group may have a substituent, —CH.sub.2— in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, the group may have a substituent, —CH.sub.2— in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

The present invention relates to a compound having a general formula selected from the group consisting of formula 1a and 1b, wherein K represents an aromatic or heteroaromatic group in which at least one hydrogen atom may be substituted by a functional groups selected from the group consisting of a sulfonic acid group, a sulfuric acid group, an ammonium group and an aliphatic group; X is selected from the group consisting of a C—C-bond, O, S, SO.sub.2 and NR′, wherein R′ represents a hydrogen or an aliphatic or aromatic group; A represents a fluorinated or perfluorinated aromatic group; n represents an integer in the range from 2 to 6; m represents an integer in the range from 1 to 3. The present invention also relates to a composition comprising this compound, to a process for the preparation of a conductive layer using this composition, to a conductive layer comprising the compound according to the present invention, to electronic components comprising this conductive layer and to the use of the compound according to the present invention as an additive in a hole-injection layer of an OLED or in an organic solar cell.

##STR00001##

The present invention relates to a compound having a general formula selected from the group consisting of formula 1a and 1b, wherein K represents an aromatic or heteroaromatic group in which at least one hydrogen atom may be substituted by a functional groups selected from the group consisting of a sulfonic acid group, a sulfuric acid group, an ammonium group and an aliphatic group; X is selected from the group consisting of a C—C-bond, O, S, SO.sub.2 and NR′, wherein R′ represents a hydrogen or an aliphatic or aromatic group; A represents a fluorinated or perfluorinated aromatic group; n represents an integer in the range from 2 to 6; m represents an integer in the range from 1 to 3. The present invention also relates to a composition comprising this compound, to a process for the preparation of a conductive layer using this composition, to a conductive layer comprising the compound according to the present invention, to electronic components comprising this conductive layer and to the use of the compound according to the present invention as an additive in a hole-injection layer of an OLED or in an organic solar cell.

##STR00001##

The present disclosure provides a compound of Formula (I):

##STR00001##

or a pharmaceutically acceptable salt thereof as described herein. The present disclosure also provides pharmaceutical compositions comprising a compound of Formula (I), processes for preparing compounds of Formula (I), and therapeutic methods for treating inflammatory disease.

An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a composition formed of the compound, a cured product, an optically anisotropic body, and a reflective film.

The compound of the present invention is a compound represented by General Formula (1).

##STR00001##

An object of the present invention is to provide a compound having an excellent rate of change in HTP caused by exposure. Another object of the present invention is to provide a composition formed of the compound, a cured product, an optically anisotropic body, and a reflective film.

The compound of the present invention is a compound represented by General Formula (1).

##STR00001##