An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

A salt represented by the formula (I): ##STR00001##

A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. R.sup.1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X.sup.1 and X.sup.2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X.sup.1 is —NR′—, R.sup.2 is a monovalent organic group or a hydrogen atom. In a case where X.sup.2 is —NR′—, R.sup.3 is a monovalent organic group or a hydrogen atom. In a case where neither X.sup.1 nor X.sup.2 is —NR′—, R.sup.2 and R.sup.3 are each independently a monovalent organic group. ##STR00001##

A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent. R.sup.1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X.sup.1 and X.sup.2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X.sup.1 is —NR′—, R.sup.2 is a monovalent organic group or a hydrogen atom. In a case where X.sup.2 is —NR′—, R.sup.3 is a monovalent organic group or a hydrogen atom. In a case where neither X.sup.1 nor X.sup.2 is —NR′—, R.sup.2 and R.sup.3 are each independently a monovalent organic group. ##STR00001##

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

A method for producing an actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention is a method for producing an actinic ray-sensitive or radiation-sensitive resin composition including at least a resin having a polarity that increases due to decomposition by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, and a solvent, in which the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more compounds selected from the group consisting of a compound (I) to (III) below, and the actinic ray-sensitive or radiation-sensitive resin composition is produced by mixing a first solution including the resin having a polarity that increases by the action of an acid and a first solvent with the one or more compounds selected from the group consisting of the compound (I) to (III).

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin.

M.sub.1.sup.+A.sup.−-L-B.sup.−M.sub.2.sup.+  (I)

The disclosure provides recording materials including aromatic substituted methane-core derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed for monomers and polymers for use in Bragg gratings applications leading to materials with higher refractive index, low birefringence, and high transparency. The disclosed derivatized monomers and polymers thereof can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.