Provided are a salt capable of producing a resist pattern with satisfactory CD Uniformity (CDU), an acid generator, and a resist composition. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition: ##STR00001##
wherein, in formula (I), R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8 and R.sup.9 each represent a halogen atom, a haloalkyl group, etc.; A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, etc.; m1 and m4, m5, m6 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, 0m1+m75, 0m2+m84, 0m3+m94, and at least one of m1, m2 and m3 represents an integer of 1 or more; X.sup.4 represents a single bond, CH.sub.2, O, S, CO, SO or SO.sub.2; and AI.sup. represents an organic anion.