A polyorganosiloxane resin represented by the following general formula (5): (R.sub.3SiO.sub.1/2).sub.1(R.sub.2SiO.sub.2/2).sub.m(RSiO.sub.3/2).sub.n(SiO.sub.4/2).sub.o (5) wherein R is, independently of each other, a hydrogen atom or a monovalent hydrocarbon group having 1 to 18 carbon atoms, and optionally having an oxygen, halogen, nitrogen or sulfur atom; l, m and o are, independently of each other, an integer of from 0 to 10,000; n is an integer of from 1 to 10,000; a total of l, m and n is from 2 to 30,000; and at least one R is a hydrogen atom and at least one R is an OX group in the molecule, wherein X is an alkyl group having 1 to 10 carbon atoms or an alkoxyalkyl group having 2 to 10 carbon atoms; and at least one hydrogen atom and at least one OX group bond to one and the same silicon atom.

The invention relates to a process for preparing dimeric and/or trimeric silanes by conversion of monosilane in a plasma and to a plant for performance of the process.

The invention relates to a process for preparing dimeric and/or trimeric silanes by conversion of monosilane in a plasma and to a plant for performance of the process.

A composition containing 2-ethylhexyl silicate, is produced by heating a reaction mixture of ethyl silicate with an excess amount of 2-ethylhexanol in the presence of titanium tetrabutoxide as catalyst to a temperature below the boiling point of 2-ethylhexanol while mixing, allowing the reaction mixture to react and, after the reaction, removing ethanol and excess 2-ethylhexanol from the reaction mixture by distillation and obtaining the composition containing 2-ethylhexyl silicate.

Organoaminosilanes, such as without limitation di-iso-propylaminosilane (DIPAS), are precursors for the deposition of silicon containing films such as silicon-oxide and silicon-nitride films. Described herein are methods to make organoaminosilane compounds, or other compounds such as organoaminodisilanes and organoaminocarbosilanes, via the catalytic hydrosilylation of an imine by a silicon source comprising a hydridosilane.

To provide a material suitable for a nonaqueous electrolyte battery having high-temperature durability. An ionic complex of the present invention is represented by any of the following formulae (1) to (3). For example, in the formula (1), A is a metal ion, a proton, or an onium ion; M is any of groups 13 to 15 elements. R.sup.1 represents a C.sub.1 to C.sub.10 hydrocarbon group which may have a ring, a heteroatom, or a halogen atom, or N(R.sup.2). R.sup.2 at this time represents hydrogen atom, alkali metal atom, a C.sub.1 to C.sub.10 hydrocarbon group which may have a ring, a heteroatom, or a halogen atom. R.sup.2 can also have a branched chain or a ring structure when the number of carbon atoms is 3 or more. Y is carbon atom or sulfur atom. a, o, n, p, q, and r are each predetermined integers.

##STR00001##

The present invention relates to novel calcium-containing microporous zirconium silicate compositions that are formulated to remove toxins, e.g. potassium ions, from the gastrointestinal tract at an elevated rate without removing calcium from the patient's body. Also disclosed are methods of using calcium-free or low calcium microporous zirconium silicate compositions for the treatment of hyperkalemia in patients also suffering from hypercalcemia.

In one aspect, the present invention provides undoped and doped siloxanes, germoxanes, and silagermoxanes that are substantially free from carbon and other undesired contaminants. In a second aspect, the present invention provides methods for making such undoped and doped siloxanes, germoxanes, and silagermoxanes. In still another aspect, the present invention provides compositions comprising undoped and/or doped siloxanes, germoxanes, and silagermoxanes and a solvent, and methods for forming undoped and doped dielectric films from such compositions. Undoped and/or doped siloxane compositions as described advantageously provide undoped and/or doped dielectric precursor inks that may be employed in forming substantially carbon-free undoped and/or doped dielectric films.

The present invention relates to a catalyst system comprising a procatalyst, a co-catalyst and an external electron donor, wherein the external electron donor comprises a compound having the structure according to Formula I: Si(L).sub.n(OR.sup.11).sub.4-n (Formula I), wherein, Si is a silicon atom with valency 4+; O is an oxygen atom with valency 2 and O is bonded to Si via the silicon-oxygen bond; n is 1, 2, 3 or 4; R.sup.11 is a selected from the group consisting of linear, branched and cyclic alkyl having at most 20 carbon atoms and aromatic substituted and unsubstituted hydrocarbyl having 6 to 20 carbon atoms; L is a group represented by (Formula II), wherein, L is bonded to the silicon atom via the nitrogen-silicon bond; L has a single substituent on the nitrogen atom, where this single substituent is an imine carbon atom; and X and Y are independently selected from the group consisting of a hydrogen atom; a heteroatom selected from group 13, 14, 15, 16 or 17 of the IUPAC Periodic Table of the Elements; a linear, branched and cyclic alkyl having at most 20 carbon atoms, optionally containing a heteroatom selected from group 13, 14, 15, 16 or 17 of the IUPAC Periodic Table of the Elements and an aromatic substituted and unsubstituted hydrocarbyl having 6 to 20 carbon atoms, optionally containing a heteroatom selected from group 13, 14, 15, 16 or 7 of the IUPAC Periodic Table of the Elements. ##STR00001##

Disclosed are methods of synthesizing an amino(halo)silane comprising the step of reacting a halosilane having the formula Si.sub.aH.sub.bX.sub.c with an aminosilane having the formula Si.sub.dH.sub.e(NR.sup.1R.sup.2).sub.f to produce the amino(halo)silane having the formula Si.sub.wH.sub.xX.sub.y(NR.sup.1R.sup.2).sub.z, wherein X=Br or I; each R.sup.1 and R.sup.2 is independently selected from a C.sub.1-C.sub.10 alkyl, aryl, or hetero group; a, d, and w independently=1 to 4; b+c=2a+2; b=1 to 2a+1; c=1 to 2a+1; e+f=2d+2; e=1 to 2d+1; f=1 to 2d+1; x+y+z=2w+2; and R.sup.1 and R.sup.2 may be joined to form a nitrogen-containing heterocycle.