Patent classifications
C07F7/025
SYNTHESIS AND USE OF MULTI-FUNCTIONAL DIAZIRINE ADHESIVES FOR ELASTOMER BONDING
The disclosure provides multi-functional diazirine adhesives and methods of synthesis and use thereof, for example methods of use for polymer and/or elastomer bonding.
Halogen free syntheses of aminosilanes by catalytic dehydrogenative coupling
Compounds and method of preparation of Si—X and Ge—X compounds (X=N, P, As and Sb) via dehydrogenative coupling between the corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metallic catalysts is described. This new approach is based on the catalytic dehydrogenative coupling of a Si—H and a X—H moiety to form a Si—X containing compound and hydrogen gas (X=N, P, As and Sb). The process can be catalyzed by transition metal heterogenous catalysts such as Ru(O) on carbon, Pd(O) on MgO) as well as transition metal organometallic complexes that act as homogeneous catalysts. The —Si—X products produced by dehydrogenative coupling are inherently halogen free. Said compounds can be useful for the deposition of thin films by chemical vapor deposition or atomic layer deposition of Si—containing films.
Anode for lithium ion secondary battery and lithium ion secondary battery
A lithium ion secondary battery includes a cathode, an anode, and an electrolytic solution. The anode includes a cyclic compound and the cyclic compound includes one or more of a first cyclic compound, a second cyclic compound, and a third cyclic compound.
PHENALENE-1-ONE-CONTAINING PHOTOSENSITIZER COMPOSITION, PHENALENE-1-ONE COMPOUND AND THE USE THEREOF
A phenalene-1-one compound, a photosensitizer composition including the phenalene-1-one compound, an article including the phenalene-1-one compound and/or photosensitizer composition and the use thereof.
SILICON ION COMPLEX ORGANIZED WITH CARBOXYLIC ACID, METHOD FOR MANUFACTURING COMPLEX, AND PRODUCT USING SAME
Proposed is a technology related to the ionization of silicon, and more particularly, to a technology for ionization by organizing silicon using a water-soluble silicate with a tricarboxylic acid or a dicarboxylic acid. This technology enables preparation and use of products containing an organized silicon ion complex in a variety of applications including foods such as water and beverages and medical products, as well as electrochemical applications. In particular, it is expected to treat and prevent various diseases caused by silicon deficiency by providing an organized form of silicon that does not exist as an ion in nature.
Silicon chalcogenate precursors comprising a chemical formula of si(XR1)nR24-n and methods of forming the silicon chalcogenate precursors
A silicon chalcogenate precursor comprising the chemical formula of Si(XR.sup.1).sub.nR.sup.2.sub.4-n, where X is sulfur, selenium, or tellurium, R.sup.1 is hydrogen, an alkyl group, a substituted alkyl group, an alkoxide group, a substituted alkoxide group, an amide group, a substituted amide group, an amine group, a substituted amine group, or a halogen group, each R.sup.2 is independently hydrogen, an alkyl group, a substituted alkyl group, an alkoxide group, a substituted alkoxide group, an amide group, a substituted amide group, an amine group, a substituted amine group, or a halogen group, and n is 1, 2, 3, or 4. Methods of forming the silicon chalcogenate precursor, methods of forming silicon nitride, and methods of forming a semiconductor structure are also disclosed.
High purity trisilylamine, methods of making, and use
A composition, comprising: trisilylamine and less than 5 ppmw of halogen. A method of making a silylamine comprising combining ammonia and a compound comprising aminosilane functionality, where the compound comprising aminosilane functionality is according to formula (I) R.sup.1 N(R.sup.2)a(SiH.sub.3).sub.2−a (I), where R.sup.1 is an organic polymer, a C-.sub.1-20 hydrocarbyl group or —SiR.sup.3.sub.3.sup.1, where R.sup.3 is C.sub.1-6 hydrocarbyl, R.sup.2 is a C-.sub.1-20 hydrocarbyl group, H, or —SiR.sup.3.sub.3.sup.1, where R.sup.3 is as defined above, subscript a is 0 or 1, provided that R.sup.1 and R.sup.2 may be the same or different except if R.sup.1 is phenyl, R.sup.2 is not phenyl, under sufficient conditions to cause a reaction to form a silylamine and a byproduct.
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
Methods are disclosed for forming a Silicon Metal Oxide film using a mono-substituted TSA precursor. The precursors have the formula: (SiH3)2N—SiH2-X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C4-C10 saturated or unsaturated heterocycle; or an alkoxy group.
N-ALKYL SUBSTITUTED CYCLIC AND OLIGOMERIC PERHYDRIDOSILAZANES, METHODS OF PREPARATION THEREOF, AND SILICON NITRIDE FILMS FORMED THEREFROM
Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.
Green methods for preparing highly CO2 selective and H2S tolerant metal organic frameworks
A green route for preparing a metal organic framework include mixing metal precursor with a ligand precursor to form a solvent-free mixture; adding droplets of water to the mixture; heating the mixture at a first temperature after adding the water; and isolating the metal organic framework material including the metal and the ligand.