Processes and apparatus for preparing bimodal polymers are provided. In some embodiments, processes include introducing a monomer, a first diluent, a catalyst, hydrogen, at a first hydrogen concentration, and optional comonomer, to a first loop reactor to produce, under polymerization conditions, a first slurry of polymer solids. Processes may also include continuously discharging the first slurry of polymer solids from the loop reactor as a first polymerization effluent to a first flash tank; separating the first polymerization effluent in the first flash tank to provide a first concentrated polymer slurry with significantly lower hydrogen concentration; and transferring the first concentrated polymer slurry from the flash tank to a re-slurry mixer. Processes may further include introducing a re-slurry mixer diluent to the first concentrated polymer slurry to form a second concentrated polymer slurry in the re-slurry mixer that can be pumped to a second slurry loop reactor.

The present disclosure relates to a purification method of a polymerization solvent used in and recovered from the preparation of a polyolefin resin, which can effectively remove impurities, in particular polyolefin wax, from the polymerization solvent to obtain a purified polymerization solvent with high purity, and can improve energy efficiency.

The present disclosure relates to a purification method of a polymerization solvent used in and recovered from the preparation of a polyolefin resin, which can effectively remove impurities, in particular polyolefin wax, from the polymerization solvent to obtain a purified polymerization solvent with high purity, and can improve energy efficiency.

The disclosure provides a method for removing a C4-C20 hydrophilic compound. The method for removing a hydrophilic compound includes step (a) of exposing a composition containing a C4-C20 hydrophilic compound to 0.1 to 500 kGy of radiation to remove the hydrophilic compound.

The disclosure provides a method for removing a C4-C20 hydrophilic compound. The method for removing a hydrophilic compound includes step (a) of exposing a composition containing a C4-C20 hydrophilic compound to 0.1 to 500 kGy of radiation to remove the hydrophilic compound.

Processes and apparatus for preparing bimodal polymers are provided. In some embodiments, processes include introducing a monomer, a first diluent, a catalyst, hydrogen, at a first hydrogen concentration, and optional comonomer, to a first loop reactor to produce, under polymerization conditions, a first slurry of polymer solids. Processes may also include continuously discharging the first slurry of polymer solids from the loop reactor as a first polymerization effluent to a first flash tank; separating the first polymerization effluent in the first flash tank to provide a first concentrated polymer slurry with significantly lower hydrogen concentration; and transferring the first concentrated polymer slurry from the flash tank to a re-slurry mixer. Processes may further include introducing a re-slurry mixer diluent to the first concentrated polymer slurry to form a second concentrated polymer slurry in the re-slurry mixer that can be pumped to a second slurry loop reactor.

Processes and apparatus for preparing bimodal polymers are provided. In some embodiments, processes include introducing a monomer, a first diluent, a catalyst, hydrogen, at a first hydrogen concentration, and optional comonomer, to a first loop reactor to produce, under polymerization conditions, a first slurry of polymer solids. Processes may also include continuously discharging the first slurry of polymer solids from the loop reactor as a first polymerization effluent to a first flash tank; separating the first polymerization effluent in the first flash tank to provide a first concentrated polymer slurry with significantly lower hydrogen concentration; and transferring the first concentrated polymer slurry from the flash tank to a re-slurry mixer. Processes may further include introducing a re-slurry mixer diluent to the first concentrated polymer slurry to form a second concentrated polymer slurry in the re-slurry mixer that can be pumped to a second slurry loop reactor.

Provided is a new method that effectively reduces odor components that are present in a hydrogenated petroleum resin, and adjusts a softening point to an appropriate range for exhibiting an adhesive performance.

A method for deodorizing a hydrogenated petroleum resin, includes stripping a hydrogenated petroleum resin at a gas flow rate of 1 to 45 VVM.

Provided is a new method that effectively reduces odor components that are present in a hydrogenated petroleum resin, and adjusts a softening point to an appropriate range for exhibiting an adhesive performance.

A method for deodorizing a hydrogenated petroleum resin, includes stripping a hydrogenated petroleum resin at a gas flow rate of 1 to 45 VVM.

The invention relates to an extruder (30) comprising a housing (31), a first material inlet (32) for a mixture (46) at least consisting of a solvent and a dissolved medium, a material outlet (33), a screw (35), a screw drive (34), and at least one distillation region (36a-d) between the inlet (32) and the outlet (33), which allows an outflow of solvent, and a discharge line (43-45) for the solvent.