Embodiments of the present application relate to porous polymeric beads solid support for use in oligonucleotide synthesis and the method of producing and using the same. Further embodiments relate to porous polymeric beads and method for preparing and using the same.

Embodiments of the present application relate to porous polymeric beads solid support for use in oligonucleotide synthesis and the method of producing and using the same. Further embodiments relate to porous polymeric beads and method for preparing and using the same.

A resin composition includes 100 parts by weight of a polyolefin and 20 parts by weight to 150 parts by weight of a homopolymer of Formula (1). The resin composition is useful for making different articles, including a prepreg, a resin film, a laminate or a printed circuit board, which may achieve excellent multi-layer board thermal resistance and thermal resistance after moisture absorption and achieve high glass transition temperature, low dissipation factor, and low Z-axis ratio of thermal expansion. ##STR00001##

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise a first polymerizable monomer having a structure of Formula (1) or Formula (2):

##STR00001##

with X being C.sub.1-C.sub.4-alkyl or oxygen (O); n being 0 or 1 Y.sub.1, Y.sub.2 being

##STR00002##

with R.sub.3 or, with R.sub.3 being H or methyl, wherein Y.sub.1 and Y.sub.2 may be the same or different and an amount of Y.sub.1 and Y.sub.2 per benzene ring being 1, 2, or 3; R.sub.1, R.sub.2 being substituted or unsubstituted alkyl or aryl, and an amount of each of R.sub.1 and R.sub.2 per benzene ring being 0, 1, 2, 3, or 4.

A photocurable composition can comprise a polymerizable material and a photoinitiator, wherein the polymerizable material can comprise a first polymerizable monomer having a structure of Formula (1) or Formula (2):

##STR00001##

with X being C.sub.1-C.sub.4-alkyl or oxygen (O); n being 0 or 1 Y.sub.1, Y.sub.2 being

##STR00002##

with R.sub.3 or, with R.sub.3 being H or methyl, wherein Y.sub.1 and Y.sub.2 may be the same or different and an amount of Y.sub.1 and Y.sub.2 per benzene ring being 1, 2, or 3; R.sub.1, R.sub.2 being substituted or unsubstituted alkyl or aryl, and an amount of each of R.sub.1 and R.sub.2 per benzene ring being 0, 1, 2, 3, or 4.

Disclosed are a polymer, and a mixture or a formulation and an organic electronic device containing same, and applications thereof, and further a monomer of which the polymer is made; the polymer comprises on its side chain a repeating structure unit E, characterizing in that its (S1(E)−T1(E))≦0.35 eV or even less, which may allow the said polymer having thermally activated delayed fluorescence (TADF) property. Thus a TADF polymer suitable for printing processes is provided, thereby reducing OLED manufacturing costs.

A polymer comprising recurring units derived from vinylanthraquinone, recurring units containing a benzene ring having a hydroxyl-bearing tertiary alkyl group bonded thereto, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a negative resist composition having a high resolution and minimal LER.

Provided is a resin material showing a high thermal conductivity and having high heat resistance while having a low dielectric constant and a low dielectric loss tangent. The material is a polyfunctional vinyl resin, which is represented by the following general formula (1):

##STR00001##

where R.sup.1s each independently represent a hydrocarbon group having 1 to 8 carbon atoms, R.sup.2s each independently represent a hydrogen atom or a dicyclopentenyl group, and at least one thereof represents a dicyclopentenyl group, Xs each independently represent a hydrogen atom or a vinyl group-containing aromatic group represented by the formula (1a), and at least one thereof represents a vinyl group-containing aromatic group, “n” represents a number of repetitions, and the average thereof is a number of from 1 to 5, and Ar represents an aromatic ring.

A polymer comprising recurring units derived from vinylanthraquinone, recurring units derived from acid labile group-substituted hydroxystyrene, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a positive resist composition having a high resolution and minimal LER.

There are provided A pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units.