C08F30/08

SILICONE-ACRYLATE POLYMERS, COPOLYMERS, AND RELATED METHODS AND COMPOSITIONS

A liquid composition is disclosed. The liquid composition comprises a silicone-acrylate polymer. The silicone-acrylate polymer comprises acrylate-derived monomeric units comprising siloxane moieties, optionally epoxide-functional moieties, and optionally, hydrocarbyl moieties. A method of preparing the silicone-acrylate polymer and the liquid composition is also disclosed.

SILICONE-ACRYLATE POLYMERS, COPOLYMERS, AND RELATED METHODS AND COMPOSITIONS

A liquid composition is disclosed. The liquid composition comprises a silicone-acrylate polymer. The silicone-acrylate polymer comprises acrylate-derived monomeric units comprising siloxane moieties, optionally epoxide-functional moieties, and optionally, hydrocarbyl moieties. A method of preparing the silicone-acrylate polymer and the liquid composition is also disclosed.

SILICONE-ACRYLATE POLYMERS, COPOLYMERS, AND RELATED METHODS AND COMPOSITIONS

A liquid composition is disclosed. The liquid composition comprises a silicone-acrylate polymer. The silicone-acrylate polymer comprises acrylate-derived monomeric units comprising siloxane moieties, optionally epoxide-functional moieties, and optionally, hydrocarbyl moieties. A method of preparing the silicone-acrylate polymer and the liquid composition is also disclosed.

COMPOSITION, PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
20230104730 · 2023-04-06 · ·

According to one embodiment, a composition including a compound is provided. The compound includes a linking group containing 2 to 18 carbon atoms, a polymerizable functional group bonded to the linking group, a first reactive group bonded to the linking group, and a second reactive group bonded to the linking group. The polymerizable functional group includes at least one of a (meth)acryloyl group or a vinyl group. The first reactive group includes at least one selected from the group consisting of a thiol group, a disulfide group, and a thiocyanate group. The second reactive group includes at least one selected from the group consisting of an alkoxysilane group, a chlorosilane group, and a hydroxyl group.

COMPOSITION, PATTERN FORMING METHOD, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
20230104730 · 2023-04-06 · ·

According to one embodiment, a composition including a compound is provided. The compound includes a linking group containing 2 to 18 carbon atoms, a polymerizable functional group bonded to the linking group, a first reactive group bonded to the linking group, and a second reactive group bonded to the linking group. The polymerizable functional group includes at least one of a (meth)acryloyl group or a vinyl group. The first reactive group includes at least one selected from the group consisting of a thiol group, a disulfide group, and a thiocyanate group. The second reactive group includes at least one selected from the group consisting of an alkoxysilane group, a chlorosilane group, and a hydroxyl group.

Reflective particle, particle dispersion liquid, display medium, and display device
09822201 · 2017-11-21 · ·

The invention relates to reflective particles containing a resin containing a structural unit derived from a compound represented by the following Formula (1), wherein in the formula (1), R represents a polymerizable group except a vinyl group, Ar represents an aromatic group, and W represents a single bond or a divalent linking group.
R—W—Ar  Formula (1)

Reflective particle, particle dispersion liquid, display medium, and display device
09822201 · 2017-11-21 · ·

The invention relates to reflective particles containing a resin containing a structural unit derived from a compound represented by the following Formula (1), wherein in the formula (1), R represents a polymerizable group except a vinyl group, Ar represents an aromatic group, and W represents a single bond or a divalent linking group.
R—W—Ar  Formula (1)

Acrylic polymers, aqueous polymeric dispersions prepared therefrom, and curable film-forming compositions prepared therefrom

The present invention is directed to an acrylic polymer prepared from a reaction mixture comprising: (i) an ethylenically unsaturated monomer comprising hydroxyl functional groups; (ii) an ethylenically unsaturated monomer comprising polydialkylsiloxane groups; (iii) an ethylenically unsaturated monomer comprising carboxylic acid functional groups or amine functional groups; and (iv) a reactive diluent that is reactive with the ethylenically unsaturated monomer (iii). The reactive diluent (iv) is present initially in the reaction mixture as a medium in which the monomers polymerize. The present invention is further directed to aqueous polymeric dispersions prepared therefrom and aqueous, curable film-forming compositions prepared from the dispersions. The curable film-forming compositions are low VOC and are useful in methods of mitigating dirt build-up on a substrate.

Acrylic polymers, aqueous polymeric dispersions prepared therefrom, and curable film-forming compositions prepared therefrom

The present invention is directed to an acrylic polymer prepared from a reaction mixture comprising: (i) an ethylenically unsaturated monomer comprising hydroxyl functional groups; (ii) an ethylenically unsaturated monomer comprising polydialkylsiloxane groups; (iii) an ethylenically unsaturated monomer comprising carboxylic acid functional groups or amine functional groups; and (iv) a reactive diluent that is reactive with the ethylenically unsaturated monomer (iii). The reactive diluent (iv) is present initially in the reaction mixture as a medium in which the monomers polymerize. The present invention is further directed to aqueous polymeric dispersions prepared therefrom and aqueous, curable film-forming compositions prepared from the dispersions. The curable film-forming compositions are low VOC and are useful in methods of mitigating dirt build-up on a substrate.

Chain scission resist compositions for EUV lithography applications

Chain scission resist compositions suitable for EUV lithography applications may include monomer functional groups that improve the kinetics and/or thermodynamics of the scission mechanism. Chain scission resists may include monomer functional groups that reduce the risk that leaving groups generated through the scission mechanism may chemically corrode processing equipment.