A cleaning liquid for excessive powder removal is provided. The cleaning liquid includes a hydrocarbon solvent having an octanol/water partition coefficient (log P.sub.ow value) of 4.5 or more. The cleaning liquid is to remove excessive powder for molding adhering to a solidified object molded using the powder for molding.

Preparation of low-dusting or dust-free waterdispersible crosslinked polyvinylpyrrolidone (PVPP) granules characterized by extruding a dough consisting of said PVPP and water through a die plate and subsequent drying of the granules.

Preparation of low-dusting or dust-free waterdispersible crosslinked polyvinylpyrrolidone (PVPP) granules characterized by extruding a dough consisting of said PVPP and water through a die plate and subsequent drying of the granules.

Nanoparticles having a plurality of PVP chains covalently bonded to a surface of the nanoparticle are provided, along with their methods of formation and the RAFT agents for the polymerization of the PVP chains. RAFT agents are generally provided, along with their methods of formation and use. Methods are also generally provided for grafting a PVP polymer onto a nanoparticle. In one embodiment, the method includes polymerizing a plurality of monomers in the presence of a RAFT agent to form a polymeric chain covalently bonded to the nanoparticle.

Nanoparticles having a plurality of PVP chains covalently bonded to a surface of the nanoparticle are provided, along with their methods of formation and the RAFT agents for the polymerization of the PVP chains. RAFT agents are generally provided, along with their methods of formation and use. Methods are also generally provided for grafting a PVP polymer onto a nanoparticle. In one embodiment, the method includes polymerizing a plurality of monomers in the presence of a RAFT agent to form a polymeric chain covalently bonded to the nanoparticle.

A cleaning solution that is used, inter alia, for removal of residue of a photoresist pattern or etching residue, and has exceptional anticorrosion properties with respect to silicon nitride; and a method for cleaning a substrate using the cleaning solution. In a cleaning solution containing a hydrofluoric acid and a solvent, a polymer that includes units derived from a compound of a specific structure having a carboxylic acid amide bond (CON<) and an unsaturated double bond is blended as an anticorrosive agent. Polyvinylpyrrolidone is preferred as the polymer used as the anticorrosive agent.

In some aspects, the present disclosure pertains to multi-arm polymers that comprise a core and a plurality of polymer segments having a first end that is covalently attached to the core and (a) a second end comprising a moiety that comprises a reactive end group, wherein the polymer segments comprise one or more hydrophilic aprotic NMP-polymerizable monomers, and wherein the reactive multi-arm polymer comprises nitroxide radicals or (b) a second end comprising a moiety that comprises an alkoxyamine group, wherein the core is a polyol residue, and wherein the polymer segments comprise one or more NMP-polymerizable monomers. In some aspects, the present disclosure pertains to a multifunctional alkoxyamine molecule comprising a core and a plurality of alkoxyamine groups covalently attached to the core, wherein the core is a polyol residue.

The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In.sub.2O.sub.3 and Ga.sub.2O.sub.3) into polymethyl methacrylate (PMMA) thin films is demonstrated. Examples highlight the an SIS process using trimethylindium (TMIn) and trimethylgallium (TMGa), respectively, with water. In situ Fourier transform infrared (FTIR) spectroscopy reveals that these metal alkyl precursors reversibly associate with the carbonyl groups of PMMA in analogy to trimethylaluminum (TMAl), however with significantly lower affinity. SIS with TMIn and water enables the growth of In.sub.2O.sub.3 at 80 C., well below the onset temperature of atomic layer deposition (ALD) using these precursors.

The present invention discloses a method for improving the blood compatibility of a material surface by using a controllable grafting technique. The method involves placing a monomer NVP, an RAFT reagent and a solvent acetonitrile in a container, adding an initiator AIBN, mixing the same uniformly, removing oxygen with liquid nitrogen, making the same react in an oil bath; after polymerization, adding liquid nitrogen to quench and stop the reaction, thus obtaining PVP-COOH; mixing the PVP-COOH with DCC and NHS; adding dry dichloromethane to the mixture in a nitrogen atmosphere, adding mercaptoethylamine, and making the same react in darkness at room temperature; obtaining a crude sample; dissolving the crude sample in water, and performing dialysis with deoxygenated water in darkness, and then obtaining HS-PVP by freeze-drying. An AuS bond chemisorption method is used to controllably graft an anti-protein high-molecular polymer onto an Au surface.

The present invention discloses a method for improving the blood compatibility of a material surface by using a controllable grafting technique. The method involves placing a monomer NVP, an RAFT reagent and a solvent acetonitrile in a container, adding an initiator AIBN, mixing the same uniformly, removing oxygen with liquid nitrogen, making the same react in an oil bath; after polymerization, adding liquid nitrogen to quench and stop the reaction, thus obtaining PVP-COOH; mixing the PVP-COOH with DCC and NHS; adding dry dichloromethane to the mixture in a nitrogen atmosphere, adding mercaptoethylamine, and making the same react in darkness at room temperature; obtaining a crude sample; dissolving the crude sample in water, and performing dialysis with deoxygenated water in darkness, and then obtaining HS-PVP by freeze-drying. An AuS bond chemisorption method is used to controllably graft an anti-protein high-molecular polymer onto an Au surface.