The present invention relates to a graft copolymer having excellent thermal stability, a method of preparing the graft copolymer, a thermoplastic resin composition including the graft copolymer, and a molded part including the thermoplastic resin composition. According to the present invention, since the thermoplastic resin composition of the present invention includes the graft copolymer having excellent thermal stability, the thermoplastic resin composition and the molded part manufactured using the thermoplastic resin composition have excellent physical properties, such as impact strength, fluidity, and transparency. Furthermore, the degree of discoloration that may occur when the resin composition or the molded part is allowed to stay in an injection molding machine or stay at a high temperature for a long period of time may be reduced.

The present invention provides a thermoplastic resin composition comprising 10 to 60 mass % of a graft copolymer (A) obtained by graft polymerization of aromatic vinyl monomers and monomers other than maleimide monomers that can be copolymerized with the aromatic vinyl monomers under the presence of a rubbery polymer, 1 to 20 mass % of a copolymer (B) obtained by polymerization of maleimide monomers and other monomers that can be copolymerized with maleimide monomers, 10 to 88 mass % of a copolymer (C) having a reduced viscosity of less than 1.0 dl/g obtained by polymerization of aromatic vinyl monomers and monomers other than maleimide monomers that can be copolymerized with the aromatic vinyl monomers, and 1 to 10 mass % of a copolymer (D) having a reduced viscosity of 1.0 to 3.0 dl/g obtained by polymerization of aromatic vinyl monomers and monomers other than maleimide monomers that can be copolymerized with the aromatic vinyl monomers (the contents of (A) to (D) are each relative to the total amount thereof).

The present invention provides a thermoplastic resin composition comprising 10 to 60 mass % of a graft copolymer (A) obtained by graft polymerization of aromatic vinyl monomers and monomers other than maleimide monomers that can be copolymerized with the aromatic vinyl monomers under the presence of a rubbery polymer, 1 to 20 mass % of a copolymer (B) obtained by polymerization of maleimide monomers and other monomers that can be copolymerized with maleimide monomers, 10 to 88 mass % of a copolymer (C) having a reduced viscosity of less than 1.0 dl/g obtained by polymerization of aromatic vinyl monomers and monomers other than maleimide monomers that can be copolymerized with the aromatic vinyl monomers, and 1 to 10 mass % of a copolymer (D) having a reduced viscosity of 1.0 to 3.0 dl/g obtained by polymerization of aromatic vinyl monomers and monomers other than maleimide monomers that can be copolymerized with the aromatic vinyl monomers (the contents of (A) to (D) are each relative to the total amount thereof).

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition including: a base component which exhibits changed solubility in a developing solution under action of acid and a fluorine additive component which exhibits decomposability to an alkali developing solution, the fluorine additive component including a fluorine resist component having a structural unit derived from a compound represented by general formula (f1-1) in which W represents a polymerizable group-containing group; Rf.sup.1 and Rf.sup.2 each independently represents a hydrogen atom or an electron-withdrawing group; and Rf.sup.3 represents a hydrocarbon group

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A thermoplastic resin composition and a molded article manufactured using the same. The thermoplastic resin composition includes: a base resin including a poly(alkyl (meth)acrylate) resin and an aromatic vinyl copolymer; a polyether-ester-amide block copolymer; and zinc oxide having an average particle diameter of about 0.2 m to about 3 m and a BET specific surface area of about 1 m.sup.2/g to about 20 m.sup.2/g, wherein the aromatic vinyl copolymer is a copolymer of an alkyl (meth)acrylate, an aromatic vinyl monomer, and a monomer copolymerizable with the aromatic vinyl monomer.

A thermoplastic resin composition and a molded article manufactured using the same. The thermoplastic resin composition includes: a base resin including a poly(alkyl (meth)acrylate) resin and an aromatic vinyl copolymer; a polyether-ester-amide block copolymer; and zinc oxide having an average particle diameter of about 0.2 m to about 3 m and a BET specific surface area of about 1 m.sup.2/g to about 20 m.sup.2/g, wherein the aromatic vinyl copolymer is a copolymer of an alkyl (meth)acrylate, an aromatic vinyl monomer, and a monomer copolymerizable with the aromatic vinyl monomer.

A new coating composition comprising, by dry weight based on the total dry weight of the coating composition, i) from 12% to 80% of polymer particles comprising, as polymerized units, by dry weight based on the total dry weight of the polymer particles, from 3% to 70% of a vinyl acetate; from 2% to 65% of a styrene; and from 20% to 55% of (meth)acrylate monomers; ii) from 0.1% to 6% of a wax; and iii) from 14% to 55% of a pigment. A process for making the coating composition.

A new coating composition comprising, by dry weight based on the total dry weight of the coating composition, i) from 12% to 80% of polymer particles comprising, as polymerized units, by dry weight based on the total dry weight of the polymer particles, from 3% to 70% of a vinyl acetate; from 2% to 65% of a styrene; and from 20% to 55% of (meth)acrylate monomers; ii) from 0.1% to 6% of a wax; and iii) from 14% to 55% of a pigment. A process for making the coating composition.

Provided are a pattern forming method including (1) a step of forming a resist underlayer film on a substrate to be processed, (2) a step of forming a resist film on the resist underlayer film, using a resist composition containing (A) a resin having a repeating unit containing a Si atom, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, (3) a step of exposing the resist film, (4) a step of developing the exposed resist film using a developer including an organic solvent, thereby forming a negative tone resist pattern, and (5) a step of processing the resist underlayer film and the substrate to be processed, using the resist pattern as a mask, thereby forming a pattern, in which the content of the resin (A) is 20% by mass or more with respect to the total solid content of the resist composition.

Provided are a pattern forming method including (1) a step of forming a resist underlayer film on a substrate to be processed, (2) a step of forming a resist film on the resist underlayer film, using a resist composition containing (A) a resin having a repeating unit containing a Si atom, and (B) a compound which generates an acid upon irradiation with actinic rays or radiation, (3) a step of exposing the resist film, (4) a step of developing the exposed resist film using a developer including an organic solvent, thereby forming a negative tone resist pattern, and (5) a step of processing the resist underlayer film and the substrate to be processed, using the resist pattern as a mask, thereby forming a pattern, in which the content of the resin (A) is 20% by mass or more with respect to the total solid content of the resist composition.