The present invention relates to a method for manufacturing of partially fluorinated polymers, notably vinylidene fluoride (VDF)-based polymers, in emulsion polymerization, and to a polymer obtained from said method.

Disclosed are copolymers formed by copolymerization of: (1) haloolefin monomers consisting essentially of: (a) hydrofluorolefin selected from the group consisting of hydrofluoroethylenes, hydrofluoropropenes, hydrofluorobutenes, hydrofluoropentenes and combinations of these, and (b) one or more chlorofluoroethylene monomers wherein the mole ratio of said hydrofluoroolefin monomer to said chlorofluoroethylene monomers monomer is from about 0.5:1 to about 1.5:1; and (2) alkyl vinyl ether monomer(s) and/or alkyl vinyl ester monomers consisting essentially of: (a) one or more lower alkyl vinyl ether monomers that are not substituted with a reactive group; and (b) one or more reactive group substituted lower alkyl vinyl ether monomer(s) and/or one or more reactive group substituted, lower alkyl vinyl ester monomer(s), wherein the mole ratio of (2)(a) monomers to said (2)(b) monomers is from about 2:1 to about 6:1.

A method for producing a fluoropolymer, which includes polymerizing a fluoromonomer in a solvent to produce the fluoropolymer. The solvent contains a fluorine-containing ether compound (1) represented by

formula:R.sup.1—O—R.sup.2

wherein R.sup.1 represents a partially fluorinated alkyl group, and R.sup.2 represents a non-fluorinated alkyl group, a partially fluorinated alkyl group, or a completely fluorinated alkyl group, and in the solvent, a content of a fluorine-containing olefin compound (2) represented by

formula:R.sup.3—CF═CF—R.sup.4—O—R.sup.2

wherein R.sup.3 represents H, F, a partially fluorinated alkyl group, or a completely fluorinated alkyl group, R.sup.4 represents a single bond, a partially fluorinated alkylene group, or a completely fluorinated alkylene group, and R.sup.2 is the same as described above, is 1.00% by mass or less based on a content of the fluorine-containing ether compound (1), and wherein the fluoromonomer is selected from tetrafluoroethylene, chlorotrifluoroethylene, and vinylidene fluoride.

Coating compositions are provided. In embodiments, a coating composition comprises a solvent system comprising water; a crosslinked organic additive in the form of particles and comprising a polymerization product of reactants comprising a multifunctional vinyl monomer comprising two or more vinyl groups; a binder; and optionally, one or more of a colorant and a wax. Methods of making and using the coating compositions are also provided.

Coating compositions are provided. In embodiments, a coating composition comprises a solvent system comprising water; a crosslinked organic additive in the form of particles and comprising a polymerization product of reactants comprising a multifunctional vinyl monomer comprising two or more vinyl groups; a binder; and optionally, one or more of a colorant and a wax. Methods of making and using the coating compositions are also provided.

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methoda of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methoda of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

A process for preparing a crosslinked fluoropolymer film, including the successive steps of: (1) formulating an ink containing: (a) the product of the reaction of triethylamine with at least one fluorinated copolymer obtained by radical copolymerization of monomers including: (i) vinylidene fluoride (VDF), (ii) trifluoroethylene (TrFE), (iii) at least one chlorinated monomer of formula —CXCl═CX.sub.1X.sub.2 where X, X.sub.1 and X.sub.2 independently denote H, F or CF.sub.3, wherein at most one of X, X.sub.1 and X.sub.2 denotes CF.sub.3; (b) at least one crosslinking agent; (c) at least one photoinitiator; and (d) at least one organic solvent; (2) applying said ink in film form to a substrate; and (3) UV-irradiating said film. Also, the film capable of being obtained according to this process, and also to the uses thereof, in particular in the manufacture of (opto)electronic devices and more particularly in the manufacture of a gate dielectric layer in a field-effect transistor.

A process for preparing a crosslinked fluoropolymer film, including the successive steps of: (1) formulating an ink containing: (a) the product of the reaction of triethylamine with at least one fluorinated copolymer obtained by radical copolymerization of monomers including: (i) vinylidene fluoride (VDF), (ii) trifluoroethylene (TrFE), (iii) at least one chlorinated monomer of formula —CXCl═CX.sub.1X.sub.2 where X, X.sub.1 and X.sub.2 independently denote H, F or CF.sub.3, wherein at most one of X, X.sub.1 and X.sub.2 denotes CF.sub.3; (b) at least one crosslinking agent; (c) at least one photoinitiator; and (d) at least one organic solvent; (2) applying said ink in film form to a substrate; and (3) UV-irradiating said film. Also, the film capable of being obtained according to this process, and also to the uses thereof, in particular in the manufacture of (opto)electronic devices and more particularly in the manufacture of a gate dielectric layer in a field-effect transistor.

To provide an electrolyte material having a low hydrogen gas permeability and excellent hot water resistance. An electrolyte material comprising a polymer having units represented by the following formula u1 and units based on chlorotrifluoroethylene at the specific proportion: ##STR00001##
wherein Q.sup.11 is a perfluoroalkylene group which may have an etheric oxygen atom, Q.sup.12 is a single bond or a perfluoroalkylene group which may have an etheric oxygen atom, Y.sup.1 is a fluorine atom or the like, s is 0 or 1, R.sup.f1 is a perfluoroalkyl group which may have an etheric oxygen atom, X.sup.1 is an oxygen atom or the like, a is 0 when X.sup.1 is an oxygen, and Z.sup.+ is H.sup.+ or the like.