A tertiary ester-containing aromatic vinyl monomer is prepared by reacting an N-acylimidazole compound with a tertiary alcohol compound in the presence of a metal alkoxide as a reaction promoter. The tertiary ester-containing aromatic vinyl monomer of quality is prepared at a high efficiency and is applicable to resist compositions adapted for the EB and EUV lithography processes.

Provided is a macromolecular material that has self-healing properties, excellent stretchability, and a high degree of freedom in the design of stretchability, strength, and hardness, and that can be produced by a simple method; and also provided is a method for producing the same. The macromolecular material of the present invention comprises a polymer having a host group and a guest group. The host group is a monovalent group formed by removing one hydrogen atom or hydroxy group from a cyclodextrin derivative. The polymer is a polymer of a monomer mixture containing a host group-containing polymerizable monomer, a guest group-containing polymerizable monomer, and a third polymerizable monomer, and the third polymerizable monomer contains a (meth)acrylic ester compound. The host group-containing polymerizable monomer and the guest group-containing polymerizable monomer have a property of being dissolved in the third polymerizable monomer.

Provided is a macromolecular material that has self-healing properties, excellent stretchability, and a high degree of freedom in the design of stretchability, strength, and hardness, and that can be produced by a simple method; and also provided is a method for producing the same. The macromolecular material of the present invention comprises a polymer having a host group and a guest group. The host group is a monovalent group formed by removing one hydrogen atom or hydroxy group from a cyclodextrin derivative. The polymer is a polymer of a monomer mixture containing a host group-containing polymerizable monomer, a guest group-containing polymerizable monomer, and a third polymerizable monomer, and the third polymerizable monomer contains a (meth)acrylic ester compound. The host group-containing polymerizable monomer and the guest group-containing polymerizable monomer have a property of being dissolved in the third polymerizable monomer.

A polymer is defined as comprising repeat units having a cyclic acetal structure fused to an aromatic ring and repeat units derived from an onium salt compound containing a fluorosulfonic acid anion having a polymerizable group and an iodized aromatic ring structure. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR, CDU and DOF, collapse resistance during fine pattern formation, and etch resistance after development.

A polymer is defined as comprising repeat units having a cyclic acetal structure fused to an aromatic ring and repeat units derived from an onium salt compound containing a fluorosulfonic acid anion having a polymerizable group and an iodized aromatic ring structure. A chemically amplified resist composition comprising the polymer has advantages including high sensitivity, high contrast, improved lithography properties, e.g., EL, LWR, CDU and DOF, collapse resistance during fine pattern formation, and etch resistance after development.