A novel copolymer suitable for an optical film which is excellent in optical characteristics and has high retardation even in a thin film state, and an optical film containing the same are provided. A copolymer excellent in optical characteristics and easy to form a composite with a different polymer, and an optical film composed of the same are also provided.

A novel copolymer suitable for an optical film which is excellent in optical characteristics and has high retardation even in a thin film state, and an optical film containing the same are provided. A copolymer excellent in optical characteristics and easy to form a composite with a different polymer, and an optical film composed of the same are also provided.

Provided are a radiation-sensitive resin composition, a resist pattern-forming method and a polymer component. The radiation-sensitive resin composition contains: a polymer component having a first structural unit that includes a phenolic hydroxyl group and a second structural unit that includes an acid-labile group; and a radiation-sensitive acid generator, wherein, the polymer component satisfies inequality (A), wherein, in the inequality (A), X1 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component included in a fraction eluted until a retention time at which a cumulative area accounts for 1% of a total area on a gel permeation chromatography (GPC) elution curve of the polymer component detected by a differential refractometer; and X2 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component.

X1<X2 (A)

Provided are a radiation-sensitive resin composition, a resist pattern-forming method and a polymer component. The radiation-sensitive resin composition contains: a polymer component having a first structural unit that includes a phenolic hydroxyl group and a second structural unit that includes an acid-labile group; and a radiation-sensitive acid generator, wherein, the polymer component satisfies inequality (A), wherein, in the inequality (A), X1 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component included in a fraction eluted until a retention time at which a cumulative area accounts for 1% of a total area on a gel permeation chromatography (GPC) elution curve of the polymer component detected by a differential refractometer; and X2 represents a proportion (mol %) of the first structural unit comprised with respect to total structural units constituting the polymer component.

X1<X2 (A)

The present invention relates to a thermoplastic resin composition, which includes a first copolymer formed by polymerizing a monomer mixture of a (meth)acrylate-based monomer, a vinyl cyan-based monomer and a maleimide-based monomer, and having a refractive index of 1.5170 or less and a glass transition temperature of 115.0 C. or more; and a second copolymer formed by graft-copolymerizing an aromatic vinyl-based monomer and a vinyl cyan-based monomer onto an acrylic rubber polymer, and the thermoplastic resin composition according to the present invention has improved heat resistance, colorability and scratch resistance.

The present invention relates to a thermoplastic resin composition, which includes a first copolymer formed by polymerizing a monomer mixture of a (meth)acrylate-based monomer, a vinyl cyan-based monomer and a maleimide-based monomer, and having a refractive index of 1.5170 or less and a glass transition temperature of 115.0 C. or more; and a second copolymer formed by graft-copolymerizing an aromatic vinyl-based monomer and a vinyl cyan-based monomer onto an acrylic rubber polymer, and the thermoplastic resin composition according to the present invention has improved heat resistance, colorability and scratch resistance.

In the present disclosure, there are provided a vinyl alcohol-based copolymer including a first repeating unit derived from an olefin, a second repeating unit containing a hydroxyl group, and a third repeating unit containing a cyanoalkyloxy group formed by a reaction of the repeating unit containing a hydroxyl group and an unsaturated nitrile-based compound, wherein the third repeating unit is included in an amount of 2 mol % or more and less than 10 mol % with respect to 100 mol % of a total amount of the second repeating unit and the third repeating unit; a method for preparing the same; and a gas barrier film including the same. The vinyl alcohol-based copolymer has excellent moisture stability, thereby exhibiting excellent gas barrier properties even in a humid environment.

In the present disclosure, there are provided a vinyl alcohol-based copolymer including a first repeating unit derived from an olefin, a second repeating unit containing a hydroxyl group, and a third repeating unit containing a cyanoalkyloxy group formed by a reaction of the repeating unit containing a hydroxyl group and an unsaturated nitrile-based compound, wherein the third repeating unit is included in an amount of 2 mol % or more and less than 10 mol % with respect to 100 mol % of a total amount of the second repeating unit and the third repeating unit; a method for preparing the same; and a gas barrier film including the same. The vinyl alcohol-based copolymer has excellent moisture stability, thereby exhibiting excellent gas barrier properties even in a humid environment.

A photocurable composition comprising (a) a cyano-containing silsesquioxane, (b) a cyano-containing ethylenically unsaturated monofunctional monomer, (c) an ethylenically unsaturated polyfunctional monomer, and (d) a photo-polymerization initiator has a long shelf life under light-shielded conditions. A cured product obtained by curing the photocurable composition is a polymeric material which is transparent and lightweight and has a high dielectric constant.

A photocurable composition comprising (a) a cyano-containing silsesquioxane, (b) a cyano-containing ethylenically unsaturated monofunctional monomer, (c) an ethylenically unsaturated polyfunctional monomer, and (d) a photo-polymerization initiator has a long shelf life under light-shielded conditions. A cured product obtained by curing the photocurable composition is a polymeric material which is transparent and lightweight and has a high dielectric constant.