A resin composition and a cured film are provided. The resin composition includes a monomer mixture (A), a siloxane compound (B), a curing agent (C), and inorganic particles (D). The monomer mixture (A) includes a bisphenol fluorene compound (A-1) represented by Formula (I-1). The siloxane compound (B) has a group represented by Formula (II-a).

##STR00001##

A resin composition and a cured film are provided. The resin composition includes a monomer mixture (A), a siloxane compound (B), a curing agent (C), and inorganic particles (D). The monomer mixture (A) includes a bisphenol fluorene compound (A-1) represented by Formula (I-1). The siloxane compound (B) has a group represented by Formula (II-a).

##STR00001##

A compound represented by the formula (I): ##STR00001## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, X.sup.1, X.sup.2, X.sup.a, X.sup.b, L.sup.1, L.sup.2, L.sup.3 and L.sup.4 are defined in the specification.

A compound represented by the formula (I): ##STR00001## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, X.sup.1, X.sup.2, X.sup.a, X.sup.b, L.sup.1, L.sup.2, L.sup.3 and L.sup.4 are defined in the specification.

The present application relates to a multiblock copolymer comprising at least one PA block, at least one PB block, and at least one PC block. PC block is positioned between PA block and PB block, where PC block is a rubber block, and where PA represents a polymer block comprising one or more units of monomer A, PB represents a polymer block comprising one or more units of monomer B, and PC represents a polymer block comprising one or more units of monomer C, with monomers A and B being the same or different.

The present application relates to a multiblock copolymer comprising at least one PA block, at least one PB block, and at least one PC block. PC block is positioned between PA block and PB block, where PC block is a rubber block, and where PA represents a polymer block comprising one or more units of monomer A, PB represents a polymer block comprising one or more units of monomer B, and PC represents a polymer block comprising one or more units of monomer C, with monomers A and B being the same or different.

A polyolefin additive comprising chlorinated polyolefin grafted with an alkyl (meth)acrylate, wherein the alkyl has greater than 10 carbon atoms is provided. Further provided are a method for improving the sag resistance of polyolefins and sag resistant polyolefins.

A polyolefin additive comprising chlorinated polyolefin grafted with an alkyl (meth)acrylate, wherein the alkyl has greater than 10 carbon atoms is provided. Further provided are a method for improving the sag resistance of polyolefins and sag resistant polyolefins.

A hydrophobic intraocular lens (IOL) with excellent non-glistening characteristics, high Abbe number, excellent mechanical properties comprising at least one copolymer comprising: (a) a first monomeric subunit comprising a polymerized (meth)acrylate group and at least one alkoxyalkoxyalkyl side group, (b) a second monomeric subunit different from the first monomeric subunit comprising a polymerized (meth)acrylate group, at least one side group comprising (i) an aryloxy moiety with at least one halogen, and (ii) an aliphatic carbon moiety linking the aryloxy moiety with the polymerized (meth)acrylate group, wherein the aliphatic carbon moiety comprises at least one hydroxyl substituent.

A hydrophobic intraocular lens (IOL) with excellent non-glistening characteristics, high Abbe number, excellent mechanical properties comprising at least one copolymer comprising: (a) a first monomeric subunit comprising a polymerized (meth)acrylate group and at least one alkoxyalkoxyalkyl side group, (b) a second monomeric subunit different from the first monomeric subunit comprising a polymerized (meth)acrylate group, at least one side group comprising (i) an aryloxy moiety with at least one halogen, and (ii) an aliphatic carbon moiety linking the aryloxy moiety with the polymerized (meth)acrylate group, wherein the aliphatic carbon moiety comprises at least one hydroxyl substituent.