Patent classifications
C08F222/1006
TRANSFER FILM, LAMINATE, ACOUSTIC SPEAKER, AND METHOD FOR PRODUCING LAMINATE
An object of the present invention is to provide a transfer film capable of forming a laminate exhibiting excellent antireflection performance in a case of being transferred to a member to be transferred exhibiting a high refractive index. Another object of the present invention is to provide a laminate, an acoustic speaker, and a method for manufacturing a laminate.
A transfer film including a temporary support and a photosensitive composition layer, and further including a first layer having a lower refractive index than the refractive index of the photosensitive composition layer between the temporary support and the photosensitive composition layer, in which a refractive index of the first layer is 1.45 or less.
TRANSFER FILM, LAMINATE, ACOUSTIC SPEAKER, AND METHOD FOR PRODUCING LAMINATE
An object of the present invention is to provide a transfer film capable of forming a laminate exhibiting excellent antireflection performance in a case of being transferred to a member to be transferred exhibiting a high refractive index. Another object of the present invention is to provide a laminate, an acoustic speaker, and a method for manufacturing a laminate.
A transfer film including a temporary support and a photosensitive composition layer, and further including a first layer having a lower refractive index than the refractive index of the photosensitive composition layer between the temporary support and the photosensitive composition layer, in which a refractive index of the first layer is 1.45 or less.
Photocurable resin composition, cured product, and laminate
An object of the present invention is to provide a photocurable resin composition capable of obtaining a cured product having excellent quick curability by irradiation with a low integrated light intensity and flexibility. A photocurable resin composition containing the following components (A) to (E): component (A): a monofunctional urethane (meth)acrylate having a polyether skeleton; component (B): a monofunctional (meth)acrylic monomer having a polyether skeleton and having no urethane skeleton; component (C): a photoradical polymerization initiator; component (D): a polyfunctional (meth)acrylic monomer having 4 or more functionalities; and component (E): a polyester-based plasticizer having no (meth)acryloyl group.
Photocurable resin composition, cured product, and laminate
An object of the present invention is to provide a photocurable resin composition capable of obtaining a cured product having excellent quick curability by irradiation with a low integrated light intensity and flexibility. A photocurable resin composition containing the following components (A) to (E): component (A): a monofunctional urethane (meth)acrylate having a polyether skeleton; component (B): a monofunctional (meth)acrylic monomer having a polyether skeleton and having no urethane skeleton; component (C): a photoradical polymerization initiator; component (D): a polyfunctional (meth)acrylic monomer having 4 or more functionalities; and component (E): a polyester-based plasticizer having no (meth)acryloyl group.
CURABLE COATING COMPOSITION
The present invention relates to a curable coating composition, especially a radiation curable coating composition comprising at least one poly(meth)acrylate compound comprising at least 6 (meth)acrylate groups, at least one unsaturated silane compound, and at least one photoinitiator. Said at least one poly(meth)acrylate compound comprising at least 6 (meth)acrylate groups and said at least one unsaturated silane compound represent at least 95% of the weight of polymerizable compounds present in the composition. Upon radiation-curing, the composition provides an abrasion- and/or scratch-resistant coating.
CURABLE COATING COMPOSITION
The present invention relates to a curable coating composition, especially a radiation curable coating composition comprising at least one poly(meth)acrylate compound comprising at least 6 (meth)acrylate groups, at least one unsaturated silane compound, and at least one photoinitiator. Said at least one poly(meth)acrylate compound comprising at least 6 (meth)acrylate groups and said at least one unsaturated silane compound represent at least 95% of the weight of polymerizable compounds present in the composition. Upon radiation-curing, the composition provides an abrasion- and/or scratch-resistant coating.
PROCESS FOR FUNCTIONALIZING A SURFACE OF A SOLID SUPPORT WITH NANO- OR MICROPARTICLES
In surface functionalization of a surface with nano- or microparticles, a process is for functionalizing a surface of a solid support with nano- or microparticles. Polymers include polymerized amine-functionalized monomer units. The polymers are used to functionalize a solid support with nano- or microparticles. The resulting nano- or microparticles functionalized polymers includes polymerized amine-functionalized monomer units.
PROCESS FOR FUNCTIONALIZING A SURFACE OF A SOLID SUPPORT WITH NANO- OR MICROPARTICLES
In surface functionalization of a surface with nano- or microparticles, a process is for functionalizing a surface of a solid support with nano- or microparticles. Polymers include polymerized amine-functionalized monomer units. The polymers are used to functionalize a solid support with nano- or microparticles. The resulting nano- or microparticles functionalized polymers includes polymerized amine-functionalized monomer units.
COMPOSITIONS AND PROCESSES OF FORMING 3D PRINTABLE MATERIALS CAPABLE OF LOW DIELECTRIC LOSS
Disclosed are photo-curable compositions and processes to produce a 3D high-frequency dielectric material for use as an insulator in a circuit such as, for example, a high-performance RF component such as, for example, an antenna for electromagnetic transmission, a filter, a transmission line, or a high frequency interconnect. The high frequency circuit structures have a very low dielectric loss at operating frequencies (1-60 GHz).
COMPOSITIONS AND PROCESSES OF FORMING 3D PRINTABLE MATERIALS CAPABLE OF LOW DIELECTRIC LOSS
Disclosed are photo-curable compositions and processes to produce a 3D high-frequency dielectric material for use as an insulator in a circuit such as, for example, a high-performance RF component such as, for example, an antenna for electromagnetic transmission, a filter, a transmission line, or a high frequency interconnect. The high frequency circuit structures have a very low dielectric loss at operating frequencies (1-60 GHz).