Patent classifications
C08F222/12
Polymerization photoinhibitor
Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.
Polymerization photoinhibitor
Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.
Use of polymeric additives for paraffin-containing fluids
The present invention is concerned with the use of polymeric additives for paraffin-containing fluids as pour point depressants and low temperature flow improvers, wherein the polymers comprise styrene and maleic acid dialkyl ester building blocks.
Use of polymeric additives for paraffin-containing fluids
The present invention is concerned with the use of polymeric additives for paraffin-containing fluids as pour point depressants and low temperature flow improvers, wherein the polymers comprise styrene and maleic acid dialkyl ester building blocks.
Void-containing layer, laminate, method for producing void-containing layer, optical member, and optical apparatus
The present invention provides a void-containing layer in which a pressure-sensitive adhesive or an adhesive is less likely penetrated into voids. The void-containing layer of the present invention includes: nanoparticles, surfaces of which are modified with a compound having a surface orientation, wherein the void-containing layer has a void fraction of 35 vol %.
Void-containing layer, laminate, method for producing void-containing layer, optical member, and optical apparatus
A void-containing layer is disclosed in which a pressure-sensitive adhesive or an adhesive is less likely penetrated into voids. The void-containing layer of the present invention includes: nanoparticles, surfaces of which are modified with a compound having a surface orientation, wherein the void-containing layer has a void fraction of 35 vol %.
POLYMERIZATION PHOTOINHIBITOR
Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.
POLYMERIZATION PHOTOINHIBITOR
Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.
POLYMERIZATION PHOTOINHIBITOR
Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.
POLYMERIZATION PHOTOINHIBITOR
Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.