The present invention provides a maleimide-based copolymer, a method for producing same, and a resin composition obtained using same. This maleimide-based copolymer contains 40-60 mass % of aromatic vinyl monomer units, 5-20 mass % of vinyl cyanide monomer units, and 35-50 mass % of maleimide monomer units, and is such that a 4 mass % tetrahydrofuran solution of the copolymer has a transmittance of 90% or more for light having a wavelength of 450 nm at an optical path length of 10 mm, and the residual maleimide-based monomer amount is less than 300 ppm. This maleimide-based copolymer preferably further contains 0-10 mass % of unsaturated dicarboxylic acid anhydride monomer units, and preferably has a glass transition temperature of 165° C. or higher.

A maleimide based copolymer, manufacturing method thereof, and a resin composition using the maleimide based copolymer is provided. The maleimide based copolymer includes 40 to 60 mass % of aromatic vinyl monomer unit, 5 to 20 mass % of vinyl cyanide monomer unit, 35 to 50 mass % of maleimide monomer unit, and 0 to 10 mass % of monomer copolymerizable with these monomer units. The maleimide based copolymer has a glass transition temperature of 165° C. or higher and a melt mass flow rate of 25 to 80 g/10 min measured at 265° C. with 98 N load. By using such maleimide based copolymer, flowability can be improved without decreasing heat resistance providing ability.

A maleimide based copolymer, manufacturing method thereof, and a resin composition using the maleimide based copolymer is provided. The maleimide based copolymer includes 40 to 60 mass % of aromatic vinyl monomer unit, 5 to 20 mass % of vinyl cyanide monomer unit, 35 to 50 mass % of maleimide monomer unit, and 0 to 10 mass % of monomer copolymerizable with these monomer units. The maleimide based copolymer has a glass transition temperature of 165° C. or higher and a melt mass flow rate of 25 to 80 g/10 min measured at 265° C. with 98 N load. By using such maleimide based copolymer, flowability can be improved without decreasing heat resistance providing ability.

An aspect of the present invention relates to a resin composition, which contains a modified polyphenylene ether compound of which a terminal is modified with a substituent having a carbon-carbon unsaturated double bond and a free radical compound, in which the free radical compound has at least one free radical group selected from the group consisting of structures represented by Formulas (1), (2), (3) and (4) in a molecule.

An aspect of the present invention relates to a resin composition, which contains a modified polyphenylene ether compound of which a terminal is modified with a substituent having a carbon-carbon unsaturated double bond and a free radical compound, in which the free radical compound has at least one free radical group selected from the group consisting of structures represented by Formulas (1), (2), (3) and (4) in a molecule.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

A methacrylic resin having a cyclic structure in a main chain thereof, a shaped article, and an optical component or automotive part, in which the glass transition temperature is higher than 120° C. and 160° C. or lower, and the sign of the orientational birefringence when being oriented so as to have a degree of orientation of 0.03 is different from the sign of the orientational birefringence when being oriented so as to have a degree of orientation of 0.08.

A methacrylic resin having a cyclic structure in a main chain thereof, a shaped article, and an optical component or automotive part, in which the glass transition temperature is higher than 120° C. and 160° C. or lower, and the sign of the orientational birefringence when being oriented so as to have a degree of orientation of 0.03 is different from the sign of the orientational birefringence when being oriented so as to have a degree of orientation of 0.08.