Disclosed is a SAM forming composition comprising a SAM monomer or precursor having a backbone with a surface reactive group, wherein the backbone contains no Si—C bonds and is selected from the group consisting of a Si—C bond-free polysilane and a trisilylamine. The surface reactive groups are disclosed for the surface to be covered being a dielectric surface and a metal surface, respectively. A process of forming a SAM on a surface and a process of forming a film on the SAM are also disclosed.

Disclosed is a SAM forming composition comprising a SAM monomer or precursor having a backbone with a surface reactive group, wherein the backbone contains no Si—C bonds and is selected from the group consisting of a Si—C bond-free polysilane and a trisilylamine. The surface reactive groups are disclosed for the surface to be covered being a dielectric surface and a metal surface, respectively. A process of forming a SAM on a surface and a process of forming a film on the SAM are also disclosed.

To provide a polysilazane and a siliceous film-forming composition which can suppress film thickness variation and voids even in the ozone containing atmosphere. [Means for Solution] A polysilazane comprising N—Si bonds, wherein the ratio (NA.sup.3/NA.sup.2) of the number of N atoms having 3 N—Si bonds (NA.sup.3) to the number of N atoms having 2 N—Si bonds (NA.sup.2) is 1.8 to 6.0.

To provide a polysilazane and a siliceous film-forming composition which can suppress film thickness variation and voids even in the ozone containing atmosphere. [Means for Solution] A polysilazane comprising N—Si bonds, wherein the ratio (NA.sup.3/NA.sup.2) of the number of N atoms having 3 N—Si bonds (NA.sup.3) to the number of N atoms having 2 N—Si bonds (NA.sup.2) is 1.8 to 6.0.

Provided herein is a method for coating a surface. The method comprises providing a towelette moistened with a mixture of constituents to form a non-aqueous silicon-based composition comprising 7% to 80% (w/w of the total composition) polysilazane, 1% to 10% (w/w of the total composition) polysilane, 0.2% to 1% (w/w of the total composition) polysiloxane, and 20% to 70% (w/w of the total composition) at least one organic solvent; wherein polysilazane is present in a 10:1 to 110:1 weight ratio to polysiloxane; and wherein the polysilane is of a formula (R.sub.1R.sub.2Si).sub.n, wherein n is greater than 1, and wherein R.sub.1 and R.sub.2 are the same or different and are chosen from alkyl, alkenyl, cycloalkyl, alkylamino, aryl, aralkyl, or alkylsilyl. The mixture from the towelette to form a coating on a surface and the coating is cured ambiently without additional heat. Also provided are towelettes containing the mixture.

Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.

Novel N-alkyl substituted perhydridocyclic silazanes, oligomeric N-alkyl perhydridosilazane compounds, and N-alkylaminodihydridohalosilanes, and a method for their synthesis are provided. The novel compounds may be used to form high silicon nitride content films by thermal or plasma induced decomposition.

A method for manufacturing a part made of composite material includes forming a ceramic matrix phase in pores of a fibrous preform by pyrolysis of a cross-linked copolymer ceramic precursor, the cross-linked copolymer including a first precursor macromolecular chain of a first ceramic having free carbon, and a second precursor macromolecular chain of a second ceramic having free silicon, the first macromolecular chain being bonded to the second macromolecular chain by cross-linking bridges including a bonding structure of formula *.sup.1—X—*.sup.2; in this formula, X designates boron or aluminium, -*.sup.1 designates the bond to the first macromolecular chain and -*.sup.2 the bond to the second macromolecular chain.

A method for manufacturing a part made of composite material includes forming a ceramic matrix phase in pores of a fibrous preform by pyrolysis of a cross-linked copolymer ceramic precursor, the cross-linked copolymer including a first precursor macromolecular chain of a first ceramic having free carbon, and a second precursor macromolecular chain of a second ceramic having free silicon, the first macromolecular chain being bonded to the second macromolecular chain by cross-linking bridges including a bonding structure of formula *.sup.1—X—*.sup.2; in this formula, X designates boron or aluminium, -*.sup.1 designates the bond to the first macromolecular chain and -*.sup.2 the bond to the second macromolecular chain.

A polysilazane having a ratio of the amount of SiH.sub.3 exceeding 0.050 and a ratio of the amount of NH of less than 0.045, based on the amount of aromatic ring hydrogen of xylene when .sup.1H-NMR of a 17% by mass solution of polysilazane dissolved in xylene is measured. A siliceous film-forming composition comprising the polysilazane. A method for producing a siliceous film comprising applying the polysilazane composition above a substrate.