The present invention relates to a healthcare article comprising a polymer composition comprising a random propylene-ethylene copolymer, wherein the polymer composition comprises less than 150 ppm, preferably less than 100 ppm, more preferably less than 50 ppm, more preferably less than 20 ppm, most preferably 0 ppm of phthalates based on the weight of the random propylene ethylene copolymer.

The present invention relates to a healthcare article comprising a polymer composition comprising a random propylene-ethylene copolymer, wherein the polymer composition comprises less than 150 ppm, preferably less than 100 ppm, more preferably less than 50 ppm, more preferably less than 20 ppm, most preferably 0 ppm of phthalates based on the weight of the random propylene ethylene copolymer.

The present invention relates to a polyolefin composition comprising (a) a hindered amine light stabilizer of formula (1) as defined herein, (b) a hydrotalcite or an inorganic oxide, and (c) a hydroxylamine stabilizer or an amine oxide stabilizer, a flame retardant article comprising such composition, and to the use of components (b) and (c) for reducing odor in a polyolefin composition comprising a component (a).

The present invention relates to a polyolefin composition comprising (a) a hindered amine light stabilizer of formula (1) as defined herein, (b) a hydrotalcite or an inorganic oxide, and (c) a hydroxylamine stabilizer or an amine oxide stabilizer, a flame retardant article comprising such composition, and to the use of components (b) and (c) for reducing odor in a polyolefin composition comprising a component (a).

The present invention relates to a polyolefin composition comprising (a) a hindered amine light stabilizer of formula (1) as defined herein, (b) a hydrotalcite or an inorganic oxide, and (c) a hydroxylamine stabilizer or an amine oxide stabilizer, a flame retardant article comprising such composition, and to the use of components (b) and (c) for reducing odor in a polyolefin composition comprising a component (a).

Compounds are of the formula (Ia), (Ib), (Ic), or are stereoisomers thereof, wherein: R1 is hydrogen, (C1-C20)alkyl; (C3-C20)alkenyl; (C3 C20)alkynyl; (C1-C6)alkyl-O—; (C3-C20)cycloalkyl; (C1 C20)haloalkyl; (C6-C20)aryl optionally substituted; (C6-C20)heteroaryl optionally substituted; R2 and R2′ are hydrogen; (C1-C20)alkyl; (C1-C6)alkyl-O—; (C1-C6)haloalkyl; halogen;cyano; and nitro; Z1 to Z4 are diradicals of formula (III) wherein Al and A2 are O—or —NR3-, wherein R3 is selected from the group consisting of hydrogen and (C1-C20)alkyl; and G is (C1-C6)alkyl; —P(═S)R5-; —P(═O)R4; P(═O)(OR4)-; —P(═O)(NR6R7)-; —S(=0)2-; S(═O)—; or —C(═O)—; and Y1 to Y4 are (C1-C8)alkyl; (C3-C7)cycloalkyl; (C6-C20)aryl optionally substituted; or (C6-C20)heteroaryl optionally substituted; and FG1 and FG2 are H, OH, or NHR8.

Compounds are of the formula (Ia), (Ib), (Ic), or are stereoisomers thereof, wherein: R1 is hydrogen, (C1-C20)alkyl; (C3-C20)alkenyl; (C3 C20)alkynyl; (C1-C6)alkyl-O—; (C3-C20)cycloalkyl; (C1 C20)haloalkyl; (C6-C20)aryl optionally substituted; (C6-C20)heteroaryl optionally substituted; R2 and R2′ are hydrogen; (C1-C20)alkyl; (C1-C6)alkyl-O—; (C1-C6)haloalkyl; halogen;cyano; and nitro; Z1 to Z4 are diradicals of formula (III) wherein Al and A2 are O—or —NR3-, wherein R3 is selected from the group consisting of hydrogen and (C1-C20)alkyl; and G is (C1-C6)alkyl; —P(═S)R5-; —P(═O)R4; P(═O)(OR4)-; —P(═O)(NR6R7)-; —S(=0)2-; S(═O)—; or —C(═O)—; and Y1 to Y4 are (C1-C8)alkyl; (C3-C7)cycloalkyl; (C6-C20)aryl optionally substituted; or (C6-C20)heteroaryl optionally substituted; and FG1 and FG2 are H, OH, or NHR8.

A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.

A composition for forming an upper layer film is applied onto a resist film formed using an actinic ray-sensitive or radiation-sensitive resin composition, and includes a resin X and a compound A having a radical trapping group. A pattern forming method includes applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film, applying the composition for forming an upper layer film onto the resist film to form an upper layer film on the resist film, exposing the resist film having the upper layer film formed thereon, and developing the exposed resist film using a developer including an organic solvent to form a pattern.

Fatty amine compositions made from a metathesis-derived C10-C17 monounsaturated acid, octadecene-1,18-dioic acid, or their ester derivatives are disclosed. In another aspect, fatty amidoamines made by reacting a metathesis-derived C10-C17 monounsaturated acid, octadecene-1,18-dioic acid, or their ester derivatives with an aminoalkyl-substituted tertiary amine are disclosed. The fatty amines or amidoamines are advantageously sulfonated, sulfitated, oxidized, or reduced. In other aspects, the ester derivative is a modified triglyceride made by self-metathesis of a natural oil or an unsaturated triglyceride made by cross-metathesis of a natural oil with an olefin.