C08K5/45

Salt, acid generator, resist composition and method for producing resist pattern

A salt capable of producing a resist pattern with excellent line edge roughness is represented by formula (I): ##STR00001##
wherein, R.sup.1 represents —(X.sup.1—O).sub.o—R.sup.5, and o represents an integer of 0 to 6, R.sup.5 represents a hydrocarbon group having 1 to 12 carbon atoms, X.sup.1 represents a divalent hydrocarbon group having 2 to 12 carbon atoms, R.sup.2 represents an alkyl group having 1 to 12 carbon atoms or the like, I represents an integer of 0 to 3, and when I is 2 or more, a plurality of R.sup.2 may be the same or different from each other, R.sup.3 and R.sup.4 each represent a hydrogen atom or the like, m and n each represent 1 or 2, X.sup.0 represents a single bond, —CH.sub.2—, —O— or —S—, and R.sup.6 and R.sup.7 each represent an alkyl group having 1 to 4 carbon atoms which has a fluorine atom or the like.

Salt, acid generator, resist composition and method for producing resist pattern

A salt capable of producing a resist pattern with excellent line edge roughness is represented by formula (I): ##STR00001##
wherein, R.sup.1 represents —(X.sup.1—O).sub.o—R.sup.5, and o represents an integer of 0 to 6, R.sup.5 represents a hydrocarbon group having 1 to 12 carbon atoms, X.sup.1 represents a divalent hydrocarbon group having 2 to 12 carbon atoms, R.sup.2 represents an alkyl group having 1 to 12 carbon atoms or the like, I represents an integer of 0 to 3, and when I is 2 or more, a plurality of R.sup.2 may be the same or different from each other, R.sup.3 and R.sup.4 each represent a hydrogen atom or the like, m and n each represent 1 or 2, X.sup.0 represents a single bond, —CH.sub.2—, —O— or —S—, and R.sup.6 and R.sup.7 each represent an alkyl group having 1 to 4 carbon atoms which has a fluorine atom or the like.

POLYTHIOL COMPOSITION, POLYMERIZABLE COMPOSITION, RESIN, MOLDED BODY, OPTICAL MATERIAL, AND LENS
20220403092 · 2022-12-22 · ·

Provided is a polythiol composition including a polythiol compound (A) and a compound represented by the following Formula (1), wherein, in high performance liquid chromatography measurement, a peak area of the compound represented by Formula (1) is 9.0 or less with respect to a total peak area 100 of all compounds contained in the polythiol composition. In Formula (1), X represents a carbon atom or a sulfur atom.

##STR00001##

POLYTHIOL COMPOSITION, POLYMERIZABLE COMPOSITION, RESIN, MOLDED BODY, OPTICAL MATERIAL, AND LENS
20220403092 · 2022-12-22 · ·

Provided is a polythiol composition including a polythiol compound (A) and a compound represented by the following Formula (1), wherein, in high performance liquid chromatography measurement, a peak area of the compound represented by Formula (1) is 9.0 or less with respect to a total peak area 100 of all compounds contained in the polythiol composition. In Formula (1), X represents a carbon atom or a sulfur atom.

##STR00001##

ZWITTERIONIC COMPOUNDS FOR NON-LINEAR OPTICS, SENSORS, AND SPECTROSCOPY
20220389306 · 2022-12-08 ·

Disclosed are new zwitterionic compounds having a bridge moiety, an electron accepter moiety, and an electron donor moiety. The bridge moiety is covalently bonded to both the electron accepter moiety and to the electron donor moiety. The bridge moiety includes one selected from xanthene and thioxanthene, and the accepter moiety includes a pyridinium moiety, and the donor moiety includes a malononitrile moiety.

Dip-molded article, latex composition for dip-molding and preparation method thereof

Provided is a dip-molded article, and more particularly, provided are a dip-molded article including: a layer derived from a latex composition for dip-molding; and a layer derived from a polymer including a repeating unit derived from a diacetylene-based compound, a latex composition for dip-molding, and a preparation method thereof.

Dip-molded article, latex composition for dip-molding and preparation method thereof

Provided is a dip-molded article, and more particularly, provided are a dip-molded article including: a layer derived from a latex composition for dip-molding; and a layer derived from a polymer including a repeating unit derived from a diacetylene-based compound, a latex composition for dip-molding, and a preparation method thereof.

Aqueous ink jet composition

An aqueous ink jet composition according to the present disclosure includes: C.I. Disperse Red 364 as a first component; a second component which is a dispersant having a chemical structure of at least one of a sulfo group and a salt thereof; and a third component having an indigo skeleton and a chemical structure of at least one of a sulfo group and a salt thereof.

Aqueous ink jet composition

An aqueous ink jet composition according to the present disclosure includes: C.I. Disperse Red 364 as a first component; a second component which is a dispersant having a chemical structure of at least one of a sulfo group and a salt thereof; and a third component having an indigo skeleton and a chemical structure of at least one of a sulfo group and a salt thereof.

COMPOSITION AND COMPOUND

The present disclosure provides a composition containing a compound represented by General Formula (1) and a polymer compound, in which a content of a chloride ion is less than 1.5 ppm with respect to a total mass of the composition, and provides a compound.

##STR00001##

In General Formula (1), Het.sup.1 represents a divalent aromatic heterocyclic residue of a 5-membered ring or a 6-membered ring, X.sup.a, X.sup.b, X.sup.c, and X.sup.d each independently represent a heteroatom, Y.sup.a, Y.sup.b, Y.sup.c, Y.sup.d, Y.sup.e and Y.sup.f each independently represent a heteroatom or a carbon atom, and two 6-membered rings bonded to Het.sup.1 each independently may have a double bond.