A decorative coatings method, system, device, and composition, wherein the initial part may be the blending of several materials to create the face coat. The next step may be the application of this face coat into a mold. Then the backfilling of this mold with another blended material that is not usually associated with the face coat. The method ensures the adhesion of the backfill to the face coat. The specific mixtures allow the materials to bond and form a solid product when removed from the mold.

A decorative coatings method, system, device, and composition, wherein the initial part may be the blending of several materials to create the face coat. The next step may be the application of this face coat into a mold. Then the backfilling of this mold with another blended material that is not usually associated with the face coat. The method ensures the adhesion of the backfill to the face coat. The specific mixtures allow the materials to bond and form a solid product when removed from the mold.

A decorative coatings method, system, device, and composition, wherein the initial part may be the blending of several materials to create the face coat. The next step may be the application of this face coat into a mold. Then the backfilling of this mold with another blended material that is not usually associated with the face coat. The method ensures the adhesion of the backfill to the face coat. The specific mixtures allow the materials to bond and form a solid product when removed from the mold.

Embodiments relate to a one-component type paint composition with superior scratch resistance and secures excellent scratch restoring performance by including a resin, a curing agent, a curing catalyst and an organic solvent, whereby the resin includes: 30 to 70 wt % of a carbamate group-containing acrylic polyol resin; and 5 to 25 wt % of a hyperbranched structure carbamate group-containing polyester polyol resin, based on 100 wt % of the paint composition.

Embodiments relate to a one-component type paint composition with superior scratch resistance and secures excellent scratch restoring performance by including a resin, a curing agent, a curing catalyst and an organic solvent, whereby the resin includes: 30 to 70 wt % of a carbamate group-containing acrylic polyol resin; and 5 to 25 wt % of a hyperbranched structure carbamate group-containing polyester polyol resin, based on 100 wt % of the paint composition.

A curing accelerator can exhibit good curing acceleration performance and is excellent in storage stability, while maintaining sufficient pot life in a curing reaction of radical-polymerizable resins, and a radical-polymerizable resin composition uses the curing accelerator. The curing accelerator for radical-polymerizable resins includes a metal-containing compound (A), a thiol compound (B) and an aprotic solvent (C) having a dielectric constant of 10 or less, wherein the metal-containing compound (A) is one or more compounds selected from a metal soap (A1) and a -diketone skeleton-having metal complex (A2), the thiol compound (B) is one or more compounds selected from a mono-functional primary thiol compound (B1), a secondary thiol compound (B2) and a tertiary thiol compound (B3), and the content of the aprotic solvent (C) is 10 to 1,000 parts by mass relative to 100 parts by mass of the total of the metal-containing compound (A) and the thiol compound (B).

A curing accelerator can exhibit good curing acceleration performance and is excellent in storage stability, while maintaining sufficient pot life in a curing reaction of radical-polymerizable resins, and a radical-polymerizable resin composition uses the curing accelerator. The curing accelerator for radical-polymerizable resins includes a metal-containing compound (A), a thiol compound (B) and an aprotic solvent (C) having a dielectric constant of 10 or less, wherein the metal-containing compound (A) is one or more compounds selected from a metal soap (A1) and a -diketone skeleton-having metal complex (A2), the thiol compound (B) is one or more compounds selected from a mono-functional primary thiol compound (B1), a secondary thiol compound (B2) and a tertiary thiol compound (B3), and the content of the aprotic solvent (C) is 10 to 1,000 parts by mass relative to 100 parts by mass of the total of the metal-containing compound (A) and the thiol compound (B).

Methods, systems, and devices are disclosed for fabricating 3D piezoelectric materials. In one aspect, a method includes photopolymerizing a selected portion of a two dimensional plane in a sample of a photolabile polymer solution containing piezoelectric nanoparticles to form a layer of a piezoelectric material, the photopolymerizing including directing light from a light source based on a pattern design in the selected portion of the photolabile polymer solution; and moving one or both of the sample and the directed light to photopolymerize another selected portion of another two dimensional plane in the sample to form another layer of the piezoelectric material.

Provided are: a resin composition for easily giving polishing pads which have a hardness suitable for chemical mechanical polishing and have voids of a desired size; a polishing pad produced from the resin composition; and a method for producing the polishing pad. The resin composition comprises a urethane (meth)acrylate (A), at least one unsaturated resin (B) selected from among vinyl ester resins and unsaturated polyester resins, an ethylenically unsaturated compound (C) which has an ethylenically unsaturated bond and is neither the urethane (meth)acrylate (A) nor the unsaturated resin (B), and a hollow object (D), wherein the mass ratio of the content of the urethane (meth)acrylate (A) to the content of the unsaturated resin (B), A:B, is 64:36 to 96:4 and the content of the hollow object (D) is 0.7-9.0 parts by mass per 100 parts by mass of the sum of the urethane (meth)acrylate (A), the unsaturated resin (B), and the ethylenically unsaturated compound (C).

Provided are: a resin composition for easily giving polishing pads which have a hardness suitable for chemical mechanical polishing and have voids of a desired size; a polishing pad produced from the resin composition; and a method for producing the polishing pad. The resin composition comprises a urethane (meth)acrylate (A), at least one unsaturated resin (B) selected from among vinyl ester resins and unsaturated polyester resins, an ethylenically unsaturated compound (C) which has an ethylenically unsaturated bond and is neither the urethane (meth)acrylate (A) nor the unsaturated resin (B), and a hollow object (D), wherein the mass ratio of the content of the urethane (meth)acrylate (A) to the content of the unsaturated resin (B), A:B, is 64:36 to 96:4 and the content of the hollow object (D) is 0.7-9.0 parts by mass per 100 parts by mass of the sum of the urethane (meth)acrylate (A), the unsaturated resin (B), and the ethylenically unsaturated compound (C).