The present invention addresses the problem of providing a decomposition inhibitor for inhibiting the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride.

The present invention relates to a decomposition inhibitor that is used to inhibit the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride and that includes at least one compound selected from among azole compounds, aminocarboxylic acid compounds, and phosphonic acid compounds as an active component.

The present invention addresses the problem of providing a decomposition inhibitor for inhibiting the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride.

The present invention relates to a decomposition inhibitor that is used to inhibit the decomposition of hydrogen peroxide included in an etching liquid composition for titanium nitride and that includes at least one compound selected from among azole compounds, aminocarboxylic acid compounds, and phosphonic acid compounds as an active component.

A gas phase rust-resisting material for various metals includes, calculated in parts by weight, following components of: 78.5 to 95.5 parts of benzotriazole, 78.5 to 95.5 parts of dicycloethylamine nitrite, 500 to 800 parts of octadecylamine, 9000 to 11000 parts of ethanol, 33.5 to 38.5 parts of a reinforcing agent and 23.5 to 25.5 parts of a rust-resistant microcapsule. Further disclosed is a method for preparing the gas phase rust-resisting material which is suitable for various metals.

A gas phase rust-resisting material for various metals includes, calculated in parts by weight, following components of: 78.5 to 95.5 parts of benzotriazole, 78.5 to 95.5 parts of dicycloethylamine nitrite, 500 to 800 parts of octadecylamine, 9000 to 11000 parts of ethanol, 33.5 to 38.5 parts of a reinforcing agent and 23.5 to 25.5 parts of a rust-resistant microcapsule. Further disclosed is a method for preparing the gas phase rust-resisting material which is suitable for various metals.

The present invention relates to the use of efficient phosphorous substances, in particular based on diphenylamine and heterocyclic diphenylamine derivatives as stabilizers for organic materials, in particular for plastic materials, against oxidative, thermal and/or actinic degradation. The present invention additionally relates to an organic material that has been correspondingly stabilized as described above. The invention further relates to a method of stabilizing organic materials and to specific stabilizers.

The present invention relates to the use of efficient phosphorous substances, in particular based on diphenylamine and heterocyclic diphenylamine derivatives as stabilizers for organic materials, in particular for plastic materials, against oxidative, thermal and/or actinic degradation. The present invention additionally relates to an organic material that has been correspondingly stabilized as described above. The invention further relates to a method of stabilizing organic materials and to specific stabilizers.

A coating composition, which contains one or more compounds (A) according to formula (I) and a pigment (B) having a minimum integrated transmittance within the range of 380 to 600 nm, is provided:

##STR00001##

In formula (I), each R.sub.1, R.sub.2 and R.sub.3 is independently —OR.sub.4, R.sub.4 being independently hydrogen or a C.sub.1 to C.sub.24 hydrocarbyl group optionally containing heteroatoms, or C.sub.1 to C.sub.24 hydrocarbyl groups optionally containing heteroatoms; n is 2, 3, 4 or 5; o is 2, 3, 4 or 5; p is 2, 3, 4 or 5; with the proviso that at least one of R.sub.1 and at least one of R.sub.2 and at least one of R.sub.3 is —OR.sub.4. A coating is obtained by applying the coating composition to a substrate for protecting the substrate against UV/Vis-radiation or for stabilizing the substrate against the deleterious influence of UV/Vis-radiation.

A coating composition, which contains one or more compounds (A) according to formula (I) and a pigment (B) having a minimum integrated transmittance within the range of 380 to 600 nm, is provided:

##STR00001##

In formula (I), each R.sub.1, R.sub.2 and R.sub.3 is independently —OR.sub.4, R.sub.4 being independently hydrogen or a C.sub.1 to C.sub.24 hydrocarbyl group optionally containing heteroatoms, or C.sub.1 to C.sub.24 hydrocarbyl groups optionally containing heteroatoms; n is 2, 3, 4 or 5; o is 2, 3, 4 or 5; p is 2, 3, 4 or 5; with the proviso that at least one of R.sub.1 and at least one of R.sub.2 and at least one of R.sub.3 is —OR.sub.4. A coating is obtained by applying the coating composition to a substrate for protecting the substrate against UV/Vis-radiation or for stabilizing the substrate against the deleterious influence of UV/Vis-radiation.

A polishing composition includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a hard mask removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing composition described herein to a surface of a substrate, wherein the surface comprises ruthenium or a hard mask material; and bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate.

A polishing composition includes an abrasive; a pH adjuster; a barrier film removal rate enhancer; a low-k removal rate inhibitor; an azole-containing corrosion inhibitor; and a hard mask removal rate enhancer. A method of polishing a substrate includes the steps of: applying the polishing composition described herein to a surface of a substrate, wherein the surface comprises ruthenium or a hard mask material; and bringing a pad into contact with the surface of the substrate and moving the pad in relation to the substrate.