C11D1/34

Automatic dishwashing detergent composition

An automatic dishwashing cleaning composition comprising: a) a mixed builder system comprising soluble builder and crystalline silicate wherein the soluble builder comprises a complexing agent, a phosphonate and a dispersant polymer and wherein the level of each soluble builder in the composition is: a1) from 15% to 40% by weight of the composition of the complexing agent; a2) from 2% to 7% by weight of the composition of the phosphonate; and a3) from 1% to 7% by weight of the composition of the dispersant polymer wherein the soluble builder and the crystalline silicate are in a weight ratio of from 8:1 to 15:1 b) a bleaching system comprising bleach, a bleach catalyst and a bleach activator; and c) from 0% to 20% by weight of the composition of carbonate.

Cleaning liquid, cleaning method, and method for producing semiconductor wafer

A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

Cleaning liquid, cleaning method, and method for producing semiconductor wafer

A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

Wet wipes containing hydroxy acetophenone and cocamidopropyl PG dimonium chloride phosphate

A cleaning composition including a preservative formulation having hydroxy acetophenone and a phospholipid complex is disclosed. The cleaning composition can be loaded on a cleaning wipe and used for personal care. The hydroxyacetophenone provides a preservative booster to the preservative system for the cleaning composition containing a phospholipid complex, such as cocamidopropyl PG-dimonium chloride phosphate, which has some limited independent preservation activity, depending on the level in the final formulation.

IMPROVEMENTS IN RELATION TO THE MANUFACTURE OF PERSONAL CLEANSING COMPOSITIONS
20210236393 · 2021-08-05 ·

The invention relates to a method of making solid cleansing compositions which comprise a non-soap anionic surfactant, a carrier, an emulsifier and water. The method entails preparing an emulsion of the components at an elevated temperature using excess water and subjecting the emulsion to cooling and solidification, wherein the water content is reduced. The invention further relates to the emulsions and to the novel solid cleansing compositions formed therefrom.

WATER-SOLUBLE FILM
20210171882 · 2021-06-10 ·

An object is to obtain a water-soluble film that ensures lower roll feeding tension, excellent anti-blocking property, etc., and does not stick to metal seal bars, etc., during heat sealing. As a solution, a water-soluble film is provided that contains A to D below: A. a polyvinyl alcohol resin; B. a plasticizer; C. an alkali metal salt of aliphatic acid having 6 to 22 carbon atoms and/or D. phosphate ester surfactant.

DETERGENT COMPOSITION
20210269749 · 2021-09-02 ·

An automatic dishwashing detergent composition can include an alkoxylated polyalkyleneimine said alkoxylated polyalkyleneimine including a polyalkyleneimine backbone, alkoxy chains and quaternization groups wherein the alkoxylated polyalkyleneimine has a degree of quaternization of from about 40% to about 98% and wherein the polyalkyleneimine backbone represents from about 1% to about 40% by weight of the alkoxylated polyalkyleneimine and the alkoxy chains represent from about 60% to about 99% by weight of the alkoxylated polyalkyleneimine; percarbonate bleach; an amylase and a protease; and wherein the composition is free of bleach activator and bleach catalyst, or wherein the composition is free of bleach activator and includes manganese bleach catalyst.

DETERGENT COMPOSITION
20210269749 · 2021-09-02 ·

An automatic dishwashing detergent composition can include an alkoxylated polyalkyleneimine said alkoxylated polyalkyleneimine including a polyalkyleneimine backbone, alkoxy chains and quaternization groups wherein the alkoxylated polyalkyleneimine has a degree of quaternization of from about 40% to about 98% and wherein the polyalkyleneimine backbone represents from about 1% to about 40% by weight of the alkoxylated polyalkyleneimine and the alkoxy chains represent from about 60% to about 99% by weight of the alkoxylated polyalkyleneimine; percarbonate bleach; an amylase and a protease; and wherein the composition is free of bleach activator and bleach catalyst, or wherein the composition is free of bleach activator and includes manganese bleach catalyst.

COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE
20210130735 · 2021-05-06 · ·

The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon.

Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.

COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE
20210130735 · 2021-05-06 · ·

The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon.

Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.