C11D1/40

Compositions for anti pattern collapse treatment comprising gemini additives

A method of reducing defects of a semiconductor substrate whereby the substrate is rinsed with an aqueous composition containing a gemini additive of the general formula I after the development of a photoresist or a photolithographic mask ##STR00001## wherein X is a divalent group, R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are substituted or unsubstituted monovalent groups, n is an integer from 1 to 5, or 1 to 10000 depending on R.sup.3 and R.sup.4, z is an integer, which is chosen so that the overall surfactant is electrically uncharged, and Z is a counter-ion.

Liquid hand dishwashing cleaning composition with reduced viscosensitivity

The need for a hand-dishwashing composition which is highly effective at removing grease, providing long-lasting suds under soiled conditions, while having a Newtonian viscosity which is less sensitive to changes on surfactant and solvent levels, is met by formulating the liquid hand dishwashing cleaning composition to comprise a surfactant system having a combination of alkyl sulphate anionic surfactant having little or no alkoxylation and an alkyl polyglucoside surfactant.

Liquid hand dishwashing cleaning composition with reduced viscosensitivity

The need for a hand-dishwashing composition which is highly effective at removing grease, providing long-lasting suds under soiled conditions, while having a Newtonian viscosity which is less sensitive to changes on surfactant and solvent levels, is met by formulating the liquid hand dishwashing cleaning composition to comprise a surfactant system having a combination of alkyl sulphate anionic surfactant having little or no alkoxylation and an alkyl polyglucoside surfactant.

Compositions and Processes for Treatment with Lipases

The present invention relates to a composition comprising: (a) at least one surfactant, at least one surfactant system, at least one soap, or any mixtures thereof; and (b) a polypeptide having lipase activity selected from the group consisting of: (I) a polypeptide having at least 80% sequence identity to the mature polypeptide of SEQ ID NO: 2; (II) a polypeptide encoded by a polynucleotide that hybridizes under low stringency conditions with (i) the mature polypeptide coding sequence of SEQ ID NO: 1, or (ii) the full-length complement of (i); (III) a polypeptide encoded by a polynucleotide having at least 80% sequence identity to the matore polypeptide coding sequence of SEQ ID NO: 1; (IV) a variant of the mature polypeptide of SEQ ID NO: 2 comprising a substitution, deletion, and/or insertion at one or more positions; and (V) a fragment of the polypeptide of (I), (II), (III), or (IV); wherein said composition is a cleaning and/or treatment composition. The invention furthermore relates to methods of producing and using the composition.

Compositions and Processes for Treatment with Lipases

The present invention relates to a composition comprising: (a) at least one surfactant, at least one surfactant system, at least one soap, or any mixtures thereof; and (b) a polypeptide having lipase activity selected from the group consisting of: (I) a polypeptide having at least 80% sequence identity to the mature polypeptide of SEQ ID NO: 2; (II) a polypeptide encoded by a polynucleotide that hybridizes under low stringency conditions with (i) the mature polypeptide coding sequence of SEQ ID NO: 1, or (ii) the full-length complement of (i); (III) a polypeptide encoded by a polynucleotide having at least 80% sequence identity to the matore polypeptide coding sequence of SEQ ID NO: 1; (IV) a variant of the mature polypeptide of SEQ ID NO: 2 comprising a substitution, deletion, and/or insertion at one or more positions; and (V) a fragment of the polypeptide of (I), (II), (III), or (IV); wherein said composition is a cleaning and/or treatment composition. The invention furthermore relates to methods of producing and using the composition.

Compositions and Methods for Preventing Collapse of High Aspect Ratio Structures During Drying

Described herein is an aqueous composition for treating a substrate including patterns having line-space dimensions of 50 nm or below to prevent collapse of the patters, the composition comprising: a solvent system comprising water and a water-miscible organic solvent; a surface modifier that is a reaction product between an alkylamine and an organic acid; and an optional pH adjusting agent.

HALOGEN-FREE QUATERNARY AMINES AND USES THEREOF
20190112229 · 2019-04-18 ·

The present disclosure provides an aqueous composition comprising a quaternary amine compound neutralized with a polycarboxylic acid. The aqueous composition is particularly useful for inerting clay in cement compositions as well as compatibilzing pigments in pigment dispersions.

Liquid chemical for forming protecting film

Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

Liquid chemical for forming protecting film

Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

CLEANING COMPOSITION
20190031980 · 2019-01-31 · ·

A cleaning and disinfecting composition comprises a long-chain alkyl polyamine, such as dodecyl dipropylene triamine; a long-chain quaternary ammonium salt, such as N,N-didecyl-N,N-dimethylammonium chloride; and a metal carbonate salt, such as potassium carbonate, all in aqueous solution. A sequestering agent, a long-chain alkyl polyethoxylate, an alkanolamine and an anti-corrosive agent may also be present. The composition has a pH of at least 11 when diluted to an in-use concentration, and may be used to clean and disinfect hard surfaces, such as medical, dental and surgical implements, walls, floors, sinks and hard furnishing surfaces, or soft surfaces such as bedding, upholstery or clothing. The composition is effective as a virucide, a sporicide, a bacteriocide, a fungicide, and against yeasts and moulds, without harming the substrate cleansed.