The present invention relates to environmental friendly well treatment fluids comprising water and/or an organic phase and an ester obtainable by reacting a polycarboxylic acid with a hydroxy monocarboxylic acid. The invention also relates to the use of said ester as viscosifier and/or corrosion inhibitor for a well treatment fluid and preferably for a well treatment fluid for offshore well drilling.

The present invention relates to environmental friendly well treatment fluids comprising water and/or an organic phase and an ester obtainable by reacting a polycarboxylic acid with a hydroxy monocarboxylic acid. The invention also relates to the use of said ester as viscosifier and/or corrosion inhibitor for a well treatment fluid and preferably for a well treatment fluid for offshore well drilling.

The present invention relates to a method which can effectively remove perovskite light absorbers, hole transport layers, metal electrodes, and the like by immersing a waste perovskite-based photoelectric conversion element module in a cleaning solution under predetermined conditions. The present invention can recover a substrate from the waste module and manufacture a photoelectric conversion element having a photoelectric conversion efficiency level comparable to the initially high level again, using the same.

The present disclosure relates to compositions and methods for the removal of deposits from oilfield apparatus and wellbore surfaces. In particular, removal of deposits comprising heavy hydrocarbon materials and finely divided inorganic solids. The composition includes a mixture of a corrosion inhibitor component which is morpholine or a morpholine derivative having corrosion inhibitor properties, and a surfactant which is a quaternary ammonium compound having biocidal properties. Methods of removing a deposit from a surface or unplugging an oilwell which has been plugged with a deposit, are also included wherein the method comprising contacting the deposit with a composition as disclosed herein for a selected period of time.

Surfactant compositions and solid compositions with detersive combinations of surfactants are provided. Solid alkaline compositions contain a first surfactant that is a reverse EO/PO block copolymer of about 10-40% EO and a second surfactant that is at least one of a reverse EO/PO block copolymer of about 40-50% EO, an alkyl capped alcohol ethoxylate, a capped block copolymer, and alkyl pyrrolidone are provided. Methods of using the surfactant compositions and solid compositions are provided.

A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. ##STR00001##

A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. ##STR00001##

A surfactant component comprising a compound of formula (I): (I) wherein R.sup.1 is a C.sub.5 to C.sub.39 alkyl or alkenyl group and R.sup.2 is a group of formula (a) wherein one of W, X, Y and Z is a covalent bond and the remaining groups are independently selected from H, M, SO.sub.3M and a further group of formula R.sup.1CO provided at least one of W, X, Y and Z is SO.sub.3M; and each M is independently a hydrogen ion, an ammonium ion or a metal ion. ##STR00001##

A surfactant component comprising a compound of formula (I): (I) wherein R.sup.1 is a C.sub.5 to C.sub.39 alkyl or alkenyl group and R.sup.2 is a group of formula (a) wherein one of W, X, Y and Z is a covalent bond and the remaining groups are independently selected from H, M, SO.sub.3M and a further group of formula R.sup.1CO provided at least one of W, X, Y and Z is SO.sub.3M; and each M is independently a hydrogen ion, an ammonium ion or a metal ion. ##STR00001##

Alkaline cleaning compositions using a detersive combination of surfactants, chelants and enzymes with reduced alkalinity, including between about 20-47% by percent Na.sub.2O in the liquid or solid compositions, are disclosed. Methods of using the compositions with optimal protein removal performance that overcome limitations of reduced alkalinity content for use in cleaning, rinsing, sanitizing, and disinfecting are disclosed along with methods that stabilize enzymes for multi-cycle dispensing in solid compositions.