Laundry detergent compositions that are neutral detergent containing a cationic amine surfactant in combination with nonionic surfactants are disclosed. The compositions beneficially remove difficult to treat soils, including food and industrial oils on polyester, cotton and polycotton blends, as part of a two-part cleaning wash process with an alkali step. Methods of using the neutral laundry detergent compositions are also disclosed.

A treatment liquid is a treatment liquid including water; a cationic compound; an anionic compound selected from the group consisting of a resin having a carboxy group or a salt thereof, a resin having a sulfo group or a salt thereof, a resin having a phosphorous acid group or a salt thereof, and a resin having a phosphoric acid group or a salt thereof; and an oxidizing agent, in which the treatment liquid has a pH of 7.0 or less, and the treatment liquid is substantially free of abrasive grains.

The present invention is directed to a cleaning composition for sanitizing or disinfecting hard surfaces containing a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

The present invention is directed to a cleaning composition for sanitizing or disinfecting hard surfaces containing a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

The present invention is directed to a cleaning composition for sanitizing or disinfecting hard surfaces containing a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.

A method of making a translucent cleaning composition is disclosed. The method includes providing a perfume; providing a hydrogen bond receiving compound; providing a hydrogen bond providing compound; combining the hydrogen bond receiving compound with the hydrogen bond providing compound to create a eutectic liquid; adding the perfume to the eutectic liquid to create a perfumed eutectic liquid; and adjusting the pH of the perfumed eutectic liquid to above 6.0.

A detergent comprising (A) a sulfobetaine type ampholytic surfactant, and (B) a quaternary ammonium cation-modified silicone. A mass ratio [(A)/(B)] of the component (A) to the component (B) is 0.1 or more and 1,000 or less.

A detergent comprising (A) a sulfobetaine type ampholytic surfactant, and (B) a quaternary ammonium cation-modified silicone. A mass ratio [(A)/(B)] of the component (A) to the component (B) is 0.1 or more and 1,000 or less.

A processing solution composition for reducing collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source and a method of forming a pattern using the same are proposed. The processing solution composition includes 0.0001 to 1 wt % of a nonionic surfactant having an HLB (Hydrophilic-Lipophilic Balance) value of 9 to 16, 0.0001 to 1 wt % of an alkaline material selected from the group consisting of tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and mixtures thereof, and 98 to 99.9998 wt % of water, and is effective at reducing the collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source.

A processing solution composition for reducing collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source and a method of forming a pattern using the same are proposed. The processing solution composition includes 0.0001 to 1 wt % of a nonionic surfactant having an HLB (Hydrophilic-Lipophilic Balance) value of 9 to 16, 0.0001 to 1 wt % of an alkaline material selected from the group consisting of tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and mixtures thereof, and 98 to 99.9998 wt % of water, and is effective at reducing the collapse of a polyhydroxystyrene-containing photoresist pattern defined by an extreme-ultraviolet exposure source.