A single-step absorbent wipe for cleaning and disinfecting medical instruments includes various active ingredients as well as compounds that increase the efficacy profile of the product against various organisms, improve the buffering capacity of the formulation, enhance the antimicrobial efficacy against mycobacteria, increases the wetting and cleaning profile of the formulation, as well as adjusts the pH thereof. The disinfectant wipe provides a procedure to suitably clean and intermediate level disinfect medical instruments that are heat liable as well as non-submersible.

A single-step absorbent wipe for cleaning and disinfecting medical instruments includes various active ingredients as well as compounds that increase the efficacy profile of the product against various organisms, improve the buffering capacity of the formulation, enhance the antimicrobial efficacy against mycobacteria, increases the wetting and cleaning profile of the formulation, as well as adjusts the pH thereof. The disinfectant wipe provides a procedure to suitably clean and intermediate level disinfect medical instruments that are heat liable as well as non-submersible.

An object of the present invention is to provide a method for producing a treatment liquid, having excellent filterability.

The method for producing a treatment liquid of an embodiment of the present invention is a method for producing a treatment liquid, the method including filtering an object to be purified including a surfactant, using a first filter having a first filter medium, to produce a treatment liquid for a semiconductor substrate, in which the first filter medium includes at least one selected from the group consisting of a nylon, a polyallyl sulfonic acid, a perfluoroalkoxy alkane which has been subjected to a hydrophilization treatment, a polytetrafluoroethylene which has been subjected to a hydrophilization treatment, a polyolefin which has been subjected to a hydrophilization treatment, and a polyvinylidene fluoride which has been subjected to a hydrophilization treatment, and the surfactant includes at least one selected from the group consisting of a nonionic surfactant including a group represented by Formula (1) and an anionic surfactant including a group represented by Formula (1).

Formula (1) (LO).sub.n

L represents an alkylene group, and n represents 3 to 55.

An object of the present invention is to provide a method for producing a treatment liquid, having excellent filterability.

The method for producing a treatment liquid of an embodiment of the present invention is a method for producing a treatment liquid, the method including filtering an object to be purified including a surfactant, using a first filter having a first filter medium, to produce a treatment liquid for a semiconductor substrate, in which the first filter medium includes at least one selected from the group consisting of a nylon, a polyallyl sulfonic acid, a perfluoroalkoxy alkane which has been subjected to a hydrophilization treatment, a polytetrafluoroethylene which has been subjected to a hydrophilization treatment, a polyolefin which has been subjected to a hydrophilization treatment, and a polyvinylidene fluoride which has been subjected to a hydrophilization treatment, and the surfactant includes at least one selected from the group consisting of a nonionic surfactant including a group represented by Formula (1) and an anionic surfactant including a group represented by Formula (1).

Formula (1) (LO).sub.n

L represents an alkylene group, and n represents 3 to 55.

There is provided a cleaning liquid for a semiconductor substrate, which has excellent cleaning performance with respect to a semiconductor substrate including a metal film after CMP and has a small surface roughness of a metal film after cleaning. The cleaning liquid for a semiconductor substrate according to the present invention is a cleaning liquid for a semiconductor substrate, which is used for cleaning a semiconductor substrate, including a compound represented by Formula (1), a compound represented by Formula (2), a primary amino alcohol having a primary amino group or a secondary amino group, a tertiary amine; and a solvent.

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There is provided a cleaning liquid for a semiconductor substrate, which has excellent cleaning performance with respect to a semiconductor substrate including a metal film after CMP and has a small surface roughness of a metal film after cleaning. The cleaning liquid for a semiconductor substrate according to the present invention is a cleaning liquid for a semiconductor substrate, which is used for cleaning a semiconductor substrate, including a compound represented by Formula (1), a compound represented by Formula (2), a primary amino alcohol having a primary amino group or a secondary amino group, a tertiary amine; and a solvent.

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Liquid fabric softener compositions containing (a) water-insoluble cationic softeners, (b) water-soluble cationic antibacterial agents and (c) cationic rheology modifying polymers are described that are stable homogenous mixtures. A method for determining stability of the softener formulations or determining the amount of component (a), (b) or (c) involves calculating a stability index of the formulation according to the following equation: Stability formula index=[(wt % of the (a) component+3*(wt % of the (c) component)]/[wt % of the (b) component], wherein a desirable stability index value is 2.5 or greater than 2.5.

Liquid fabric softener compositions containing (a) water-insoluble cationic softeners, (b) water-soluble cationic antibacterial agents and (c) cationic rheology modifying polymers are described that are stable homogenous mixtures. A method for determining stability of the softener formulations or determining the amount of component (a), (b) or (c) involves calculating a stability index of the formulation according to the following equation: Stability formula index=[(wt % of the (a) component+3*(wt % of the (c) component)]/[wt % of the (b) component], wherein a desirable stability index value is 2.5 or greater than 2.5.

A liquid fabric softener composition in accordance with an exemplary embodiment comprises a fabric softener active agent, a hydroxypropyl starch phosphate, and water.

A liquid fabric softener composition in accordance with an exemplary embodiment comprises a fabric softener active agent, a hydroxypropyl starch phosphate, and water.