C11D1/82

Method of forming an antifoam granule containing a silicone polyether

An antifoam granule includes a carrier and an antifoam compound deposited on the carrier. The antifoam granule is formed using a method that includes providing an emulsion and contacting the emulsion with a carrier to deposit the antifoam compound on the carrier and form the antifoam granule. The emulsion includes an oil phase, an aqueous phase, and a silicone polyether. The oil phase includes an antifoam compound. The antifoam compound includes a hydrophobic fluid and a hydrophobic filler dispersed in the hydrophobic fluid. The aqueous phase includes a binder and water. The emulsion is formed using a method that includes combining the oil phase, the aqueous phase, and the silicone polyether to form the emulsion. The antifoam granule is also utilized in a method of facilitating rinsing of a detergent from a substrate that includes applying the detergent, including the antifoam granule, to the substrate and rinsing the substrate.

Methods and Systems for Forming Microcapsules

A method for producing microcapsules is provided. The method includes providing a core liquid comprising one or more oils and one or more surfactants and a shell liquid comprising water, one or more surfactants and at least one wall forming material. The method further includes forming a plurality of liquid droplets within a gas, wherein each of the plurality of liquid droplets has a core formed from the core liquid and a shell surrounding the core formed from the shell liquid, wherein the core liquid and shell liquid have a dynamic spreading coefficient greater than zero at 0.03 seconds. At least some of the water is evaporated within a drying chamber to form microcapsules.

Surface Treatment Compositions and Methods
20240101929 · 2024-03-28 ·

This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.

Surface Treatment Compositions and Methods
20240101929 · 2024-03-28 ·

This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.

CLEANING SOLUTION, SET OF INK AND CLEANING SOLUTION, CLEANING METHOD, CLEANING APPARATUS, PRINTING METHOD, AND PRINTING APPARATUS
20190270903 · 2019-09-05 ·

Provided is a cleaning solution including: water; a compound represented by general formula (1) below; a glycol ether solves in an amount of greater than 5 g in 100 g of water having a temperature of 25 degrees C., and a proportion of the glycol ether compound is 1 percent by mass or greater but 30 percent by mass or less, and wherein in general formula (1) below, R.sup.1 represents an alkyl group containing 1 or more but 4 or less carbon atoms.

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CLEANING SOLUTION, SET OF INK AND CLEANING SOLUTION, CLEANING METHOD, CLEANING APPARATUS, PRINTING METHOD, AND PRINTING APPARATUS
20190270903 · 2019-09-05 ·

Provided is a cleaning solution including: water; a compound represented by general formula (1) below; a glycol ether solves in an amount of greater than 5 g in 100 g of water having a temperature of 25 degrees C., and a proportion of the glycol ether compound is 1 percent by mass or greater but 30 percent by mass or less, and wherein in general formula (1) below, R.sup.1 represents an alkyl group containing 1 or more but 4 or less carbon atoms.

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LAUNDRY DETERGENT COMPOSITION

Disclosed herein is a laundry detergent composition comprising one or more low temperature enzyme that provides excellent cleaning under more environmentally friendly conditions. In particular, the low temperature enzyme(s) contained in the laundry detergent composition described herein provides excellent cleaning at lower temperatures and/or in shorter wash times than conventional laundry detergents. The lower wash temperature and/or shorter wash cycle conserves energy and/or water without sacrificing detergent performance.

LAUNDRY DETERGENT COMPOSITION

Disclosed herein is a laundry detergent composition comprising one or more low temperature enzyme that provides excellent cleaning under more environmentally friendly conditions. In particular, the low temperature enzyme(s) contained in the laundry detergent composition described herein provides excellent cleaning at lower temperatures and/or in shorter wash times than conventional laundry detergents. The lower wash temperature and/or shorter wash cycle conserves energy and/or water without sacrificing detergent performance.

SILOXANE COMPOSITIONS AND CLEANING METHOD USING THE SAME
20190256806 · 2019-08-22 ·

The compositions include a methylated siloxane liquid and a solvent comprising at least one of a ketone or ester each having up to six carbon atoms, a halogenated alkane having up to two carbon atoms, tetrachloroethene, 1-chloro-4-trifluoromethyl benzene, or ethane. The compositions can also include hydrocarbon solvent comprising at least one of toluene, xylene, or a saturated hydrocarbon represented by formula C.sub.xH.sub.2x+y, wherein x is from 5 to 8, and wherein y is 0 or 2 and/or propellant. The method can include applying the composition to a brake system component to clean the brake system component. The method can also include applying a composition including hexamethyldisiloxane to a brake system component to clean the brake system component.

SILICONE SURFACTANT, AND SILICONE-DISSOLVATIVE CLEANER CONTAINING THE SAME
20180230401 · 2018-08-16 · ·

Provided are: a novel compound that has excellent activity of dissolving a silicone compound and thereby solubilizing the silicone compound in an organic solvent; and a cleaner that contains the compound and can completely and rapidly remove the silicone compound deposited/remained on a mold and/or a molded article obtained using the mold. The novel compound is represented by Formula (1). The silicone-dissolvative cleaner contains (A) a silicone surfactant represented by Formula (1); and (B) an organic solvent. Formula (1) is expressed as follows:

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wherein A represents an ionic group selected from the group consisting of a sulfonic ion, a carboxylic ion, and a quaternary ammonium cation; and B represents a counter-ion to A and is selected from an alkali metal ion and a halide ion.