The present invention relates to a composition for surface modification. The composition for surface modification according to the present invention contains a particular carbodiimide-based compound, thus forms a covalent bond without damaging skin, hair, or fabric, and semipermanently provides desired skin or hair surface modification effects or fabric care effects.

The present invention relates to a composition for surface modification. The composition for surface modification according to the present invention contains a particular carbodiimide-based compound, thus forms a covalent bond without damaging skin, hair, or fabric, and semipermanently provides desired skin or hair surface modification effects or fabric care effects.

The present invention provides a cleaning liquid for a semiconductor substrate that has been subjected to CMP, in which the cleaning liquid has an excellent selectivity for RuO.sub.2 removing performance; and a method for cleaning a semiconductor substrate that has been subjected to CMP. The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a perhalogen acid and a halogen acid.

The present disclosure provides a polyetheramine alkoxylate compound containing aromatic groups in the hydrophobe allowing the compound to exhibit unique functionality, high performance and low cost, but without the toxicity and/or skin and eye irritation problems associated with conventional polyetheramine compounds.

The present invention relates to new alkaline, preferably highly alkaline, cleaning solutions comprising surfactants with improved stability and cleaning performance under such conditions. It further relates to novel surfactants.

The present invention relates to new alkaline, preferably highly alkaline, cleaning solutions comprising surfactants with improved stability and cleaning performance under such conditions. It further relates to novel surfactants.

Suggested is fragrance composition comprising or consisting of a selection of specific nitriles showing improved stability against decomposition and discoloration.

Suggested is fragrance composition comprising or consisting of a selection of specific nitriles showing improved stability against decomposition and discoloration.

The present invention relates to treatment compositions containing polymer systems that provide stability and benefit agent deposition as well as methods of making and using same. Such treatment compositions may be used for example as through the wash and/or through the rinse fabric enhancers as well as unit dose treatment compositions.

Detergent composition (F) for domestic or industrial use including, as thickener, a self-invertible inverse latex including an aqueous phase including: a) a crosslinked anionic polyelectrolyte (P) consisting of: —at least one first monomer unit derived from 2-methyl-2-[(1-oxo-2-propenyl)amino]-1-propanesulfonic acid in free acid form or partially or totally salified form; —at least one second monomer unit derived from at least one monomer chosen from the elements of the group consisting of 2-hydroxyethyl acrylate, 2,3-dihydroxypropyl acrylate, 2-hydroxyethyl methacrylate, 2,3-dihydroxypropyl methacrylate, or vinylpyrrolidone; and—at least one monomer unit derived from a polyethylenic crosslinking monomer (AR), b) at least one sequestrant compound (SQ) chosen from the elements of the group consisting of ethylenediaminedisuccinic acid in trisodium salt form, the glutamic acid, N,N-diacetic acid, tetrasodium salt, and the sodium salt of iminosuccinic acid.