The invention concerns a detergent composition containing less than 1 wt. % of phosphate, comprising: (a) from 2 to 25 wt. % of an alcohol ethoxylate of formula R.sub.1—(OCH.sub.2CH.sub.2).sub.mOH where R.sub.1 is selected from saturated or monounsaturated linear C16 and/or C18 alkyl chains and where m is from 6 to 40; and, (b) from 2 to 25 wt. % of an alcohol ether sulfate of formula R.sub.2—(OCH.sub.2CH.sub.2).sub.nOSO.sub.3H where R.sub.2 is saturated or monounsaturated linear C16 and/or C18 alkyl chain and n is from 5 to 20; wherein the mole ratio of (a) to (b) is from 9:1 to 1:9; the invention also concerns a domestic method of treating a textile.

The invention provides to a powdered composition of additives and a method of use thereof for increasing the visibility, potency and coverage of disinfectant solutions, such as bleach.

The present disclosure provides liquid and unit dose laundry detergent compositions. Provided herein is a laundry detergent composition including: (a) at least one anionic surfactant, (b) at least one non-ionic surfactant, (c) at least one cationic cellulosic polymer, (d) at least one dye transfer inhibitor polymer, (e) at least one anti-redeposition polymer, and (f) water. The present disclosure also provides a unit dose laundry detergent product including: a water-soluble polymeric film; a detergent composition encapsulated by the water-soluble polymeric film, the detergent composition including: (a) at least one anionic surfactant, (b) at least one non-ionic surfactant, (c) at least one cationic cellulosic polymer, (d) at least one dye transfer inhibitor polymer, (e) at least one anti-redeposition polymer, and (g) water. Methods of making and using the disclosed laundry detergent compositions are also provided.

An object of the present invention is to provide a treatment liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a chemical mechanical polishing method and a method for treating a semiconductor substrate.

The treatment liquid of an embodiment of the present invention is a treatment liquid for a semiconductor substrate, which includes a component A having two or more onium structures in the molecule and water, and has a pH of 6.0 to 13.5 at 25° C.

Methods for preventing elemental sulfur deposition from a hydrocarbon fluid is disclosed. A mercaptan is added to a hydrocarbon fluid that has elemental sulfur and reacted with the elemental sulfur to produce a disulfide and hydrogen sulfide. Amines and/or surfactants can assist with the process. Secondary reactions between the disulfide and the elemental sulfur result in a polysulfide and a solvated sulfur-disulfide complex. The disulfide, hydrogen sulfide, polysulfide and solvated sulfur-disulfide complex do not deposit, and can optionally be removed.

Methods for preventing elemental sulfur deposition from a hydrocarbon fluid is disclosed. A mercaptan is added to a hydrocarbon fluid that has elemental sulfur and reacted with the elemental sulfur to produce a disulfide and hydrogen sulfide. Amines and/or surfactants can assist with the process. Secondary reactions between the disulfide and the elemental sulfur result in a polysulfide and a solvated sulfur-disulfide complex. The disulfide, hydrogen sulfide, polysulfide and solvated sulfur-disulfide complex do not deposit, and can optionally be removed.

The present invention is a softening base agent containing a compound represented by the following formula 1:

##STR00001## wherein each of R.sup.1 and R.sup.2 represents a hydrocarbon group with 6 or more and 24 or less carbons, and the total number of carbons in R.sup.1 and R.sup.2 is 18 or more and 30 or less; and M is a cation, excluding a hydrogen ion.

A liquid hand dishwashing cleaning composition has a surfactant system in a level of from 15% to 40% by weight of the composition. The surfactant system has an anionic surfactant, a co-surfactant, and less than or equal to 18.4% of a nonionic surfactant package by weight of the composition. The weight ratio of the nonionic surfactant to the anionic surfactant is from 1:1 to 3:1. The nonionic surfactant package has a mixture of a first nonionic surfactant and a second nonionic surfactant. The first nonionic surfactant comprises an alkyl polyglucoside surfactant. The weight ratio of the anionic surfactant to the co-surfactant ranges from 1:1 to 8:1. The weight ratio of the first nonionic surfactant to the second nonionic surfactant ranges from 3:1 to 1:3.

Cleaning solution for cleaning and/or wetting metal surfaces, comprising at least one acid, a first surfactant, which is an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≤25° C., a second surfactant, which is selected from the group consisting of i) an alkyl-poly(ethyleneglycol-co-propyleneglycol)-ether having a cloud point of ≥30° C., ii) an alkyl-polyethyleneglycol-ether having a cloud point of ≥45° C.
wherein the cloud points are determined according to European Standard EN 1890:2006, item 8.2 of German Version, with the modification that 10 wt % H.sub.2SO.sub.4 is used as solvent and that the concentration of the surfactant is 1000 mg/L.

Fabric treatment compositions that include benefit agent capsules and biphenyl brightener. Methods of using the same. Wash water that includes such compositions.