Detergent compositions that contain an enzyme, alkaline source, and phosphonate or amine phosphonate salt are described here. A use solution of the detergent compositions containing disclosed phosphonates can retain its enzyme activity for an extended period of time. Specifically, one specific type of phosphonates and another specific type of amine phosphonate salts were discovered to stabilize enzymes in detergent compositions. Solid detergent compositions that contain disclosed phosphonate or amine phosphonate salts are more effective to remove soils and can save production and use costs.

Described herein are fabric softening compositions comprising a quaternary ammonium compound (e.g., an esterquat); a cationic polyquaternium polymer (e g., polyquaternium-7); a preservative system which comprises an organic acid (e.g., lactic acid or phosphonic acid); and 3-iodo-2-propynyl butylcarbamate (IPBC) or Dodecylguanidine Hydrochloride (DGH); and a phosphonic chelating agent (e.g., etidronic acid). Methods of making and using the fabric softening compositions are also described herein.

Described herein are fabric softening compositions comprising a quaternary ammonium compound (e.g., an esterquat); a cationic polyquaternium polymer (e g., polyquaternium-7); a preservative system which comprises an organic acid (e.g., lactic acid or phosphonic acid); and 3-iodo-2-propynyl butylcarbamate (IPBC) or Dodecylguanidine Hydrochloride (DGH); and a phosphonic chelating agent (e.g., etidronic acid). Methods of making and using the fabric softening compositions are also described herein.

The present invention is a contact lens treatment solution containing the following copolymer A and copolymer B in a ratio of A/B=40/1 to 5/1 (by weight). According to the present invention, there can be provided a contact lens treatment solution capable of removing dirt having adhered to contact lens surfaces, capable of improving lubricity of contact lens surfaces and capable of imparting persisting hydrophilicity to contact lens surfaces, by simple immersion treatment. Copolymer A: a copolymer obtained by copolymerization of a monomer (a) represented by formula (1) and a monomer (b) represented by formula (2), in which the copolymerization ratio of the monomer (a) to the monomer (b), a/b=7/3 to 9/1 (by mol), and having a weight-average molecular weight of 400,000 to 800,000.
Copolymer B: a copolymer obtained by copolymerization of a monomer (a) represented by the formula (1) and a monomer (b) represented by the formula (2), in which the copolymerization ratio of the monomer (a) to the monomer (b), a/b=2/1 to 8/1 (by mol), and having a weight-average molecular weight of 1,000,000 to 1,500,000.

A formulation having at least one of a product stabilization solvent, a sequestrant or chelating agent, and an alkalinity agent capable of use in a cleaning operation at a reduced temperature. Optionally, the formulation may additionally comprise any one or more of a degreaser emulsifier solvent, a surfactant, a hydrotrope, a stabilizer, a biocide, and a buffer. An additive formulation of the invention, as defined herein, comprises these stated types of compounds and is combined with an alkalinity agent at the time of the formulations use in a reduced temperature dairy equipment cleaning operation. A full formulation of the invention, as defined herein, additionally comprises an alkalinity agent in addition to the other named compounds. In many cases, the full formulations are used in a reduced temperature dairy equipment cleaning operation without being combined with an additional alkalinity agent. The reduced temperature of the dairy equipment cleaning operation using the formulation of the invention may be less than about 50° C. or, alternatively, less than about 40° C.

The invention relates to the field of removing various types of deposits from a surface, specifically to means for cleaning metallic and ceramic surfaces of industrial equipment, and can be used for removing deposits, such as oxides of metals (iron, chromium, nickel, etc.), carbonate and salt deposits, asphaltene-resin-paraffin deposits and deposits of a petroleum nature, and deposits of an organic and biological deposits. The proposed solution for removing various types of deposits contains hydrogen peroxide, complexone, an anti-foaming agent, water-soluble calixarene and water in the following ratio: hydrogen peroxide, a catalyst for decomposing peroxide compounds, an antifoaming agent, complexone, water-soluble calixarene and water in the following quantitative ratio:2-35% by mass of hydrogen peroxide; 2-20% by mass of a catalyst for decomposing peroxide compounds; 3-10% by mass of complexone; 0.1-5% by mass of surface-active agent; 0.01%-1.0% by mass of anti-foaming agent; 0.01-1% by mass of water-soluble calixarene, with the remainder being water. The technical result is an increase in the effectiveness of action of a solution (degree of cleaning) for cleaning surfaces soiled with deposits having a high content of organic substances, while simultaneously extending the field of use of said solution.

An automatic dishwashing cleaning composition comprising: a) a mixed builder system comprising soluble builder and crystalline silicate wherein the soluble builder comprises a complexing agent, a phosphonate and a dispersant polymer and wherein the level of each soluble builder in the composition is: a1) from 15% to 40% by weight of the composition of the complexing agent; a2) from 2% to 7% by weight of the composition of the phosphonate; and a3) from 1% to 7% by weight of the composition of the dispersant polymer wherein the soluble builder and the crystalline silicate are in a weight ratio of from 8:1 to 15:1 b) a bleaching system comprising bleach, a bleach catalyst and a bleach activator; and c) from 0% to 20% by weight of the composition of carbonate.

The present invention provides acidic or basic cleaning compositions for use in cleaning food and beverage industry processing equipment and pharmaceutical and cosmetic industry processing equipment wherein the compositions of the invention comprise a food-equipment-safe acidic or basic cleaning compound and a food-equipment-safe colorimetric indicator of pH to show the desired acid or basic conditions during storage prior to the start of a cleaning cycle and after storage and during a cleaning cycle. The cleaning compositions of the invention are particularly useful in, for example, CIP cleaning processes.

A liquid cleaning agent composition may include at least one suitable protease and water in an amount of at least 30 wt. % and less, preferably 25 wt. % and less, in particular 15 wt. % or less based on the total composition.

There is provided a method of cleaning semiconductor substrates that is excellent in cleaning performance with respect to semiconductor substrates having undergone a chemical mechanical polishing process and corrosion prevention performance with respect to metal films. This method includes a cleaning step of cleaning a semiconductor substrate having undergone the CMP using a cleaning liquid. The cleaning liquid shows alkaline properties and contains: a component A that is at least one selected from the group consisting of a primary amine, a secondary amine, and a tertiary amine, provided that a compound represented by a specific formula (a) is excluded; and a component B that is a compound represented by the specific formula (a). The mass ratio of the component B content to the component A content is not more than 0.01. The cleaning liquid applied to the semiconductor substrate has a temperature of not lower than 30° C.