Provided are compositions and methods useful in the post-CMP cleaning of microelectronic devices, in particular, devices which contain one or more surfaces comprising hydrophobic carbon or SiC. In general, the compositions comprise a chelating agent; a water-miscible solvent; a reducing agent; and a pH adjustor, wherein the composition has a pH of about 2 to about 13.

An object of the present invention is to provide a method for producing a treatment liquid, having excellent filterability.

The method for producing a treatment liquid of an embodiment of the present invention is a method for producing a treatment liquid, the method including filtering an object to be purified including a surfactant, using a first filter having a first filter medium, to produce a treatment liquid for a semiconductor substrate, in which the first filter medium includes at least one selected from the group consisting of a nylon, a polyallyl sulfonic acid, a perfluoroalkoxy alkane which has been subjected to a hydrophilization treatment, a polytetrafluoroethylene which has been subjected to a hydrophilization treatment, a polyolefin which has been subjected to a hydrophilization treatment, and a polyvinylidene fluoride which has been subjected to a hydrophilization treatment, and the surfactant includes at least one selected from the group consisting of a nonionic surfactant including a group represented by Formula (1) and an anionic surfactant including a group represented by Formula (1).

Formula (1) (LO).sub.n

L represents an alkylene group, and n represents 3 to 55.

A method for waste material treatment that results in a more stable, entombed treated waste product. A reactive treatment formulation can be dispensed with a waste material deposit into a self-contained non-contact agitating toilet to form a stabilized viscous mass. The reactive treatment formulation mixed with the waste material deposit prevents odors, bacterial growth, and stabilizes the waste material into a treated waste product to reduce spillage during disposal.

An automatic dishwashing composition is provided including a builder; a phosphonate; a nonionic surfactant; and a dispersant polymer comprising: 60 to 98 wt % of structural units of formula I ##STR00001##
wherein each R.sup.1 is independently selected from a hydrogen and a —CH.sub.3 group; and 2 to 40 wt % of structural units of formula II ##STR00002##
wherein each R.sup.2 is independently selected from a —C.sub.1-4 alkyl group and wherein each R.sup.3 is independently selected from a hydrogen and a methyl group.

A method of washing glassware is provided including: providing automatic dishwashing apparatus; providing soiled glassware; placing soiled glassware in automatic dishwashing apparatus; providing wash water; providing rinse water; selecting anhydrous mixed powder or mixed granule comprising: 2.5-5 wt % of oxidized maltodextrin, wherein oxidized maltodextrin has Degree of Oxidation of 0.4-1.7; 10-25 wt % of amino acid based builder; 20-75 wt % of additional builder, wherein additional builder includes at least one of sodium citrate, sodium carbonate and sodium percarbonate; 2.5-7.5 wt % of bleach activator; 0.5-10 wt % of nonionic surfactant; 0.5-1 wt % of phosphonate; 1-6 wt % of enzyme; 5-15 wt % of filler; and <1 wt % water; placing selected anhydrous mixed powder or mixed granule in automatic dishwashing apparatus; contacting selected anhydrous mixed powder or mixed granule with wash water to form combination; contacting soiled glassware with combination to provide treated glassware; and then contacting treated glassware with rinse water to provide cleaned glassware.

An automatic dishwashing composition is provided including a builder; a nonionic surfactant; and a dispersant polymer comprising: (a) >60 to <90 wt %, based on weight of the dispersant polymer, of structural units of formula I

##STR00001##

wherein each R.sup.1 is independently selected from a hydrogen and a —CH.sub.3 group; and (b) >10 to <40 wt %, based on weight of the dispersant polymer, of structural units of formula II

##STR00002##

wherein each R.sup.2 is independently selected from the group consisting of a C.sub.1-6 hydroxyalkyl group and a C.sub.1-6 alkoxy group; and wherein each R.sup.3 is independently selected from a hydrogen and a methyl group.

A process for washing fabrics including the steps; a) contacting fabrics to be washed and a wash liquor in the drum of an automatic washing machine; b) washing the fabrics in the wash liquor in an automatic washing machine process, where the automatic washing machine process includes at least a main wash step; where the wash liquor includes; i) between about 0.5 ppm and about 5 ppm acyl hydrazone bleach catalyst; ii) between about 10 ppm and about 2500 ppm non-soap surfactant; iii) between about 50 ppm and about 2500 ppm of a hydrogen peroxide source, and where the wash liquor has a pH between about 6 and about 9.

Water-soluble unit dose articles including a bleach catalyst and methods of their use.

A water-soluble unit dose article including a water-soluble film and a first compartment and a second compartment, where the first compartment includes a powder composition, where the powder composition includes an acyl hydrazone bleach catalyst; and where the second compartment includes a liquid composition, where the liquid composition includes between about 10% and about 25% by weight of the liquid composition of a non-aqueous solvent system; where the non-aqueous solvent system includes a polyol and a monoalcohol.

There are disclosed co-granules coated with hydroxymethyl cellulose and containing: b1) cyclic sulfonimine, b2) bleach activator selected from the group consisting of tetraacetylethylenediamine, decanoyloxybenzoic acid or mixtures thereof, and b3) carboxymethyl cellulose as binder, wherein the binder consists of the carboxymethyl cellulose of component b)3 which has a solubility of at least 1 g of carboxymethyl cellulose in 1 L of water at 25° C. and wherein the coating comprises hydroxymethyl cellulose in an amount of from 5 to 20 wt. % of the coated co-granules.