The present invention is a method for removing a biofilm containing a metal and formed in a water system, wherein the biofilm is brought into contact with (a) a compound having a hydroxyl radical generation ability and (b) a reducing agent.

A biodegradable cleaning and disinfectant concentrate and method for disinfecting and cleaning surfaces. The concentrate consists essentially of a reaction product of hydrochloric acid and urea; an ethoxylated alcohol surfactant; water; and optionally, a peroxide booster. The reaction product is present in an amount ranging from about 30 to about 50 percent by weight based on a total weight of the concentrate.

Surface treatment articles, systems for making/loading surface treatment articles, and methods of making surface treatment articles are described. In embodiments the surface treatment articles are configured to be impregnated or otherwise loaded with a surface treatment liquid that includes a carrier and an active agent. The carrier may be or include water, and the active agent may be or include dissolved ozone, ozone degradation products, and/or ozone reaction products. The surface treatment liquid may contain a threshold concentration of active agent for a residence time that is sufficient for desired cleaning, disinfecting, and/or polishing applications.

Peroxide treatment compositions for use in laundry capable of providing sanitization through the wash e.g., for use with a detergent, where a peroxide activator is stabilized without the presence of phosphorus-containing compounds (e.g., phosphorus-containing stabilizers), through use of a nonionic surfactant (e.g., alkoxylated alcohol) with a cloud point above 45° C. Use of a single nonionic surfactant, or a surfactant package that may include a small fraction (e.g., less than 0.5%) of sodium lauryl sulfate or another anionic surfactant has been found to be surprisingly effective at stabilizing the peroxide/activator combination, even where water content may be 85% or greater. The composition can have a pH of 5 or less (e.g., 3 to 4). The composition may be free of other anionic surfactants, cationic surfactants, zwitterionic surfactants, amphoteric surfactants, magnesium salts, borates and boric acid, hydroxides, chelating agents, various amine oxides, ethoxylated amines, and the like.

The present disclosure is directed to a composition and method for treating stains and odors using an oxidizing agent and Bacillus spores. The composition preferably comprises a two part formula, a first part comprising the oxidizing agent and water and optionally an ionic surfactant and fragrance, and a second part comprising a liquid Bacillus spores composition or a dry Bacillus spores powder composition. The preferred Bacillus can include B. licheniformis, B. subtilis, B. pumilus, and B. megaterium spores. The preferred oxidizer is hydrogen peroxide. The parts of the treatment composition are mixed together in-situ at the site of treatment to maintain the viability of the Bacillus spores. The preferred composition and method allow for the combined treatment of stains and odors with an oxidizer and Bacillus spores.

Disclosed are microwave assisted methods and systems for decontaminating a variety of contaminated surfaces. The systems and methods comprise treating the surfaces with benign chemical formulations followed by exposing to microwave irradiation for short periods of time to achieve at least 6-log reduction in biological contaminants including spores of B. anthracis, B. thuringiensis, and P. roqueforti. Chemical formulations may comprise copper (II) chloride in water. The formulations may include a surfactant such as a polyethylene sorbitol ester surfactant.

Conventional ozone water is still insufficient in the removal rate and cleaning ability of resist required in today's semiconductor manufacturing field, and it does not fully meet the expectation of further improvement in the effects of sterilization, deodorization, and cleaning in the fields such as cleaning of foodstuffs, cleaning of process equipment and tools, and cleaning of fingers, as well as in the fields such as deodorization, sterilization, and preservation of freshness of foodstuffs. The above problem can be solved by defining the values of a plurality of specific production parameters in the production of ozone water into specific ranges.

The present technology generally relates to liquid compositions for cleaning post-CMP semiconductor surfaces, and methods of cleaning a semiconductor surface having ceria (CeO.sub.2) particles thereon.

Systems and methods for using solid high-level disinfection chemistries to producing disinfectant solutions. In an embodiment, an apparatus comprises: a first container and a second container. The first container is configured to receive water, sodium percarbonate and tetraacetylethylenediamine. The water, the sodium percarbonate, the tetraacetylethylenediamine react within the first container to produce a mixture comprising peroxyacetic acid. The second container is in fluid communication with the first container, wherein the second container is configured to receive an acid and the mixture. The mixture and the acid mix in the second container to produce a disinfectant solution having a pH between 5.0 and 7.0.

A composition is provided for use as a hard surface cleaner, sanitizer and/or disinfectant. In a preferred embodiment, the composition comprises an alkanesulfonic acid; a source of peroxide; an effective amount of a stabilizer; and water.