C11D7/20

Suspension cleaning

A method of cleaning a contaminated surface, such as cleaning the elongate interior lumen of an endoscope contaminated with flesh, bone, blood, mucous, faeces or biofilm, said method comprising the steps of: providing a suspension of solid particles in a liquid to said contaminated surface, and flowing said suspension along said surface thereby to remove contaminant from the surface. The suspension is preferably a paste, where the solid material may be e.g. crystals of a salt, silicon oxide or organic material. The paste preferably has a solid fraction between 5 and 55%. A rheology modifier may be present.

SEMICONDUCTOR TREATMENT COMPOSITION AND TREATMENT METHOD

A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×10.sup.1 to 1.5×10.sup.3 per mL.

Treatment liquid, method for washing substrate, and method for removing resist

A treatment liquid for a semiconductor device contains an organic alkali compound, a corrosion inhibitor, an organic solvent, Ca, Fe, and Na, in which each of the mass ratio of the Ca, the mass ratio of the Fe, and the mass ratio of the Na to the organic alkali compound in the treatment liquid is 10.sup.—12 to 10.sup.−4. A method for washing a substrate and a method for removing a resist use the treatment liquid.

Treatment liquid, method for washing substrate, and method for removing resist

A treatment liquid for a semiconductor device contains an organic alkali compound, a corrosion inhibitor, an organic solvent, Ca, Fe, and Na, in which each of the mass ratio of the Ca, the mass ratio of the Fe, and the mass ratio of the Na to the organic alkali compound in the treatment liquid is 10.sup.—12 to 10.sup.−4. A method for washing a substrate and a method for removing a resist use the treatment liquid.

Nail polish removing composition

The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.

Nail polish removing composition

The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.

COMPOSITIONS
20220127507 · 2022-04-28 ·

According to the present invention, there is provided a composition comprising 1,1-difluoroethylene (R-1132a), fluoromethane (R-32), 2,3,3,3-tetrafluoropropene (R-1234yf) and carbo dioxide (CO.sub.2, R-744). The invention also provides a composition R-1132a, R-32, R-1234yf and at least one compound selected from the group consisting of: pentafluoroethane (R-125), 1,1-difluoroethane (R-152a), 1,1,1,2-tetrafluoroethane (R-134a), trans-1,3,3,3-tetrafluoropropene (R-1234ze(E)) and 1,1,1,2,3,3,3-hepta-fluoropropane (R-227ea); optionally, the composition comprises at least one further compound selected from the group consisting of trifluoroethylene (R-1123), propane (R-290), propylene (R-1270), isobutane (R-600a) and carbon dioxide (CO.sub.2, R-744). The present invention also provides a composition comprising R-1132a, R-32 and R-1234yf.

Suspension Medium for Improved Grit Delivery in Vapor Blast Operations
20220127551 · 2022-04-28 ·

A suspension medium for improved grit delivery in vapor blast operations sets forth addition of a suspending-agent to a blast solution whereby solids are maintained in suspension absent agitation or mixing for at least 60 hours. The suspending agent increases the viscosity and/or density of the blast solution to increase the buoyancy force and/or acts as a dispersant and/or surfactant to maintain suspension of solids in solution over the extended time period. Different concentrations of suspending-agent may be employed with different grit and solid sized particles, depending on the application of vapor blasting at hand. The suspending-agent is preferably biodegradable.

Suspension Medium for Improved Grit Delivery in Vapor Blast Operations
20220127551 · 2022-04-28 ·

A suspension medium for improved grit delivery in vapor blast operations sets forth addition of a suspending-agent to a blast solution whereby solids are maintained in suspension absent agitation or mixing for at least 60 hours. The suspending agent increases the viscosity and/or density of the blast solution to increase the buoyancy force and/or acts as a dispersant and/or surfactant to maintain suspension of solids in solution over the extended time period. Different concentrations of suspending-agent may be employed with different grit and solid sized particles, depending on the application of vapor blasting at hand. The suspending-agent is preferably biodegradable.

METHOD AND COMPOSITION
20220010241 · 2022-01-13 ·

A method for removing grease, oil or fat from a floor comprises applying expanded perlite particles in dry form to the floor and brushing said perlite across the affected area to strip or scour the grease, oil or fat, without applying water. The particle size of the perlite may be small, for example it may be the case that at least 90% by weight of the perlite has a particle size of less than 700 microns or less than 200 microns.