Embodiments of the present disclosure herein include a method of removing a contamination material from an optical device. The method may include disposing an optical device in a process chamber, the optical device having optical device structures formed in a substrate, the contamination material is disposed at least on sidewalls of the optical device structures and within trenches between the optical device structures, and exposing the optical device to a plasma generated in the process chamber, the plasma generated from oxygen gas (O.sub.2), chlorine gas (Cl.sub.2), Argon (Ar), or a combination thereof, the exposing the optical device to the plasma removes the contamination material.

A bleaching apparatus has an immersing vessel for immersing clothes in a chemical liquid, and a light source for irradiating the clothes immersed in the immersing vessel with light. The chemical liquid may include an oxidizing agent or a reducing agent in a concentration of 3 to 30% owf. The illumination intensity of the light is 10,000 to 70,000 lx.

A method of automatic dishwashing of dishware, including electrolytically generating a bleaching species, washing the dishware with a composition comprising the bleaching species, and washing the dishware with a composition including an enzyme. The invention also includes an automatic dishwasher including a wash tank, an electrochemical cell, and a first reservoir containing a composition including an enzyme, wherein the electrochemical cell contains a solution including an alkali metal chloride salt, wherein the dishwasher is configured to electrolyze the solution, and to dose the electrolyzed solution into the wash tank before dosing the composition including the enzyme into the wash tank. The invention also includes a kit for use in the method of automatic dishwashing of dishware.

A material feeding apparatus is disclosed. An apparatus for removing a surface oxide of a metal material and feeding the metal material to a melting furnace, according to an embodiment of the present disclosure, includes: a housing including a material dropping chamber for feeding and discharging the metal material and a material etching chamber for performing a plasma etching process; and a pretreatment casing configured to reciprocate between the material dropping chamber and the material etching chamber in the housing, wherein the pretreatment casing receives the metal material from the material dropping chamber to store the metal material, moves to the material etching chamber to plasma-etch a surface oxide layer of the stored metal material, and then returns to the material dropping chamber to drop the etched metal material into the melting furnace.

The cleaning performance of washing and cleaning agents, in particular with respect to bleachable stains, was to be intensified without resulting in damage, in the context of use, to the textile treated therewith. This was achieved substantially by employing a bleaching-active species generated electrolytically from an organic mediator compound using a redox reaction.

A method of cleaning a substrate (16, 24, 34, 64, 71, 82, 102, 165, 171, 181, 201, 300, 310) with optical energy can comprise applying optical energy from a source of optical energy (12, 21, 31, 91, 103, 114, 121, 131, 141, 151, 164, 191, 202) to the substrate. The method can comprise applying the optical energy to a substrate having a cleaning agent applied thereto, the optical energy having one or more optical parameters selected for cleaning the substrate. The method can comprise reading data from a data bearing element (173) associated with the substrate, communicating the data to a processor (154) associated with a cleaning appliance (10, 30, 40, 60, 70, 80, 90, 110, 120, 130, 140, 150, 161, 200) comprising the source of optical energy, wherein the processor, responsive to the communicated data, controls the cleaning of the substrate with the optical energy. The method can comprise slidingly contacting the substrate with a work surface, said work surface comprising an aperture (83, 117) and emanating optical energy from the aperture for cleaning the substrate. A cleaning appliance can comprise an appliance body (80, 90, 104, 125) comprising an aperture for emanating optical energy for cleaning the substrate and an optical transmission pathway arranged for propagating optical energy received from an optical energy source to said aperture. The appliance can be adapted and constructed for delivering a cleaning agent to the substrate. The appliance can include a processor, a data interface in communication with the processor, and can be configured such that the processor outputs signals that control the cleaning of the substrate, the processor being configured for controlling, responsive to data received by the data interface and via the output signals, the substrate cleaning. The cleaning appliance can include a suction pump (142) for removing material from the substrate.

The present invention is generally directed to a hydrogen peroxide-based lens care system for disinfecting contact lenses. Unlike hydrogen peroxide-based system known in the prior art, a lens care system of the present invention involves electrochemically neutralizing of hydrogen peroxide after any desired period of disinfection time for which contact lenses have been immersed in a hydrogen peroxide-based lens care solution.

Provided is a cleaning agent composition for use in an adhesion process for applying an adhesive to a surface of a first member subjected to a dry treatment without a primer, and adhering a second member to the surface of the first member. The cleaning agent comprises a compound (A) having a (meth)acryloyl group and a liquid (B) having a boiling point of not higher than 200 C.

After hydrophobization of surfaces of patterns, a liquid film of pure water or the like is formed on the surfaces of the substrate. At this stage, the liquid of the liquid film cannot be present between the patterns because of hydrophobization, and gas is present there. With the front surface of the substrate covered with the liquid film, a liquid to which ultrasonic waves are applied is supplied to the back surface of the substrate, whereby the back surface of the substrate is cleaned due to the cavitation collapse energy in the liquid caused by the ultrasonic waves. While collapse of cavitation occurs at the front surface of the substrate, the presence of the gas between the patterns prohibits collapse of cavitation between the patterns, the liquid film can prevent contamination while preventing collapse of the patterns, and the back surface of the substrate is cleaned favorably.

Systems and methods for cleaning a hard-coated ophthalmic lens and stripping the hard-coating of the hard coated ophthalmic lens in a single pass process are disclosed. The hard-coated ophthalmic lens is sequentially treated with a cleaning solution, an alkaline solution, and a stripping solution. Ultrasonic power is applied to the solutions and the ophthalmic lens during the process. The resulted ophthalmic lens has substantially no sign of chemical attack or residual hard coating or varnishes thereon.