A porous silica having at least one metal X selected from the group consisting of Mn, Cu and Fe.

Provided is a storage device including a storage body for holding a liquid, a gas or an item, which has a first wall, a second wall, and a magnetic closure device for closing the storage body, which has a first closure part and a second closure part. The first closure part has a first strip body elongate along a transverse direction and is arranged on a first closing portion of the first wall. The second closure part has a second strip body elongate along a transverse direction and is arranged on a second closing portion of the second wall. The first closure part and the second closure part cooperate in a magnetically attracting manner. At least one of the first wall, the second wall, the first strip body and the second strip body are wholly or partly fabricated from a composition containing an antimicrobially active additive.

A combination of nanoparticles applied onto a mask filtration system, exemplarily including 1%-10% graphene; 1%-10% titanium dioxide; 1%-10% zinc oxide; 1%-10% copper oxide; 1%-10% silicon dioxide; and balance solvent is provided.

A water-based curable composition, for production of coatings having an antimicrobial property, contains at least one film-forming polymer, optionally at least one additive and/or at least one curing agent, and at least one up-conversion phosphor of the general formula (I): A.sub.1-x-y-zB*.sub.yB.sub.2SiO.sub.4:Ln.sup.1.sub.x,Ln.sup.2.sub.z. In the general formula (I), x=0.0001-0.0500; z=0.0000 or z=0.0001 to 0.3000 with the proviso that: y=x+z; A is selected from Mg, Ca, Sr and Ba; B is selected from Li, Na, K. Rb and Cs; B* is selected from Li, Na and K; and preferably B and B* are not the same. Additionally, Ln.sup.1 is selected from praseodymium (Pr), erbium (Er), and neodymium (Nd); and Ln.sup.2 is gadolinium (Gd). The phosphor, as a result of an aftertreatment, includes at least one material which has a band gap of greater than 6.0 electronvolts (eV) and is hydrolysis-stable.

A curable composition for production of coatings having an antimicrobial property, contains at least one film-forming polymer, optionally at least one additive and/or at least one curing agent, and at least one up-conversion phosphor of the general formula (I): A.sub.1-x-y-zB*.sub.yB.sub.2SiO.sub.4:Ln.sup.1.sub.x,Ln.sup.2.sub.z. In the general formula (I), x=0.0001-0.0500; z=0.0000 or z=0.0001 to 0.3000 with the proviso that: y=x+z; A is selected from Mg, Ca, Sr and Ba; B is selected from Li, Na, K, Rb and Cs; B* is selected from Li, Na and K; and preferably B and B* are not the same. Additionally, Ln.sup.1 is selected from praseodymium (Pr), erbium (Er), and neodymium (Nd); and Ln.sup.2 is gadolinium (Gd). The phosphor has been prepared using at least one halogen-containing flux.

Described is a device (1) for reducing pollutants in a gaseous mixture comprising: •a containment body (2) having an inlet portion (3) for the gaseous mixture and an outlet portion (4) for the gaseous mixture, the containment body (2) imposing on the gaseous mixture a fixed direction of flow (D), •at least one filtering unit (10) comprising a photocatalytic filter (7) interposed, along the fixed direction of flow (D), between a first light source (6a) and a second light source (6b), both having a wavelength in the visible spectrum (400-700 nm), the photocatalytic filter (7) comprising a photocatalytic nanoparticle coating and the nanoparticle coating comprising titanium dioxide doped with a nitrogen doping agent. •a unit (5) for straightening the flow before the filtering unit (10).

A method for preparing a bactericidal film on fiber cloth, comprising cleansing a reel of fiber cloth; placing the reel of fiber cloth into a vacuum chamber; supplying a DC power and a mid-frequency power; introducing argon gas to increase the chamber pressure to 0.3 Pa; position sputtering targets in the following order: silicon target, silicon carbide target, silver target, silicon carbide target, silver target, silicon carbide target and silver target, and then sputtering the targets simultaneously; wherein the silicon targets act as a bonding layer between the bactericidal film and the substrate; stopping the silicon targets, the silicon carbide targets and the silver targets first, and then turning off the argon gas; injecting air into the chamber until the pressure in the chamber and the atmospheric pressure are balanced.

This document describes self-cleaning devices. In one aspect, a self-cleaning device includes a fabric having a surface covered with a photocatalyst, one or more light sources embedded in the fabric, and a triggering mechanism that activates a cleaning cycle by activating the one or more light sources. The triggering mechanism can include a pressure sensor. The triggering mechanism can be configured to activate the cleaning cycle in response to detecting a decrease in pressure being applied to the pressure sensor.

Disclosed herein are articles (e.g., wearable articles, such as gloves and masks) comprising an antimicrobial material, and methods of manufacture thereof. In various embodiments, the antimicrobial material comprises dimethyloctadecyl[3-(trimethoxysilyl)propyl]ammonium, or a salt thereof. In some embodiments, the antimicrobial article (e.g., a wearable article, such as a glove or mask) may have antiviral properties against coronavirus, such as SARS-CoV-2.

Presented here is a multi-functional powder which: comprises the first component that includes one selection from the group consisting of silicon oxide (SiO2), aluminum oxide (Al2O3), calcium oxide (CaO), magnesium oxide (MgO), and combinations thereof; and the second component that includes at least one selection from the group consisting of iron oxide (Fe2O3), potassium oxide (K2O), sodium oxide (Na2O), strontium oxide (SrO), sulfur trioxide (S3O), boron oxide (B2O3), manganese oxide (MnO), titanium dioxide (TiO2), and combinations thereof; whose far-infrared emission rate for the wavelength region of 5 .Math.ms to 20 .Math.ms at 37° C. is between 0.5% and 5%; whose harmful gas deodorization balance index under the following Formula 1 is between 0.8 and 2.0; and whose bacterial reduction rate (%) is 90% or greater for each of staphylococcus aureus (ATCC 6538), Escherichia coli (ATCC 8739), Klebsiella pneumonia (ATCC 4352), and Pseudomonas aeruginosa (ATCC 10145).