The invention relates to a method for treating emergency spill or leak of halogen which is bromine or chlorine, comprising contacting an aqueous solution of quaternary ammonium halide with the halogen.

The invention relates to a method for treating emergency spill or leak of halogen which is bromine or chlorine, comprising contacting an aqueous solution of quaternary ammonium halide with the halogen.

According to an embodiment, a process apparatus performs processing on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element. The apparatus includes a process liquid tank, a processing tank, a supplier and an exhauster. A process target member including the byproduct is introduced into the processing tank. The supplier supplies the process liquid from the process liquid tank to the processing tank and performs processing on the byproduct with the supplied process liquid. The exhauster exhausts a gas generated by reaction between the process liquid and the byproduct from the processing tank.

Processing solid waste containing fluorine compounds, and applications thereof. Solid waste processing method includes: providing and mixing (i) solid waste containing fluorine compounds and (ii) solid calcium hydroxide, for forming a mixture thereof; heating the mixture in chemical reducing (non-oxidizing) environment, thereby forming a heated product including solid calcium fluoride; and handling or/and processing the heated product, to form non-hazardous safely disposable material. Solid waste processing system includes: solid waste input unit; solid calcium hydroxide supply unit; mixing unit; heating unit; and product handling/product processing unit. Applicable to large scale commercial processes of, or involving, manufacturing materials and products containing fluorine compounds during which are generated large amounts of solid waste containing fluorine compounds, whereby such solid waste needs to be handled or/and processed, and disposed of.

The invention relates to a method for treating emergency spill or leak of halogen which is bromine or chlorine, comprising contacting an aqueous solution of quaternary ammonium halide with the halogen.

According to an embodiment, a process apparatus performs processing on a byproduct generated in a reaction of a raw material including silicon and a halogen element or in a reaction between a raw material including silicon and a raw material including a halogen element. The apparatus includes a process liquid tank, a processing tank, a supplier and an exhauster. A process target member including the byproduct is introduced into the processing tank. The supplier supplies the process liquid from the process liquid tank to the processing tank and performs processing on the byproduct with the supplied process liquid. The exhauster exhausts a gas generated by reaction between the process liquid and the byproduct from the processing tank.

The present invention is directed to a formulation and associated method for neutralizing one or more toxic chemical and/or materials including toxic industrial chemicals and toxic industrial materials, such as irritants, heavy metals, radioactive metals, acids and acid irritants, pesticides, and various agricultural chemicals, (collectively referred to as toxic chemical, materials, or simply toxins) as well as decontaminating surfaces that have come into contact with these agents. As a result, the formulation of the present invention can be used for neutralizing a broad spectrum of toxic chemicals and materials. In one embodiment, the active ingredient comprises 2, 3, butanedione monoxime (also known as diacetyl monoxime (DAM)), and alkali salts thereof such as potassium 2,3-butanedione monoxime (KBDO). The formulation also typically includes a carrier in which the active ingredient is dispersed. In one embodiment, the carrier comprises polyethylene glycol (PEG); monomethoxypolyethylene glycol (mPEG); and combinations and derivatives thereof.

The present invention is directed to a formulation and associated method for neutralizing one or more toxic chemical and/or materials including toxic industrial chemicals and toxic industrial materials, such as irritants, heavy metals, radioactive metals, acids and acid irritants, pesticides, and various agricultural chemicals, (collectively referred to as toxic chemical, materials, or simply toxins) as well as decontaminating surfaces that have come into contact with these agents. As a result, the formulation of the present invention can be used for neutralizing a broad spectrum of toxic chemicals and materials. In one embodiment, the active ingredient comprises 2,3, butanedione monoxime (also known as diacetyl monoxime (DAM)), and alkali salts thereof such as potassium 2,3-butanedione monoxime (KBDO). The formulation also typically includes a carrier in which the active ingredient is dispersed. In one embodiment, the carrier comprises polyethylene glycol (PEG); monomethoxypolyethylene glycol (mPEG); and combinations and derivatives thereof.

Aspects of the disclosure include the manufacture of non-naturally occurring bacteria for perchlorate bioremediation. An exemplary method includes determining a source bacteria having one or more source genes which code for perchlorate reduction and chlorite dismutase and determining a target bacteria that does not naturally include the source genes. A first sequence of deoxyribonucleic acid (DNA) is identified in the source genes that codes, in the source bacteria, for an ordered set of amino acids whose linear sequence results in a protein which breaks down perchlorates and a second sequence of DNA is determined which, if inserted into the target bacteria, would allow the target bacteria to code for the ordered set of amino acids. A gene package is built by replacing the first sequence of DNA with the second sequence of DNA and the gene package is inserted into the target bacteria, thereby forming a non-naturally occurring modified bacteria.

A method for decontaminating residual halogen species in a processed metal-containing layer without breaking vacuum includes processing a metal-containing layer (such as a metal oxide layer) using a halogen-containing process gas to form a processed metal-containing layer that includes residual halogen species, and chemically modifying the residual halogen species to form modified residual species using a reactive gas to decontaminate the residual halogen species. Decontamination may include neutralization and/or removal of the residual halogen species. The metal-containing layer may be an organometal oxide photoresist and processing with the halogen-containing process gas may form a patterned photoresist layer contaminated with the residual halogen species. The modified residual species may be further treated using dinitrogen plasma (pure or with additional gases) and/or additional reactive gases, both of which may be combined with maintaining and higher or lower temperature during the treatment.