Patent classifications
B01D2247/106
Apparatus and method for wet cleaning a gas stream
An apparatus and method for wet cleaning a gas stream has a housing with a gas inlet and a gas outlet, wherein, in the housing, there is at least a first washing segment that serves to clean the gas stream with a washing liquid and that is arranged in the flow path of the gas stream. Inside the housing of the apparatus, there is at least one fan that regulates air pressure along the flow path of the gas stream. A bypass channel for bypassing the flow path through the at least one washing segment as well as a regulator that is arranged in the bypass and that serves to discharge the gas stream being conveyed via the bypass channel are arranged inside the housing.
Active wet scrubbing filtration system
An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.
DEVICES, SYSTEMS AND METHODS FOR FLUX REMOVAL FROM FURNACE PROCESS GAS
System and methods for solder flux removal from a gas stream is disclosed. In one aspect, the system includes: a scrubber chamber having a gas inlet and a gas outlet through which the gas stream is introduced into and withdrawn from the scrubber chamber; at least one rinse agent delivery mechanism for introducing a rinse agent into the scrubber chamber for contact with the gas stream, the rinse agent being at a temperature for condensing a first portion of the flux from the gas stream; a condenser portion of the scrubber chamber containing the rinse agent for receiving the gas stream, the rinse agent being at a temperature for condensing a second portion of the flux in the gas stream; and a condensed flux removal apparatus adapted for removal from the scrubber chamber of at least a portion of the rinse agent and the flux which has condensed.
Mist elimination and pollutant removal device and method
An integrated device for removal of both liquid-containing droplets and pollutants from a gas stream includes a plurality of passageways and a plurality of exposed surface portions, different ones of the surface portions disposed along different ones of the plurality of passageways. The plurality of passageways include an inlet and an outlet for the flow of a gas stream therethrough, wherein each passageway includes at least one segment configured to perturb the flow of at least a portion of the gas stream between the inlet and the outlet. Such gas perturbation enhances gas stream contact with the exposed surfaces. Portions of the exposed surfaces comprise a sorbent-polymer-composite material adapted for contact conversion of sulfur oxides to sulfuric acid droplets. The exposed surfaces are disposed to enhance the removal of liquid-containing droplets and contact conversion of sulfur oxides to sulfuric acid droplets.
SUBMICRON PARTICLE REMOVAL FROM GAS STREAMS
Disclosed are methods and systems for removing submicron particles from a gas stream, in particular from urea prilling off-gas, wherein a Venturi ejector is used. A method comprises contacting a gas stream containing submicron particles in a Venturi ejector with an injected high velocity scrubbing liquid to provide a pumping action, wherein the scrubbing liquid has an initial velocity of at least 25 m/s and wherein the ratio of scrubbing liquid and gas flow is between 0.0005 and 0.0015 (m.sup.3/h)/(m.sup.3/h).
Fuel cell system
A fuel cell system includes a gas liquid separator provided downstream of a humidifier in an oxygen-containing gas inlet channel, a fuel exhaust gas inlet channel for guiding a fuel exhaust gas containing liquid water discharged from a fuel cell stack to the gas liquid separator. The gas liquid separator performs gas liquid separation of both of an oxygen-containing gas humidified by the humidifier and the fuel exhaust gas containing the liquid water guided from the fuel exhaust gas inlet channel.
Devices, systems and methods for flux removal from furnace process gas
System and methods for solder flux removal from a gas stream is disclosed. In one aspect, the system includes: a scrubber chamber having a gas inlet and a gas outlet through which the gas stream is introduced into and withdrawn from the scrubber chamber; at least one rinse agent delivery mechanism for introducing a rinse agent into the scrubber chamber for contact with the gas stream, the rinse agent being at a temperature for condensing a first portion of the flux from the gas stream; a condenser portion of the scrubber chamber containing the rinse agent for receiving the gas stream, the rinse agent being at a temperature for condensing a second portion of the flux in the gas stream; and a condensed flux removal apparatus adapted for removal from the scrubber chamber of at least a portion of the rinse agent and the flux which has condensed.
Fuel cell system
A fuel cell system includes a fuel exhaust gas inlet channel for guiding a fuel exhaust gas containing liquid water discharged from a fuel cell stack to a gas liquid separator provided downstream of a humidifier in an oxygen-containing gas inlet channel. The specific gravity of the fuel exhaust gas is lighter than the specific gravity of the oxygen-containing exhaust gas. An outlet channel of the gas liquid separator includes a stirring booster having a first point and a second point positioned downstream of the first point. The second point is positioned ahead of the first point in the gravity direction.
Method and apparatus for cleaning an air flow from particles
Method and apparatus for cleaning an air flow from particles, such as bacteria and other microorganisms. According to the invention, an aerosol of liquid droplets is generated in the air flow, whereafter the liquid droplets and the air flow are mixed and the droplets and particles are centrifugally separated from the air flow.
Air purifier/conditioner (APC)
An air purifier and conditioner (and concomitant method of simultaneously purifying and conditioning air) comprising a housing receiving source air and an aqueous solution, a drop charger receiving the source air and providing a spray of electrically charged drops of the aqueous solution to produce treated air, a mist eliminator eliminating liquid in the treated air and producing conditioned air, a heat exchanger receiving the conditioned air and producing supply air, and a fan moving the supply air to a facility employing the supply air.