B01D2275/204

Extreme ultraviolet radiation source and cleaning method thereof

An extreme ultraviolet radiation source is provided, including a vessel and a gas scrubber. The vessel has a gas inlet from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the sizes of the gas passages vary according to the distance between each of the gas passages and the gas outlet.

METHODS FOR REMOVING OVERSPRAY FROM AIR FLOW EXITING PAINTING BOOTHS
20210069743 · 2021-03-11 ·

A method for removing overspray from air flow exiting a painting booth may include passing the air flow through an incoherent mass of cleaning elements, which are kept in a stirred condition, so as to release the overspray onto the cleaning elements of the incoherent mass.

Painting booths comprising painting chambers and overspray removal units
10870125 · 2020-12-22 · ·

A painting booth may include: a painting chamber and/or an overspray removal unit. Paint may be sprayed in the painting chamber. The painting chamber may be crossed by an air flow for evacuation of overspray from the painting chamber. When exiting the chamber, the air flow may pass through the overspray removal unit in order to remove the overspray from the air flow. The overspray removal unit may include an incoherent mass of cleaning elements kept in a stirred condition, through which the air flow containing the overspray passes so as to release the overspray onto the cleaning elements. A method for removing overspray from air flow exiting a painting booth may include: passing the air flow through an incoherent mass of cleaning elements which are kept in a stirred condition, so as to release the overspray onto the cleaning elements of the incoherent mass.

EXTREME ULTRAVIOLET RADIATION SOURCE AND CLEANING METHOD THEREOF

An extreme ultraviolet radiation source is provided, including a vessel and a gas scrubber. The vessel has a gas inlet from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the sizes of the gas passages vary according to the distance between each of the gas passages and the gas outlet.

Extreme ultraviolet radiation source and cleaning method thereof

An extreme ultraviolet radiation source is provided, including a vessel, an optical collector, and a gas scrubber. The vessel has a gas inlet and a gas outlet. The optical collector is disposed within the vessel and configured to collect and reflect extreme ultraviolet light produced in the vessel. A cleaning gas is introduced into the vessel through the gas inlet to clean the surface of the optical collector. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the size of the gas passage close to the gas outlet is smaller than the size of the gas passage away from the gas outlet.

EXTREME ULTRAVIOLET RADIATION SOURCE AND CLEANING METHOD THEREOF

An extreme ultraviolet radiation source is provided, including a vessel, an optical collector, and a gas scrubber. The vessel has a gas inlet and a gas outlet. The optical collector is disposed within the vessel and configured to collect and reflect extreme ultraviolet light produced in the vessel. A cleaning gas is introduced into the vessel through the gas inlet to clean the surface of the optical collector. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the size of the gas passage close to the gas outlet is smaller than the size of the gas passage away from the gas outlet.

PAINTING BOOTHS WITH OVERSPRAY REMOVAL SYSTEMS, METHODS FOR REMOVING THE OVERSPRAY, AND PLANTS
20180361419 · 2018-12-20 ·

A painting booth may include: a painting chamber and/or an overspray removal unit. Paint may be sprayed in the painting chamber. The painting chamber may be crossed by an air flow for evacuation of overspray from the painting chamber. When exiting the chamber, the air flow may pass through the overspray removal unit in order to remove the overspray from the air flow. The overspray removal unit may include an incoherent mass of cleaning elements kept in a stirred condition, through which the air flow containing the overspray passes so as to release the overspray onto the cleaning elements. A method for removing overspray from air flow exiting a painting booth may include: passing the air flow through an incoherent mass of cleaning elements which are kept in a stirred condition, so as to release the overspray onto the cleaning elements of the incoherent mass.