B01F2025/917

Method of feeding gases into a reactor to grow epitaxial structures based on group III nitride metals and a device for carrying out said method

The invention relates to methods for the chemical application of coatings by the decay of gaseous compounds, in particular to methods for injecting gases into a reaction chamber. The invention also relates to means for feeding gases into a reaction chamber, said means providing for the regulation of streams of reactive gases, and ensures the possibility of obtaining multi-layer epitaxial structures having set parameters and based on nitrides of group III metals while simultaneously increasing the productivity and cost-effectiveness of the process of the epitaxial growth thereof. Before being fed into a reactor, all of the gas streams are sent to a mixing chamber connected to the reactor, and are then fed into the reactor via a flux former under laminar flow conditions. The mixing chamber and the flux former are equipped with means for maintaining a set temperature. As a result of these solutions, a gaseous mixture with set parameters is fed into the reactor, and the formation of vortices is simultaneously prevented. The maximum allowable volume of the mixing chamber is chosen to take into account the process parameters and the required rarity of heterojunctions.

MULTI-OPENING CHEMICAL INJECTION DEVICE

This application relates to a fluid mixing device including a nozzle having a converging chamber, a chemical injection port, a diverging chamber, a nozzle throat, and an adjustable self-opening valve.

DILUTED SOLUTION PRODUCTION METHOD AND DILUTED SOLUTION PRODUCTION APPARATUS

A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid to a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

Multi-opening chemical injection device

A fluid mixing device includes a plurality of nozzles, each having a converging chamber, at least one chemical injection port, a diverging chamber, a nozzle throat, and an adjustable self-opening valve. The fluid mixing device provides for improvements in mixing fluids.

POSITIVE DISPLACEMENT MIXER

A positive displacement mixer and method for mixing a product that mixes at least two materials into a homogenous product. The positive displacement mixer has at least one positive displacement element having a length, a primary compartment, and a moving element, and two or more minor positive displacement elements each having a length, a minor compartment, and a moving element. The primary compartment and the minor compartments are fluidly connected and during mixing the primary compartment and minor compartments are closed to the atmosphere.

AIR GAP EDUCTOR AND METHOD OF MAKING SAME
20220016584 · 2022-01-20 ·

An eductor for mixing a diluent with a chemical. The educator includes an eductor body having a nozzle section with an inlet portion and an air gap portion, the inlet portion configured to couple to a diluent source and the air gap portion open to the atmosphere, and a venturi section coupled to the nozzle section. The nozzle section and venturi section may be connected by a swivel joint. The venturi section includes a venturi configured to couple to a chemical source for drawing chemical into the venturi with the flow of diluent through the venturi. A nozzle assembly positioned in the nozzle section of the eductor body. The nozzle assembly is selected from a plurality of nozzle assemblies each configured to be positioned in the nozzle section and operable with the eductor body, and each corresponding to a different volume flow rate through the eductor.

System and method to control nucleation of bubbles
11654205 · 2023-05-23 · ·

Generation of bubbles is disclosed to occur within a flow of an aqueous fluid. The bubbles may be formed within a tube of a selected diameter and the bubbles are controlled to exit the tube at a selected diameter. Generally, bubbles are formed to include a diameter of less than 1 millimeter, including less than about 20 microns.

SYSTEM AND METHOD TO CONTROL NUCLEATION OF BUBBLES
20210205480 · 2021-07-08 · ·

Generation of bubbles is disclosed to occur within a flow of an aqueous fluid. The bubbles may be formed within a tube of a selected diameter and the bubbles are controlled to exit the tube at a selected diameter. Generally, bubbles are formed to include a diameter of less than 1 millimeter, including less than about 20 microns.

METHOD OF FEEDING GASES INTO A REACTOR TO GROW EPITAXIAL STRUCTURES BASED ON GROUP III NITRIDE METALS AND A DEVICE FOR CARRYING OUT SAID METHOD

The invention relates to methods for the chemical application of coatings by the decay of gaseous compounds, in particular to methods for injecting gases into a reaction chamber. The invention also relates to means for feeding gases into a reaction chamber, said means providing for the regulation of streams of reactive gases, and ensures the possibility of obtaining multi-layer epitaxial structures having set parameters and based on nitrides of group III metals while simultaneously increasing the productivity and cost-effectiveness of the process of the epitaxial growth thereof. Before being fed into a reactor, all of the gas streams are sent to a mixing chamber connected to the reactor, and are then fed into the reactor via a flux former under laminar flow conditions. The mixing chamber and the flux former are equipped with means for maintaining a set temperature. As a result of these solutions, a gaseous mixture with set parameters is fed into the reactor, and the formation of vortices is simultaneously prevented. The maximum allowable volume of the mixing chamber is chosen to take into account the process parameters and the required rarity of heterojunctions.

DILUTED SOLUTION PRODUCTION METHOD AND DILUTED SOLUTION PRODUCTION APPARATUS

A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.