A fluid mixer configured to stably supply a mixed fluid having a desired mixing ratio, and which can be reduced in size. This fluid mixer includes a Venturi tube having a constriction section at which the flow path area is reduced, the Venturi tube having formed therein a first inflow opening and a second inflow opening through which a second fluid flows into a low-pressure region produced due to an increase in fluid velocity when a first fluid passes through the constriction section. A valve body that is disposed within the Venturi tube, the valve body closing due to the pressure of the first fluid passing through the Venturi tube and changing the flow path area of the Venturi tube, blocking off the first inflow opening when closed, and opening the first inflow opening when opened; and a biasing part (elastic body) applying a biasing force in the valve closing direction of the valve body.

A multifunctional C.sub.4F.sub.7N/CO.sub.2 mixed gas preparation system is disclosed. The C.sub.4F.sub.7N heat exchanger is used to heat and vaporize C.sub.4F.sub.7N input through the C.sub.4F.sub.7N input port; the CO.sub.2 heat exchanger is used to heat and vaporize CO.sub.2 input through the CO.sub.2 input port; the C.sub.4F.sub.7N/CO.sub.2 mixing pipeline structure is used to mix the heated C.sub.4F.sub.7N and heated CO.sub.2, and the C.sub.4F.sub.7N/CO.sub.2 mixed gas output pipeline structure is used to output the C.sub.4F.sub.7N/CO.sub.2 mixed gas. The C.sub.4F.sub.7N/CO.sub.2 mixing pipeline structure comprises a C.sub.4F.sub.7N/CO.sub.2 dynamic gas preparation pipeline structure and a C.sub.4F.sub.7N/CO.sub.2 partial pressure mixing pipeline structure; the C.sub.4F.sub.7N/CO.sub.2 partial pressure mixing pipeline structure includes partial pressure mixing tanks for mixing the CO.sub.2 and the heated C.sub.4F.sub.7N of certain pressures; and a plurality of partial pressure mixing tanks are arranged in parallel. A multifunctional C.sub.4F.sub.7N/CO.sub.2 mixed gas preparation method is also disclosed.

Gas injectors for providing uniform flow of fluid are provided herein. The gas injector includes a plenum body. The plenum body includes a recess, a protrusion adjacent to the recess and extending laterally away from the plenum body, and a plurality of nozzles extending laterally from an exterior surface of the plenum body. The plenum body has a plurality of holes in an exterior wall of the plenum body. Each nozzle is in fluid communication with an interior volume of the plenum body. By directing the flow of fluid, the gas injector provides for a uniform deposition.

Disclosed are systems and methods for mixing a gas-free liquid oxidant with a process liquid to form a homogeneous and gas-free mixture with minimized degassing. The mixing system comprises an injection device, integrating with a pipe through which a process liquid flows, configured and adapted to inject a gas-free liquid oxidant into the process liquid, and a mixer, fluidly connected to the pipe and the injection device, configured and adapted to mix the process liquid and the gas-free liquid oxidant therein to form a homogeneous and gas-free mixture of the process liquid and the gas-free liquid oxidant with minimal degassing. The method comprises the steps of a). injecting the gas-free liquid oxidant into the process liquid, and b). mixing the gas-free liquid oxidant and the process liquid to form the homogeneous and gas-free mixture. The gas-free liquid oxidant is ozone strong water.

A gas/gas mixer for introducing gas into an exhaust gas stream of an internal combustion engine. The gas/gas mixer includes an exhaust gas flow duct (18) in an exhaust gas carrying element (14), through which exhaust gas (A) can flow. A mixer body (20) is arranged in the exhaust gas carrying element (14) with a plurality of exhaust gas flow openings (44), through which exhaust gas (A) flowing in the exhaust gas flow duct (18) can flow. A gas feed volume (38), through which gas (G) to be introduced into the exhaust gas stream (A) can flow, is formed in the mixer body (20). The gas feed volume (38) is open towards the exhaust gas flow duct (18) via a plurality of gas release openings (56).

An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank. Next, the exhaust system performs a hydrogen-gas discharge operation in which the inlet valve and the first outlet valve are closed, and the a bypass valve disposed in a bypass line and the second outlet valve disposed in a hydrogen-gas discharge line are opened to discharge the hydrogen gas stayed in an upper part of the buffer tank while flowing the exhaust gas into a bypass line.

A plasma system is provided. The plasma system includes a low-temperature atmospheric-pressure plasma source and a water-mist supplying source. The low-temperature atmospheric-pressure plasma source has a nozzle. The nozzle is configured to eject a plasma. The water-mist supplying source is configured to deliver a water mist to the plasma ejected from the nozzle.

A mixing connector includes an intake passage, an EGR passage that fetches a portion of exhaust gas exhausted from an engine body to use as EGR gas, and that returns the EGR gas to the intake passage, and a merging section that connects the EGR passage to the intake passage so that longitudinal directions of the intake passage and the EGR passage intersect each other. An upstream side region located on an inlet port side of the intake passage from the merging section on an opposite wall surface configuring an inner surface of the intake passage and located on a side opposite to the merging section includes a first wall surface and a second wall surface which are sequentially arranged at an interval from the merging section side toward the inlet port, and a third wall surface projecting inward of the first wall surface between the first and second wall surfaces.

A substrate processing apparatus includes a chamber, a manifold including a tubular portion above the chamber, first and second introduction pipes provided on a side surface of the tubular portion, and a gas guide portion to guide, in a direction opposite the chamber, gases introduced from the first and second introduction pipes into the tubular portion, and then introduce the gases into the chamber. The gas guide portion does not contact a top of the manifold, and the manifold includes a space above the gas guide portion to allow the gases to flow from between the gas guide portion and the tubular portion into a space surrounded by the gas guide portion. The gas guide portion advantageously enables the gases to broadly diffuse and uniformly mix, increasing the quality of a film formed on a substrate inside the chamber.

An air reactivator includes a plurality of first ribs, a plurality of second ribs, a plurality of diffusion members, and a plurality of air passages. Each of the first ribs has a first top face and a first bottom face and two first inclined faces. Each of the second ribs has a second top face and a second bottom face and two second inclined faces. The diffusion members are defined at connections of the first ribs and the second ribs. Each of the diffusion members has a projection and a third bottom face and a recessed portion. Each of the air passages is defined between the first inclined face, the second inclined face, and the recessed portion. The first ribs, the second ribs, and the diffusion members are made of a mixture of far infrared material and polymer material.